<?xml version="1.0" encoding="UTF-8"?>
<rdf:RDF
   xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
   xmlns:rdfs="http://www.w3.org/2000/01/rdf-schema#"
   xmlns="http://purl.org/rss/1.0/"
   xmlns:dc="http://purl.org/dc/elements/1.1/"
   xmlns:prism="http://prismstandard.org/namespaces/1.2/basic/"
   xmlns:dcterms="http://purl.org/dc/terms/"
>
<channel rdf:about="http://www.citeulike.org/about">

	<title>CiteULike: dwinston's bcp</title>
	<description>CiteULike: dwinston's bcp</description>


	<link>http://www.citeulike.org/user/dwinston/tag/bcp</link>
	<dc:publisher>CiteULike.org</dc:publisher>
	<dc:language>en-gb</dc:language>
	<dc:rights>Copyright &#169; 2004-2008 citeulike.org</dc:rights>
	<items>
    <rdf:Seq>
        <rdf:li rdf:resource="http://www.citeulike.org/user/dwinston/article/2776716"/>
        <rdf:li rdf:resource="http://www.citeulike.org/user/dwinston/article/2782327"/>
        <rdf:li rdf:resource="http://www.citeulike.org/user/dwinston/article/2782248"/>
        <rdf:li rdf:resource="http://www.citeulike.org/user/dwinston/article/2776723"/>
        <rdf:li rdf:resource="http://www.citeulike.org/user/dwinston/article/2675186"/>

	</rdf:Seq>
	</items>
	</channel>


<item rdf:about="http://www.citeulike.org/user/dwinston/article/2776716">
    <title>Two-Dimensional Motion of Idealized Grain Boundaries</title>
    <link>http://www.citeulike.org/user/dwinston/article/2776716</link>
    <description>&lt;i&gt;Journal of Applied Physics, Vol. 27, No. 8. (1956), pp. 900-904.&lt;/i&gt;&lt;br /&gt;&lt;br /&gt;View This Record in Scopus</description>
    <dc:title>Two-Dimensional Motion of Idealized Grain Boundaries</dc:title>

    <dc:creator>WW Mullins</dc:creator>
    <dc:source>Journal of Applied Physics, Vol. 27, No. 8. (1956), pp. 900-904.</dc:source>
    <dc:date>2008-05-09T21:44:58-00:00</dc:date>
    <prism:publicationName>Journal of Applied Physics</prism:publicationName>
    <prism:volume>27</prism:volume>
    <prism:number>8</prism:number>
    <prism:startingPage>900</prism:startingPage>
    <prism:endingPage>904</prism:endingPage>
    <prism:publisher>AIP</prism:publisher>
    <prism:category>bcp</prism:category>
</item>



<item rdf:about="http://www.citeulike.org/user/dwinston/article/2782327">
    <title>Solvent-Induced Ordering in Diblock Copolymer Thin Films</title>
    <link>http://www.citeulike.org/user/dwinston/article/2782327</link>
    <description>&lt;i&gt;Polymeric Materials Science and Engineering, Vol. 93 (Fall 2005)&lt;/i&gt;&lt;br /&gt;&lt;br /&gt;Thin films of block copolymers (BC) are the focus of intensive investigations due to their self-assembly into well-ordered periodic structures. 1) In the present work, we investigate the microdomain morphology in symmetric PS-b-PMMA diblock copolymer thin films 'annealed' by different selective solvents vapor. 2, 3) PMMA hexagonally cylindrical microdomains oriented normal to the surface (Fig. 1a) can form by tuning the film thickness (less than L o ), the solvent selectivity (selective for PMMA) and solvent annealing time. Thickness confinement and solvent induced the change of film boundary condition are shown to be responsible for the formation of morphology. The resulted nanostructured films turn out to be sensitive to the surrounding medium, i.e., their morphologies and surface properties can be reversibly switchable upon exposure to solvent vapor selective for PS (Fig. 1b). Furthermore, by mixing the symmetric BC with homopolymers and block copolymer, the cylindrical domain sizes can be continuously tuned.</description>
    <dc:title>Solvent-Induced Ordering in Diblock Copolymer Thin Films</dc:title>

    <dc:creator>Juan Peng</dc:creator>
    <dc:creator>Yu Xuan</dc:creator>
    <dc:creator>Binyao Li</dc:creator>
    <dc:creator>Yanchun Han</dc:creator>
    <dc:source>Polymeric Materials Science and Engineering, Vol. 93 (Fall 2005)</dc:source>
    <dc:date>2008-05-10T04:05:12-00:00</dc:date>
    <prism:publicationName>Polymeric Materials Science and Engineering</prism:publicationName>
    <prism:volume>93</prism:volume>
    <prism:category>bcp</prism:category>
    <prism:category>self-assembly</prism:category>
    <prism:category>templated</prism:category>
</item>



<item rdf:about="http://www.citeulike.org/user/dwinston/article/2782248">
    <title>BLOCK COPOLYMER THIN FILMS: Physics and Applications</title>
    <link>http://www.citeulike.org/user/dwinston/article/2782248</link>
    <description>&lt;i&gt;Annual Review of Materials Research, Vol. 31, No. 1. (2001), pp. 323-355.&lt;/i&gt;&lt;br /&gt;&lt;br /&gt;Abstract A two-part review of research concerning block copolymer thin films is presented. The first section summarizes experimental and theoretical studies of the fundamental physics of these systems, concentrating upon the forces that govern film morphology. The role of film thickness and surface energetics on the morphology of compositionally symmetric, amorphous diblock copolymer films is emphasized, including considerations of boundary condition symmetry, so-called hybrid structures, and surface chemical expression. Discussions of compositionally asymmetric systems and emerging research areas, e.g., liquid-crystalline and A-B-C triblock systems, are also included. In the second section, technological applications of block copolymer films, e.g., as lithographic masks and photonic materials, are considered. Particular attention is paid to means by which microphase domain order and orientation can be controlled, including exploitation of thickness and surface effects, the application of external fields, and the use of patterned substrates.</description>
    <dc:title>BLOCK COPOLYMER THIN FILMS: Physics and Applications</dc:title>

    <dc:creator>Michael Fasolka</dc:creator>
    <dc:creator>Anne Mayes</dc:creator>
    <dc:identifier>doi:10.1146/annurev.matsci.31.1.323</dc:identifier>
    <dc:source>Annual Review of Materials Research, Vol. 31, No. 1. (2001), pp. 323-355.</dc:source>
    <dc:date>2008-05-10T02:02:55-00:00</dc:date>
    <prism:publicationName>Annual Review of Materials Research</prism:publicationName>
    <prism:volume>31</prism:volume>
    <prism:number>1</prism:number>
    <prism:startingPage>323</prism:startingPage>
    <prism:endingPage>355</prism:endingPage>
    <prism:category>bcp</prism:category>
    <prism:category>self-assembly</prism:category>
    <prism:category>templated</prism:category>
</item>



<item rdf:about="http://www.citeulike.org/user/dwinston/article/2776723">
    <title>Block copolymers, polymer-polymer interfaces, and the theory of inhomogeneous polymers</title>
    <link>http://www.citeulike.org/user/dwinston/article/2776723</link>
    <description>&lt;i&gt;Accounts of Chemical Research, Vol. 8, No. 9. (1975), pp. 295-299.&lt;/i&gt;</description>
    <dc:title>Block copolymers, polymer-polymer interfaces, and the theory of inhomogeneous polymers</dc:title>

    <dc:creator>Eugene Helfand</dc:creator>
    <dc:source>Accounts of Chemical Research, Vol. 8, No. 9. (1975), pp. 295-299.</dc:source>
    <dc:date>2008-05-09T21:54:16-00:00</dc:date>
    <prism:publicationName>Accounts of Chemical Research</prism:publicationName>
    <prism:volume>8</prism:volume>
    <prism:number>9</prism:number>
    <prism:startingPage>295</prism:startingPage>
    <prism:endingPage>299</prism:endingPage>
    <prism:category>bcp</prism:category>
    <prism:category>self-assembly</prism:category>
</item>



<item rdf:about="http://www.citeulike.org/user/dwinston/article/2675186">
    <title>Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography</title>
    <link>http://www.citeulike.org/user/dwinston/article/2675186</link>
    <description>&lt;i&gt;Advanced Materials, Vol. 15, No. 19. (2003), pp. 1599-1602.&lt;/i&gt;&lt;br /&gt;&lt;br /&gt;No abstract.</description>
    <dc:title>Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography</dc:title>

    <dc:creator>JY Cheng</dc:creator>
    <dc:creator>CA Ross</dc:creator>
    <dc:creator>EL Thomas</dc:creator>
    <dc:creator>HI Smith</dc:creator>
    <dc:creator>GJ Vancso</dc:creator>
    <dc:identifier>doi:10.1002/adma.200305244</dc:identifier>
    <dc:source>Advanced Materials, Vol. 15, No. 19. (2003), pp. 1599-1602.</dc:source>
    <dc:date>2008-04-15T19:20:27-00:00</dc:date>
    <prism:publicationName>Advanced Materials</prism:publicationName>
    <prism:volume>15</prism:volume>
    <prism:number>19</prism:number>
    <prism:startingPage>1599</prism:startingPage>
    <prism:endingPage>1602</prism:endingPage>
    <prism:category>bcp</prism:category>
    <prism:category>self-assembly</prism:category>
    <prism:category>templated</prism:category>
</item>



</rdf:RDF>

