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Group: Kopelman_Group - with tag amplified [3 articles]

Recent papers posted by members of the Kopelman_Group group with tag amplified
  • Patterning characteristics of a chemically-amplified negative resist in synchrotron radiation lithography
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 31, No. 9 A. (1992), pp. 2954-2958.
    by Kimiyoshi Deguchi, Kazunori Miyoshi, Tetsuyoshi Ishii, Tadahito Matsuda
    posted to synchotron resist radiation photoresist photolithography pattern negative lithography fabrication collapse chemically amplified by rodney to the group Kopelman_Group on 2007-09-03 21:07:00 as **
  • Real-time two-photon confocal microscopy using a femtosecond, amplified Ti:sapphire system.
    J Microsc, Vol. 181, No. Pt 3. (March 1996), pp. 253-259.
    by GJ Brakenhoff, J Squier, T Norris, AC Bliton, MH Wade, B Athey
    posted to ultrafast two-photon titanium tisapphire sapphire microscopy laser femtosecond confocal amplified by rodney to the group Kopelman_Group on 2007-08-24 04:14:02 as read
  • Calibration and validation of projection lithography focusing by fluorescence detection of latent photoacid images in chemically amplified resist
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 20, Issue 1, January 2002, pp.164-166, Vol. 20 (January 2002), pp. 164-166.
    by GD Feke, RD Grober, G Pohlers, JF Cameron
    posted to resist projection photoresist photoacid lithography latent focus fluorescence detection chemically calibration amplified by rodney to the group Kopelman_Group on 2007-08-16 02:34:03 as **
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