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Minimizing Fizeau fringes during the contact printing of diffraction gratings

by: D. R. Ciarlo, M. C. Rushford, P. J. Kuzmenko, J. Ge

edited by: E. B. Kley, H. P. Herzig

In Proc. SPIE Vol. 4440, p. 202-208, Lithographic and Micromachining Techniques for Optical Component Fabrication, Ernst-Bernhard Kley; Hans-Peter Herzig; Eds., Vol. 4440 (November 2001), pp. 202-208.

X Abstract

An index matching fluid has been used to minimize the effect of interference fringes which develop when contact printing diffraction gratings on silicon wafers. These fringes are the result of interference effects when there is a small but uneven gap between the photomask and resist surface. They are especially troublesome when printing and etching large area, coarse diffraction gratings on the surface of silicon wafers and silicon disks.

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This article has been bookmarked 2 times, initially on 2007-09-14.

2007-09-14 User rodney
Group Kopelman_Group
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