Group: Kopelman_Group - with tag pattern [13 articles] Export

Recent papers posted by members of the Kopelman_Group group with tag pattern

	Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 3, May 1997, pp.729-735, Vol. 15 (May 1997), pp. 729-735. by A. Fernandez, H. T. Nguyen, J. A. Britten, et al.R. D. Boyd, M. D. Perry, D. R. Kania, A. M. Hawryluk posted to submicron resist photoresist pattern panel lithography interference holography flat field fed fabrication emission displays arrays by rodney to the group Kopelman_Group on 2007-09-05 00:06:03 as
	Field emitter array mask patterning using laser interference lithography [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 5, September 1995, pp.1973-1978, Vol. 13 (September 1995), pp. 1973-1978. by J. P. Spallas, A. M. Hawryluk, D. R. Kania posted to photolithography pattern mask lithography interference holography field emitter array by rodney to the group Kopelman_Group on 2007-09-04 23:54:55 as
	Freeze-Drying Process to Avoid Resist Pattern Collapse [My Copy] Japanese Journal of Applied Physics, Vol. 32 (December 1993), 5813. by T. Tanaka, M. Morigami, H. Oizumi, T. Ogawa posted to resist photoresist pattern freeze-drying fabrication collapse by rodney to the group Kopelman_Group on 2007-09-04 01:53:04 as
	Sub-0.1 micron patterning with high aspect ratio of 5 achieved by preventing pattern collapse [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 35, No. 4 A. (1996), pp. 2385-2386. by Y. Yamashita posted to submicron photolithography pattern lithography fabrication collapse aspect-ratio by rodney to the group Kopelman_Group on 2007-09-03 21:36:31 as
	Dry development of sub-0.25 mu m features patterned with 193 nm silylation resist [My Copy] The 42nd national symposium of the American Vacuum Society, Vol. 14, No. 3. (1996), pp. 1132-1136. by S. C. Palmateer, A. R. Forte, R. R. Kunz, M. W. Horn posted to submicron silylation resist photoresist photolithography pattern lithography fabrication dry development 193nm by rodney to the group Kopelman_Group on 2007-09-03 21:29:55 as
	Adhesion of Resist Micropatterns during Drying after Water Rinse [My Copy] Japanese Journal of Applied Physics, Vol. 34 (August 1995), pp. L1093-L1094. by A. Kawai posted to water rinse resist photoresist photolithography pattern lithography fabrication drying collapse adhesion by rodney to the group Kopelman_Group on 2007-09-03 21:14:01 as
	Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water [My Copy] Applied Physics Letters, Vol. 66, No. 20. (1995), pp. 2655-2657. by Hideo Namatsu, Kenji Kurihara, Masao Nagase, Kazumi Iwadate, Katsumi Murase posted to water tension surface silicon rinse photolithography pattern nanolines lithography grating fabrication collapse by rodney to the group Kopelman_Group on 2007-09-03 21:12:31 as
	Mechanism of Resist Pattern Collapse during Development Process [My Copy] Japanese Journal of Applied Physics, Vol. 32 (December 1993), 6059. by T. Tanaka, M. Morigami, N. Atoda posted to resist photoresist photolithography pattern lithography fabrication development collapse by rodney to the group Kopelman_Group on 2007-09-03 21:10:45 as
	Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process [My Copy] Japanese Journal of Applied Physics, Vol. 33 (December 1994), pp. L1803-L1805. by T. Tanaka, M. Morigami, H. Oizumi, T. Ogawa, Uchino posted to rinse resist photoresist photolithography pattern lithography flood fabrication exposure collapse by rodney to the group Kopelman_Group on 2007-09-03 21:08:43 as
	Patterning characteristics of a chemically-amplified negative resist in synchrotron radiation lithography [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 31, No. 9 A. (1992), pp. 2954-2958. by Kimiyoshi Deguchi, Kazunori Miyoshi, Tetsuyoshi Ishii, Tadahito Matsuda posted to synchotron resist radiation photoresist photolithography pattern negative lithography fabrication collapse chemically amplified by rodney to the group Kopelman_Group on 2007-09-03 21:07:00 as
	Micropatterning Fluid Lipid Bilayers on Solid Supports [My Copy] Science, Vol. 275, No. 5300. (31 January 1997), pp. 651-653. by Jay T. Groves, Nick Ulman, Steven G. Boxer posted to pattern membranes lipid bilayers by rodney to the group Kopelman_Group on 2007-09-03 02:45:56 as along with 2 people Buntworthy samjlord
	Patterned Fluorescent Particles as Nanoprobes for the Investigation of Molecular Interactions [My Copy] Nano Lett., Vol. 3, No. 8. (13 August 2003), pp. 995-1000. by J. Choi, Y. Zhao, D. Zhang, S. Chien, Y. H. Lo posted to pattern nanoparticles molecular interactions half-coated fluorescence capped by rodney to the group Kopelman_Group on 2007-08-24 20:08:05 as
	Submicroscopic pattern replication with visible light [My Copy] Journal of Vacuum Science and Technology, Vol. 19, No. 4. (1981), pp. 881-885. by Ch, H. P. Zingsheim posted to visible submicron pattern monolayer fabrication by rodney to the group Kopelman_Group on 2007-08-06 03:54:21 as

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Group: Kopelman_Group - with tag pattern [13 articles] Export

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