Tag ald [57 articles] Export

Recent papers classified by the tag ald.

	Role of Gas Doping Sequence in Surface Reactions and Dopant Incorporation during Atomic Layer Deposition of Al-Doped ZnO [My Copy] Chemistry of Materials, Vol. 21, No. 23. (8 December 2009), pp. 5585-5593. by Jeong-Seok Na, Qing Peng, Giovanna Scarel, Gregory N. Parsons posted to azo ald by tbenanti on 2009-12-02 14:15:52 as
	Copper Oxide ALD from a Cu(I) < beta >-Diketonate: Detailed Growth Studies on SiO[sub 2] and TaN [My Copy] ECS Transactions, Vol. 25, No. 4. (2009), pp. 277-287. by Thomas Waechtler, Nina Roth, Robert Mothes, et al.Steffen Schulze, Stefan E. Schulz, Thomas Gessner, Heinrich Lang, Michael Hietschold edited by S. De Gendt, S. Bent, A. Delabie, et al.J. Elam, S. Kang, O. Van der Straten, A. Londergan posted to thin_film tantalum_nitride tan sio2 copper_oxide ald by thomaswaechtler on 2009-11-16 12:35:05 as
	Influence of Annealing Duration on Optical Property and Surface Morphology of ZnO Thin Film Grown by Atomic Layer Deposition [My Copy] Current Applied Physics (11 November 2009) by C. R. Kim, C. M. Shin, J. Y. Lee, et al.J. H. Heo, T. M. Lee, J. H. Park, H. Ryu, C. S. Son, J. H. Chang posted to morphology bessy ald afm by JohnnyP on 2009-11-16 10:22:55 as
	Atomic layer deposition of HfO2: Growth initiation study on metallic underlayers [My Copy] Thin Solid Films (30 October 2009) by Christopher L. Platt, Ning Li, Kejing Li, Tonya M. Klein posted to bessy ald by JohnnyP on 2009-11-06 09:55:22 as
	Structural analysis, elemental profiling, and electrical characterization of HfO[sub 2] thin films deposited on In[sub 0.53]Ga[sub 0.47]As surfaces by atomic layer deposition [My Copy] Journal of Applied Physics, Vol. 106, No. 8. (2009), 084508. by R. D. Long, O'Connor, S. B. Newcomb, et al.S. Monaghan, K. Cherkaoui, P. Casey, G. Hughes, K. K. Thomas, F. Chalvet, I. M. Povey, M. E. Pemble, P. K. Hurley posted to ingaas hfo2 ald afm by JohnnyP on 2009-10-28 11:09:28 as
	Atomic Layer Deposition of Iridium Thin Films by Consecutive Oxidation and Reduction Steps [My Copy] Chemistry of Materials, Vol. 21, No. 20. (27 October 2009), pp. 4868-4872. by Jani Hämäläinen, Esa Puukilainen, Marianna Kemell, Leila Costelle, Mikko Ritala, Markku Leskelä posted to iridium ald by tbenanti on 2009-10-25 15:48:14 as
	Localized Surface Plasmon Resonance Nanosensor: A High-Resolution Distance-Dependence Study Using Atomic Layer Deposition [My Copy] The Journal of Physical Chemistry B, Vol. 109, No. 43. (1 November 2005), pp. 20522-20528. by Alyson V. Whitney, Jeffrey W. Elam, Shengli Zou, et al.Alex V. Zinovev, Peter C. Stair, George C. Schatz, Richard P. Van Duyne posted to spectroscopy silver sem qcm nsl lspr lithography ellipsometry aluminium ald by Buntworthy on 2009-10-22 11:29:35 as
	Atomic Layer Deposition of Lead Sulfide Thin Films for Quantum Confinement [My Copy] Chemistry of Materials, Vol. 21, No. 17. (8 September 2009), pp. 3973-3978. by Neil P. Dasgupta, Wonyoung Lee, Fritz B. Prinz posted to pbs ald by tbenanti on 2009-09-02 14:38:01 as
	HfO[sub 2]/HfO[sub x]N[sub y]/HfO[sub 2] Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 8. (2009), pp. G109-G113. by W. J. Maeng, Gil H. Gu, C. G. Park, Kayoung Lee, Taeyoon Lee, Hyungjun Kim posted to ald bessy by JohnnyP on 2009-06-19 13:03:44 as
	Reliable thin film encapsulation for organic light emitting diodes grown by low-temperature atomic layer deposition [My Copy] Applied Physics Letters, Vol. 94, No. 23. (2009), 233305. by J. Meyer, D. Schneidenbach, T. Winkler, et al.S. Hamwi, T. Weimann, P. Hinze, S. Ammermann, H. H. Johannes, T. Riedl, W. Kowalsky posted to ald nanolaminate oled by JohnnyP on 2009-06-19 13:02:14 as
	ZnO grown by atomic layer deposition: A material for transparent electronics and organic heterojunctions [My Copy] Journal of Applied Physics, Vol. 105, No. 12. (2009), 122413. by E. Guziewicz, M. Godlewski, T. Krajewski, et al. \l, A. Szczepanik, K. Kopalko, Wójcik, E. Przezdziecka, W. Paszkowicz, E. \lusakowska, P. Kruszewski, N. Huby, G. Tallarida, S. Ferrari posted to afm ald zn by JohnnyP on 2009-06-19 12:57:15 as
	The ald Gene, Encoding a Coenzyme A-Acylating Aldehyde Dehydrogenase, Distinguishes Clostridium beijerinckii and Two Other Solvent-Producing Clostridia from Clostridium acetobutylicum [My Copy] Appl. Environ. Microbiol., Vol. 65, No. 11. (1 November 1999), pp. 4973-4980. by Julianna Toth, Adnan A. Ismaiel, Jiann-Shin Chen posted to ald aldehyde beijerinckii butyraldehyde clostridium dehydrogenase solvents by Winzer on 2009-06-09 12:29:20 as
	Structural phase transformation of Y[sub 2]O[sub 3] doped HfO[sub 2] films grown on Si using atomic layer deposition [My Copy] Journal of Applied Physics, Vol. 105, No. 10. (2009), 104106. by Prodyut Majumder, Gregory Jursich, Christos Takoudis posted to ald hfo2 by JohnnyP on 2009-06-04 14:21:39 as
	Annealing behavior of atomic layer deposited HfO[sub 2] films studied by synchrotron x-ray reflectivity and grazing incidence small angle scattering [My Copy] Journal of Applied Physics, Vol. 105, No. 10. (2009), 103522. by M. L. Green, A. J. Allen, Jordan J. L. Sweet, J. Ilavsky posted to ald hfo2 by JohnnyP on 2009-06-04 14:17:07 as
	Atomic-layer-deposited nanostructures for graphene-based nanoelectronics [My Copy] Applied Physics Letters, Vol. 92, No. 1. (2008), 013101. by Y. Xuan, Y. Q. Wu, T. Shen, et al.M. Qi, M. A. Capano, J. A. Cooper, P. D. Ye posted to al2o3 ald aluminum atomic deposition graphene graphite hafnium hfo2 highly hopg layer ordered oxide pyrolytic by thomaswaechtler on 2009-05-27 03:24:47 as along with 1 person jolcynea
	Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO[sub 2] [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 6. (2009), pp. H453-H459. by Thomas Waechtler, Steffen Oswald, Nina Roth, et al.Alexander Jakob, Heinrich Lang, Ramona Ecke, Stefan E. Schulz, Thomas Gessner, Anastasia Moskvinova, Steffen Schulze, Michael Hietschold posted to acetylacetonate adhesion ald atomic barrier beta-diketonate bistri-n-butylphosphanecopperiacetylacetonate copper copperi cui deposition diffusion eels electron energy film layer loss metallization microscopy nitride oxide phosphane photoelectron precursor pressure ru ruthenium silica silicon sio2 specstroscopy spectroscopy ta tan tantalum tem thin transmission ulsi vapor x-ray xps by thomaswaechtler on 2009-05-26 09:17:12 as
	Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process [My Copy] Journal of Applied Physics, Vol. 97, No. 12. (2005), 121301. by Riikka L. Puurunen posted to al ald review by JohnnyP on 2009-05-25 12:26:28 as
	Mathematical description of atomic layer deposition and its application to the nucleation and growth of HfO[sub 2] gate dielectric layers [My Copy] Journal of Applied Physics, Vol. 94, No. 5. (2003), pp. 3403-3413. by M. A. Alam, M. L. Green posted to ald hfo2 by JohnnyP on 2009-05-25 12:23:41 as
	In-Situ Studies of ALD Growth of Hafnium Oxide Films [My Copy] Advanced Engineering Materials, Vol. 11, No. 4. (2009), pp. 265-268. by Konstantin Karavaev, Krzysztof Kolanek, Massimo Tallarida, Dieter Schmeißer, Ehrenfried Zschech posted to afm ald hf by JohnnyP on 2009-05-24 21:15:58 as
	Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 8. (2009), pp. G89-G96. by Jian Liu, William N. Lennard, Lyudmila V. Goncharova, et al.Dolf Landheer, Xiaohua Wu, Simon A. Rushworth, Anthony C. Jones posted to ald bessy hf by JohnnyP on 2009-05-22 15:01:05 as
	Chemical and Structural Properties of a TaN/HfO[sub 2] Gate Stack Processed Using Atomic Vapor Deposition [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 7. (2009), pp. G78-G83. by C. Gaumer, E. Martinez, S. Lhostis, et al.C. Wiemer, M. Perego, V. Loup, D. Lafond, J. M. Fabbri posted to ald bessy hf by JohnnyP on 2009-05-15 14:13:43 as
	Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al[sub 2]O[sub 3] [My Copy] Journal of Applied Physics, Vol. 105, No. 7. (2009), 074309. by R. W. Wind, F. H. Fabreguette, Z. A. Sechrist, S. M. George posted to afm ald nucleation by JohnnyP on 2009-04-24 09:21:13 as
	High dielectric constant gate oxides for metal oxide Si transistors [My Copy] Reports on Progress in Physics, Vol. 69, No. 2. (2006), pp. 327-396. by John Robertson posted to ald high-k si by JohnnyP on 2009-04-21 13:45:02 as along with 1 person eyliu
	Analysis of ALD-processed thin films by ion-beam techniques [My Copy] Analytical and Bioanalytical Chemistry, Vol. 382, No. 8. (17 August 2005), pp. 1791-1799. by Matti Putkonen, Timo Sajavaara, Lauri Niinistö, Juhani Keinonen posted to ald by JohnnyP on 2009-04-21 13:38:26 as
	Fabrication of poly-Si/Au nano-gaps using atomic-layer-deposited Al2O3 as a sacrificial layer [My Copy] Nanotechnology, Vol. 16, No. 4. (April 2005), 361. by Chan W. Park, Han Y. Yu, Ung H. Pi, Sung-Yool Choi posted to ald nano_gap by JohnnyP on 2009-04-20 14:18:10 as
	Exploitation of atomic layer deposition for nanostructured materials [My Copy] Materials Science and Engineering: C, Vol. 27, No. 5-8. (September 2007), pp. 1504-1508. by M. Leskela, M. Kemell, K. Kukli, et al.V. Pore, E. Santala, M. Ritala, J. Lu posted to ald origami by dna on 2009-04-16 17:13:58 as
	Atomic Layer Deposition on Biological Macromolecules: Metal Oxide Coating of Tobacco Mosaic Virus and Ferritin [My Copy] Nano Letters, Vol. 6, No. 6. (1 June 2006), pp. 1172-1177. by Mato Knez, Anan Kadri, Christina Wege, Ulrich Gosele, Holger Jeske, Kornelius Nielsch posted to ald origami by dna on 2009-04-16 16:53:17 as
	Room-Temperature Growth of Silicon Oxide Nanofilms: New Opportunities for Plastic Electronics [My Copy] Angewandte Chemie International Edition, Vol. 48, No. 14. (2009), pp. 2457-2459. by Helmuth Hoffmann posted to ald origami si-substrate surface-si by dna on 2009-04-16 15:13:11 as
	Reduced Electrical Defects and Improved Reliability of Atomic-Layer-Deposited HfO[sub 2] Dielectric Films by In Situ NH[sub 3] Injection [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 5. (2009), pp. G48-G52. by Jeong H. Kim, Tae J. Park, Moonju Cho, et al.Jae H. Jang, Minha Seo, Kwang D. Na, Cheol S. Hwang, Jeong Y. Won posted to ald bessy hfo2 nh3 by JohnnyP on 2009-04-01 15:54:38 as
	Effect of channel doping concentration and thickness on device performance for In[sub 0.53]Ga[sub 0.47]As metal-oxide-semiconductor transistors with atomic-layer-deposited Al[sub 2]O[sub 3] dielectrics [My Copy] Applied Physics Letters, Vol. 94, No. 9. (2009), 093505. by Han Zhao, Feng Zhu, Yen T. Chen, Jung H. Yum, Yanzhen Wang, Jack C. Lee posted to ald by JohnnyP on 2009-03-31 15:43:01 as
	Structural properties of Al2O3 dielectrics grown on TiN metal substrates by atomic layer deposition [My Copy] Applied Surface Science, Vol. 255, No. 6. (01 January 2009), pp. 3769-3772. by C. Hsieh, T. Pan, J. Lin, et al.Y. Peng, T. Huang, C. Wu, S. Shih posted to afm ald pri by JohnnyP on 2009-03-31 15:09:50 as
	Method to determine the sticking coefficient of precursor molecules in atomic layer deposition [My Copy] Applied Surface Science (23 February 2009) by M. Rose, J. W. Bartha posted to ald by JohnnyP on 2009-03-31 15:03:31 as
	Initial growth mechanism of atomic layer deposition of ZnO on the hydroxylated Si(100)-2×1: A density functional theory study [My Copy] Applied Surface Science, Vol. 255, No. 11. (15 March 2009), pp. 5742-5745. by Jie Ren posted to ald dft zno by JohnnyP on 2009-03-31 14:54:47 as
	Investigation of interfacial layer development between thin Al[sub 2]O[sub 3] films grown using atomic layer deposition and Si(100), Ge(100), or GaAs(100) [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 27, No. 3. (2009), pp. 443-448. by L. Lamagna, G. Scarel, M. Fanciulli, G. Pavia posted to ald bessy interface by jolcynea on 2009-03-30 20:07:37 as along with 1 person JohnnyP
	TiO2 thin films by atomic layer deposition: a case of uneven growth at low temperature [My Copy] Applied Surface Science, Vol. 134, No. 1-4. (September 1998), pp. 78-86. by V. Sammelselg posted to ald tio2 by JohnnyP on 2009-03-28 13:58:11 as
	Nucleation Behavior of Atomic Layer Deposited SiO[sub 2] for Hf-Silicate Films [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 5. (2009), pp. G43-G47. by Kwun B. Chung, W. J. Lee, C. Y. Kim, Mann H. Cho, Dae W. Moon posted to ald bessy hf sio2 by JohnnyP on 2009-03-27 13:54:04 as
	Atomic layer deposition of Cu[sub 2]S for future application in photovoltaics [My Copy] Applied Physics Letters, Vol. 94, No. 12. (2009), 123107. by Alex B. F. Martinson, Jeffrey W. Elam, Michael J. Pellin posted to ald cus by JohnnyP on 2009-03-27 13:43:29 as
	Energy barriers at interfaces of (100)GaAs with atomic layer deposited Al[sub 2]O[sub 3] and HfO[sub 2] [My Copy] Applied Physics Letters, Vol. 93, No. 21. (2008), 212104. by V. V. Afanas'ev, M. Badylevich, A. Stesmans, et al.G. Brammertz, A. Delabie, S. Sionke, A. O'Mahony, I. M. Povey, M. E. Pemble, E. O'Connor, P. K. Hurley, S. B. Newcomb posted to al ald gaas hf by JohnnyP on 2009-03-27 12:35:35 as
	Mechanisms of adsorption and decomposition of metal alkylamide precursors for ultrathin film growth [My Copy] Journal of Applied Physics, Vol. 104, No. 8. (2008), 084907. by Juan, Andrew V. Teplyakov posted to ald high-k by JohnnyP on 2009-03-27 12:34:37 as
	Chemical/Structural Nanocharacterization and Electrical Properties of ALD-Grown La[sub 2]O[sub 3]/Si Interfaces for Advanced Gate Stacks [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 1. (2009), pp. H1-H6. by S. Schamm, P. E. Coulon, S. Miao, et al.S. N. Volkos, L. H. Lu, L. Lamagna, C. Wiemer, D. Tsoutsou, G. Scarel, M. Fanciulli posted to ald bessy la by JohnnyP on 2009-03-27 12:32:38 as
	Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 4. (2009), pp. P63-P67. by J. Dendooven, D. Deduytsche, J. Musschoot, R. L. Vanmeirhaeghe, C. Detavernier posted to ald bessy by JohnnyP on 2009-03-18 15:53:49 as
	Atomic Layer Deposition of ZrO[sub 2] and HfO[sub 2] Nanotubes by Template Replication [My Copy] Electrochemical and Solid-State Letters, Vol. 12, No. 4. (2009), pp. K25-K28. by Diefeng Gu, Helmut Baumgart, Gon Namkoong, Tarek posted to ald bessy hf nanotubes zr by JohnnyP on 2009-03-18 15:53:00 as
	Surface modification of poly(ethylene terephthalate) by plasma polymerization of poly(ethylene glycol) [My Copy] Journal of Materials Science: Materials in Medicine, Vol. 18, No. 9. (2007), pp. 1831-1835. by Sakthi, Masayori Fujioka, Kentaro Asano, Atsumu Shoji, Athipettah Jayakrishnan, Yasuhiko Yoshida posted to ald peg vapour_pressure by ferin on 2009-02-25 22:12:59 as
	Molecular weight of polyethylene glycols by vapor pressure osmometry: An alternative data treatment [My Copy] Journal of Applied Polymer Science, Vol. 65, No. 3. (1997), pp. 595-600. by E. Sabadini, E. M. Assano, T. D. Z. Atvars posted to ald peg vapour_pressure by ferin on 2009-02-25 22:10:30 as
	The case for anomalous link discovery [My Copy] SIGKDD Explor. Newsl., Vol. 7, No. 2. (December 2005), pp. 41-47. by Matthew J. Rattigan, David Jensen posted to ald link-prediction networks by RafG on 2009-02-12 15:30:47 as along with 3 people ldietz bigbossman kohei-h
	Phenethyl isothiocyanate, a new dietary liver aldehyde dehydrogenase inhibitor [My Copy] J Pharmacol Exp Ther, Vol. 275, No. 1. (1 October 1995), pp. 79-83. by K. O. Lindros, T. Badger, M. Ronis, M. Ingelman-Sundberg, M. Koivusalo posted to ald p450 phenethyl_isothiocyanate by HEIRS to the group HEIRS Specific Toxicities in Food on 2008-10-01 01:02:45 as along with 2 groups HEIRS Pharmacy and Drug Research HEIRS - Environmental Illness Research
	Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings [My Copy] Thin Solid Films, Vol. 516, No. 12. (30 April 2008), pp. 4036-4039. by Russell Cooper, Hari P. Upadhyaya, Timothy K. Minton, Michael R. Berman, Xiaohua Du, Steven M. George posted to ald barrier-coating flexible-electronics macroelectronics by Macroelectronics on 2008-06-16 15:53:33 as
	<emphasis emphasistype="italic">In Situ</emphasis> Surface Passivation and CMOS-Compatible Palladium–Germanium Contacts for Surface-Channel Gallium Arsenide MOSFETs [My Copy] Electron Device Letters, IEEE In Electron Device Letters, IEEE, Vol. 29, No. 6. (2008), pp. 553-556. by H. C. Chin, M. Zhu, C. H. Tung, G. S. Samudra, Y. C. Yeo posted to ald gaas mosfet by mllee on 2008-05-26 13:19:54 as
	Simulation of growth dynamics in atomic layer deposition. Part II. Polycrystalline films from cubic crystallites [My Copy] Thin Solid Films, Vol. 515, No. 11. (9 April 2007), pp. 4538-4549. by Ola Nilsen, Ole B. Karlsen, Arne Kjekshus, Helmer Fjellvag posted to ald simulation by thomaswaechtler on 2007-03-05 14:00:56 as
	Simulation of growth dynamics in atomic layer deposition. Part I. Amorphous films [My Copy] Thin Solid Films, Vol. 515, No. 11. (9 April 2007), pp. 4527-4537. by Ola Nilsen, Ole B. Karlsen, Arne Kjekshus, Helmer Fjellvag posted to ald simulation by thomaswaechtler on 2007-03-05 13:58:27 as

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bessy	11
afm	6
hf	6
hfo2	6
p450	5
phenethyl_isothiocyanate	5
nitride	4
atomic	3
deposition	3
layer	3
origami	3
oxide	3
sio2	3
al	2
al2o3	2
aldehyde	2
beijerinckii	2
butyraldehyde	2
clostridium	2
dehydrogenase	2
ellipsometry	2
gaas	2
high-k	2
peg	2
review	2
simulation	2
solvents	2
spectroscopy	2
tan	2
tantalum	2
titanium	2
vapour_pressure	2
abcd1	1
abcpaper1	1
acetylacetonate	1
adhesion	1
aluminium	1
aluminum	1
ammonia	1
avd	1
barrier	1
barrier-coating	1
beta-diketonate	1
bistri-n-butylphosphanecopperiacetylacetonate	1
copper	1
copper_oxide	1
copperi	1
cui	1
cus	1
dft	1
diffusion	1
eels	1
electron	1
film	1
flexible-electronics	1
gate_insulator	1
graphene	1
hafnium	1
highly	1
hydrothermal	1
ingaas	1
interface	1
iridium	1
la	1
link-prediction	1
lithography	1
loss	1
macroelectronics	1
mems	1
microscopy	1
mosfet	1
moshfet	1
nano_gap	1
nanolaminate	1
nanotubes	1
networks	1
nsl	1
nucleation	1
ordered	1
phosphane	1
photoelectron	1
precursor	1
pressure	1
pri	1
pyrolytic	1
si	1
silicon	1
silver	1
specstroscopy	1
ta	1
tem	1
thin_film	1
tio2	1
transmission	1
ulsi	1
vapor	1
x-ray	1
zn	1
zno	1
zr	1

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