Group: Kopelman_Group - with tag fabrication [35 articles] Export

Recent papers posted by members of the Kopelman_Group group with tag fabrication

	Process-specific tuning of lithography simulation tools [My Copy] In Proc. SPIE Vol. 3051, p. 491-498, Optical Microlithography X, Gene E. Fuller; Ed., Vol. 3051 (July 1997), pp. 491-498. by M. E. Mason, R. A. Soper, R. M. Terry, C. A. Mack edited by G. E. Fuller posted to simulation prolith2 photolithography parameters lithography gratings finle fabrication development by rodney to the group Kopelman_Group on 2007-09-05 20:58:02 as
	Lithography model tuning: matching simulation to experiment [My Copy] In Proc. SPIE Vol. 2726, p. 223-235, Optical Microlithography IX, Gene E. Fuller; Ed., Vol. 2726 (June 1996), pp. 223-235. by S. H. Thornton, C. A. Mack edited by G. E. Fuller posted to thickness simulation resist prolith2 photoresist photolithography parameters lithography gratings finle fabrication exposure experiment dose development by rodney to the group Kopelman_Group on 2007-09-05 20:55:15 as
	Generation of subquarter-micron resist structures using optical interference lithography and image reversal [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.1949-1953, Vol. 15 (November 1997), pp. 1949-1953. by J. Y. Decker, A. Fernandez, D. W. Sweeney posted to submicron reversal resist photoresist photolithography optical lithography interference image holography fabrication by rodney to the group Kopelman_Group on 2007-09-05 00:08:46 as
	Methods for fabricating arrays of holes using interference lithography [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.2439-2443, Vol. 15 (November 1997), pp. 2439-2443. by A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, M. D. Perry posted to photolithography lithography interference holography holes fabrication arrays by rodney to the group Kopelman_Group on 2007-09-05 00:07:32 as
	Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 3, May 1997, pp.729-735, Vol. 15 (May 1997), pp. 729-735. by A. Fernandez, H. T. Nguyen, J. A. Britten, et al.R. D. Boyd, M. D. Perry, D. R. Kania, A. M. Hawryluk posted to submicron resist photoresist pattern panel lithography interference holography flat field fed fabrication emission displays arrays by rodney to the group Kopelman_Group on 2007-09-05 00:06:03 as
	Large-area achromatic interferometric lithography for 100 nm period gratings and grids [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 6, November 1996, pp.4167-4170, Vol. 14 (November 1996), pp. 4167-4170. by T. A. Savas, M. L. Schattenburg, J. M. Carter, H. I. Smith posted to submicron photolithography lithography large-field interferometry interference grids gratings fabrication achromatic by rodney to the group Kopelman_Group on 2007-09-05 00:04:27 as
	Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 5, September 1996, pp.3339-3349, Vol. 14 (September 1996), pp. 3339-3349. by X. Chen, S. H. Zaidi, S. R. J. Brueck, D. J. Devine posted to submicron photolithography lithography interferometry interference holography hole field fed fabrication emission display arrays by rodney to the group Kopelman_Group on 2007-09-05 00:02:40 as
	Fabrication of sub-0.5 micron diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm × 50 cm glass substrates using laser interference lithograph [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 3, May 1996, pp.2005-2007, Vol. 14 (May 1996), pp. 2005-2007. by J. P. Spallas, R. D. Boyd, J. A. Britten, et al.A. Fernandez, A. M. Hawryluk, M. D. Perry, D. R. Kania posted to substrates submicron silicon resist photoresist photolithography pedestals lithography large-field interference holography glass fabrication dots cobalt array by rodney to the group Kopelman_Group on 2007-09-05 00:00:08 as
	Optically matched trilevel resist process for nanostructure fabrication [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.3007-3011, Vol. 13 (November 1995), pp. 3007-3011. by M. L. Schattenburg, R. J. Aucoin, R. C. Fleming posted to trilevel resist photoresist photolithography optical nanostructures matched lithography interference gratings fabrication by rodney to the group Kopelman_Group on 2007-09-04 23:58:03 as
	Freeze-Drying Process to Avoid Resist Pattern Collapse [My Copy] Japanese Journal of Applied Physics, Vol. 32 (December 1993), 5813. by T. Tanaka, M. Morigami, H. Oizumi, T. Ogawa posted to resist photoresist pattern freeze-drying fabrication collapse by rodney to the group Kopelman_Group on 2007-09-04 01:53:04 as
	Fabrication of micromechanical devices from polysilicon films with smooth surfaces [My Copy] Sensors and Actuators In A Special Issue Devoted to Micromechanics, Vol. 20, No. 1-2. (15 November 1989), pp. 117-122. by H. Guckel, J. J. Sniegowski, T. R. Christenson, S. Mohney, T. F. Kelly posted to polysilicon mechanical freeze-drying films fabrication devices by rodney to the group Kopelman_Group on 2007-09-04 01:51:42 as
	Sub-0.1 micron patterning with high aspect ratio of 5 achieved by preventing pattern collapse [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 35, No. 4 A. (1996), pp. 2385-2386. by Y. Yamashita posted to submicron photolithography pattern lithography fabrication collapse aspect-ratio by rodney to the group Kopelman_Group on 2007-09-03 21:36:31 as
	Surface adhesion reduction in silicon microstructures using femtosecond laser pulses [My Copy] Applied Physics Letters, Vol. 68 (January 1996), pp. 197-199. by N. C. Tien, S. Jeong, L. M. Phinney, K. Fushinobu, J. Bokor posted to surface silicon pulses photolithography microstructures lithography laser femtosecond fabrication adhesion by rodney to the group Kopelman_Group on 2007-09-03 21:33:42 as
	Dry development of photosensitive polyimides for high resolution and aspect ratio applications [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2179-2183, Vol. 13 (November 1995), pp. 2179-2183. by J. Muñoz, C. Dom\ínguez posted to resolution resist polyimides photosensitive photoresist photolithography lithography high fabrication dry development aspect-ratio by rodney to the group Kopelman_Group on 2007-09-03 21:32:10 as
	Dry development of sub-0.25 mu m features patterned with 193 nm silylation resist [My Copy] The 42nd national symposium of the American Vacuum Society, Vol. 14, No. 3. (1996), pp. 1132-1136. by S. C. Palmateer, A. R. Forte, R. R. Kunz, M. W. Horn posted to submicron silylation resist photoresist photolithography pattern lithography fabrication dry development 193nm by rodney to the group Kopelman_Group on 2007-09-03 21:29:55 as
	Effect of low-solubility surface layer on development of AZ-PF514 [My Copy] Proceedings of the 16th international symposium on electron, ion, and photon beams, Vol. 11, No. 6. (1993), pp. 2829-2833. by Azalia A. Krasnoperova, Stephen W. Turner, Leo Ocola, Franco Cerrina posted to surface resist photoresist photolithography low-solubility lithography fabrication development az-pf514 by rodney to the group Kopelman_Group on 2007-09-03 21:27:29 as
	Photoresist-Assisted Release of Movable Microstructures [My Copy] Japanese Journal of Applied Physics, Vol. 32 (November 1993), pp. L1642-L1644. by D. Kobayashi, C. J. Kim, H. Fujita posted to resist photoresist photolithography movable microstructures lithography fabrication by rodney to the group Kopelman_Group on 2007-09-03 21:25:33 as
	Profile control in dry development of high-aspect-ratio resist structures [My Copy] The 38th International symposium on electron, ion, and photon beams, Vol. 13, No. 6. (1995), pp. 3017-3021. by M. B. Stern, S. C. Palmateer, M. W. Horn, M. Rothschild, B. E. Maxwell, J. E. Curtin posted to resist profile photoresist photolithography lithography fabrication dry development aspect-ratio by rodney to the group Kopelman_Group on 2007-09-03 21:22:33 as
	Surface tension, adhesion and wetting of materials for photolithographic process [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 14, No. 4. (1996), pp. 2485-2492. by J. Bauer, G. Drescher, M. Illig posted to wetting tension surface photolithography lithography fabrication contact collapse angle adhesion by rodney to the group Kopelman_Group on 2007-09-03 21:15:12 as along with 2 people SiljaSenkbeil carygallen
	Adhesion of Resist Micropatterns during Drying after Water Rinse [My Copy] Japanese Journal of Applied Physics, Vol. 34 (August 1995), pp. L1093-L1094. by A. Kawai posted to water rinse resist photoresist photolithography pattern lithography fabrication drying collapse adhesion by rodney to the group Kopelman_Group on 2007-09-03 21:14:01 as
	Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water [My Copy] Applied Physics Letters, Vol. 66, No. 20. (1995), pp. 2655-2657. by Hideo Namatsu, Kenji Kurihara, Masao Nagase, Kazumi Iwadate, Katsumi Murase posted to water tension surface silicon rinse photolithography pattern nanolines lithography grating fabrication collapse by rodney to the group Kopelman_Group on 2007-09-03 21:12:31 as
	Mechanism of Resist Pattern Collapse during Development Process [My Copy] Japanese Journal of Applied Physics, Vol. 32 (December 1993), 6059. by T. Tanaka, M. Morigami, N. Atoda posted to resist photoresist photolithography pattern lithography fabrication development collapse by rodney to the group Kopelman_Group on 2007-09-03 21:10:45 as
	Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process [My Copy] Japanese Journal of Applied Physics, Vol. 33 (December 1994), pp. L1803-L1805. by T. Tanaka, M. Morigami, H. Oizumi, T. Ogawa, Uchino posted to rinse resist photoresist photolithography pattern lithography flood fabrication exposure collapse by rodney to the group Kopelman_Group on 2007-09-03 21:08:43 as
	Patterning characteristics of a chemically-amplified negative resist in synchrotron radiation lithography [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 31, No. 9 A. (1992), pp. 2954-2958. by Kimiyoshi Deguchi, Kazunori Miyoshi, Tetsuyoshi Ishii, Tadahito Matsuda posted to synchotron resist radiation photoresist photolithography pattern negative lithography fabrication collapse chemically amplified by rodney to the group Kopelman_Group on 2007-09-03 21:07:00 as
	Building Three-Dimensional Surface Biological Assemblies on the Nanometer Scale [My Copy] Nano Lett., Vol. 3, No. 11. (2003), pp. 1517-1520. by D. Zhou, A. Bruckbauer, L. Ying, C. Abell, D. Klenerman posted to surface nanoscale fabrication biology assembly 3-d by rodney to the group Kopelman_Group on 2007-08-24 19:49:59 as
	Silica coating of silver nanoparticles using a modified Stober method [My Copy] Journal of Colloid and Interface Science, Vol. 283, No. 2. (15 March 2005), pp. 392-396. by Yoshio Kobayashi, Hironori Katakami, Eiichi Mine, Daisuke Nagao, Mikio Konno, Luis M. Liz-Marzan posted to stober silver silica nanoparticles fabrication by rodney to the group Kopelman_Group on 2007-08-15 17:25:52 as
	Rapid Fabrication of Binary Colloidal Crystals by Stepwise Spin-Coating [My Copy] Advanced Materials, Vol. 16, No. 3. (2004), pp. 244-247. by D. Wang, H. Möhwald posted to spin-coating rapid fabrication crystal colloidal binary by rodney to the group Kopelman_Group on 2007-08-06 04:06:01 as
	Rapid Fabrication of Two- and Three-Dimensional Colloidal Crystal Films via Confined Convective Assembly [My Copy] Advanced Functional Materials, Vol. 15, No. 8. (2005), pp. 1329-1335. by M. . H. Kim, S. . H. Im, O o posted to rapid monolayer fabrication crystal convective colloidal assembly 3-d 2-d by rodney to the group Kopelman_Group on 2007-08-06 04:03:51 as
	Submicroscopic pattern replication with visible light [My Copy] Journal of Vacuum Science and Technology, Vol. 19, No. 4. (1981), pp. 881-885. by Ch, H. P. Zingsheim posted to visible submicron pattern monolayer fabrication by rodney to the group Kopelman_Group on 2007-08-06 03:54:21 as
	Natural lithography [My Copy] Applied Physics Letters, Vol. 41, No. 4. (1982), pp. 377-379. by H. W. Deckman, J. H. Dunsmuir posted to nanosphere monolayer lithography fabrication by rodney to the group Kopelman_Group on 2007-08-06 03:52:09 as along with 1 person ijbuss
	Fabrication of mono- and multi-layers of submicron-sized spheres by a dip-coating technique and their transmittance property [My Copy] J. Chem. Eng. Jpn., Vol. 37, No. 5. (2004), pp. 614-621. by Y. Kobayashi, H. Miyauchi, S. Gu, D. Nagao, M. Konno posted to transmission spheres multilayers monolayer fabrication dip-coating by rodney to the group Kopelman_Group on 2007-08-06 03:43:26 as
	Rapid communication Fabrication of nano-dot- and nano-ring-arrays by nanosphere lithography [My Copy] Applied Physics A: Materials Science & Processing, Vol. 63 (1996), pp. 617-619. by M. Winzer, M. Kleiber, N. Dix, R. Wiesendanger posted to nanosphere nano-ring nanoparticles nano-dot monolayer lithography fabrication arrays by rodney to the group Kopelman_Group on 2007-08-02 22:18:08 as along with 1 person xxxxxxxxxxx
	Nanoengineering of optical resonances [My Copy] Chem. Phys. Lett., Vol. 288, No. 2-4. (1998), pp. 243-247. by S. J. Oldenburg, R. D. Averitt, S. L. Westcott, N. J. Halas posted to nanoshells nanoparticles fabrication by rodney to the group Kopelman_Group on 2007-05-01 01:37:10 as
	Plasmon resonance shifts of Au-coated Au2S nanoshells: Insight into multicomponent nanoparticle growth [My Copy] Phys Rev Lett, Vol. 78, No. 22. (1997), pp. 4217-4220. by R. D. Averitt, D. Sarkar, N. J. Halas posted to resonance plasmons nanoshells nanoparticles gold fabrication by rodney to the group Kopelman_Group on 2007-05-01 01:26:59 as
	Controlled synthesis and quantum-size effect in gold-coated nanoparticles [My Copy] Physical Review B, Vol. 50, No. 16. (15 October 1994), 12052. by H. S. Zhou, I. Honma, H. Komiyama, J. W. Haus posted to nanoshells nanoparticles gold fabrication by rodney to the group Kopelman_Group on 2007-05-01 01:17:34 as along with 1 person and 1 group cursonivel1 cursonivel1

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lithography	58
photolithography	44
graphene	30
photoresist	30
resist	30
nanotube	25
silicon	17
collapse	16
nanoparticles	16
submicron	16
development	14
arrays	13
surface	13
desk	12
gold	12
experiment	10
nano	10
pattern	10
patterns	10
experimental	9
pdms	9
waveguide	9
electronics	8
interference	8
adhesion	6
aspect-ratio	6
dna	6
dry	6
e-beam	6
microfluidics	6
nanoshells	6
optical	6
optics	6
polymer	6
ring_resonator	6
bottum-up	5
colloids	5
dot	5
fet	5
holographic	5
holography	5
layers	5
material	5
molecular	5
monolayer	5
nanoimprint	5
nanowires	5
review	5
self-assembly	5
silicon_oxide	5
simulation	5
suspended	5
3-d	4
assembly	4
calixarene	4
colloidal	4
crossbar	4
crystal	4
emission	4
exposure	4
field	4
gratings	4
josephson	4
kondo	4
large-field	4
lizard	4
mems	4
microstructures	4
nanotechnology	4
nbaloxnb	4
nems	4
parameters	4
polymeric	4
prolith2	4
rapid	4
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swnt	4
tension	4
water	4
bottom-up	3
cells	3
chemical	3
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etching	3
fe	3
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iron	3
junctions	3
legalproceedings	3
nanoscale	3
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ocd	3
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Group: Kopelman_Group - with tag fabrication [35 articles] Export

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