Tag etching [127 articles] Export

Recent papers classified by the tag etching.

	Self-organized vertically aligned single-crystal silicon nanostructures with controlled shape and aspect ratio by reactive plasma etching [My Copy] Applied Physics Letters, Vol. 95, No. 11. (2009), 111505. by S. Xu, I. Levchenko, S. Y. Huang, K. Ostrikov posted to silicon plasma nanopyramids etching by tbenanti on 2009-09-30 21:49:45 as
	Fabrication of silicon pyramid/nanowire binary structure with superhydrophobicity [My Copy] Applied Surface Science, Vol. 255, No. 16. (30 May 2009), pp. 7147-7152. by Xiaocheng Li, Beng K. Tay, Philippe Miele, Arnaud Brioude, David Cornu posted to wet pyramid etching by kewood to the group Silicon Nanowire Arrays with Polymer on 2009-09-24 22:02:29 as
	Preparation of Large-Area Uniform Silicon Nanowires Arrays through Metal-Assisted Chemical Etching [My Copy] The Journal of Physical Chemistry C, Vol. 112, No. 12. (1 March 2008), pp. 4444-4450. by Ming-Liang Zhang, Kui-Qing Peng, Xia Fan, et al.Jian-Sheng Jie, Rui-Qin Zhang, Shuit-Tong Lee, Ning-Bew Wong posted to metal etching chemical by kewood to the group Silicon Nanowire Arrays with Polymer on 2009-09-24 21:36:52 as
	Extended Arrays of Vertically Aligned Sub-10 nm Diameter [100] Si Nanowires by Metal-Assisted Chemical Etching [My Copy] Nano Letters, Vol. 8, No. 9. (10 September 2008), pp. 3046-3051. by Zhipeng Huang, Xuanxiong Zhang, Manfred Reiche, et al.Lifeng Liu, Woo Lee, Tomohiro Shimizu, Stephan Senz, Ulrich Gösele posted to wet metal etching chemical by kewood to the group Silicon Nanowire Arrays with Polymer on 2009-09-24 21:27:49 as along with 1 person Ynubiis
	Fabrication of Large-Area Silicon Nanowire p-n Junction Diode Arrays [My Copy] Advanced Materials, Vol. 16, No. 1. (2004), pp. 73-76. by K. Q. Peng, Z. P. Huang, J. Zhu posted to silicon production nanowires fabrication etching arrays by snikodem to the group Silicon Nanowire Arrays with Polymer on 2009-09-10 21:25:19 as along with 1 person arvindajoy
	Reactive ion etching of benzocyclobutene polymer films [My Copy] Components, Packaging, and Manufacturing Technology, Part C, IEEE Transactions on In Components, Packaging, and Manufacturing Technology, Part C, IEEE Transactions on, Vol. 20, No. 3. (1997), pp. 199-206. by P. B. Chinoy posted to etching bcb by msterner on 2009-09-03 13:44:20 as
	Experimental investigation of anisotropy in isotropic silicon etching [My Copy] Journal of Micromechanics and Microengineering, Vol. 17, No. 11. (November 2007), pp. 2344-2351. by V. B. Svetovoy, J. W. Berenschot, M. C. Elwenspoek posted to silicon isotropic etching anisotropic by keithp on 2009-08-21 14:48:06 as along with 1 person paradize
	Dimensional Scaling of Cylinders in Thin Films of Block Copolymer−Homopolymer Ternary Blends [My Copy] Macromolecules, Vol. 42, No. 14. (28 July 2009), pp. 5139-5145. by Karl O. Stuen, Carla S. Thomas, Guoliang Liu, Nicola Ferrier, Paul F. Nealey posted to etching ps-b-pmma by tbenanti on 2009-07-23 23:55:16 as
	Wet etching of GaN grown by molecular beam epitaxy on Si(111) [My Copy] Semiconductor Science and Technology, Vol. 15, No. 10. (2000), pp. 996-1000. by T. Palacios, F. Calle, M. Varela, et al.C. Ballesteros, E. Monroy, F. B. Naranjo, M. A. Sanchez-Garcia, E. Calleja, E. Munoz posted to etching by Nitrides-TL-NTU on 2009-07-15 11:41:25 as
	Defects in wide band-gap semiconductors: selective etching and calibration by complementary methods [My Copy] The European Physical Journal Applied Physics, Vol. 27, No. 1-3. (July 2004), pp. 37-41. by J. L. Weyher, L. Macht posted to etching by Nitrides-TL-NTU on 2009-07-15 10:38:48 as
	Effects of GaN-buffer etching in atmospheric-pressure MOVPE growth of InN on sapphire [My Copy] physica status solidi (c), Vol. 3, No. 6. (2006), pp. 1507-1510. by A. Yamamoto, Y. Nagai, H. Miwa, A. Hashimoto posted to etching by Nitrides-TL-NTU on 2009-07-15 10:27:48 as
	Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution [My Copy] Surface and Coatings Technology, Vol. 198, No. 1-3. (01 August 2005), pp. 314-318. by C. Iliescu, J. Jing, F. Tay, J. Miao, T. Sun posted to etching hf by JohnnyP on 2009-06-30 23:07:41 as
	Analysis of surface roughness of optical elements planarized by nonadiabatic optical near-field etching [My Copy] Journal of Applied Physics, Vol. 105, No. 6. (2009), 063516. by Makoto Naruse, Takashi Yatsui, Wataru Nomura, Kazuya Hirata, Yoshinori Tabata, Motoichi Ohtsu posted to etching optics processing sidewall_roughness by kristgy on 2009-06-30 13:43:55 as
	Anisotropic chemical etching of semipolar {10\bar 1\bar 1}\mbox / {10\bar 1+1} ZnO crystallographic planes: polarity versus dangling bonds [My Copy] Nanotechnology, Vol. 20, No. 6. (2009), 065701. by E. Palacios-Lidon, B. Perez-Garcia, P. Vennegues, J. Colchero, V. Munoz-Sanjose, J. Zuniga-Perez posted to etching zno by lpatters to the group ZnO_project on 2009-06-25 17:05:18 as
	Effect of chemical etching on the luminescent properties of zinc oxide nanorods [My Copy] Inorganic Materials, Vol. 44, No. 9., pp. 960-964. by A. N. Gruzintsev, A. N. Redâkin, E. E. Yakimov, C. Barthou posted to etching luminescent nanorods zno by lpatters to the group ZnO_project on 2009-06-25 17:00:01 as along with 1 person kalavathysanthi
	Ultracompact multimode interference 3-dB coupler with strong lateral confinement by deep dry etching [My Copy] Photonics Technology Letters, IEEE In Photonics Technology Letters, IEEE, Vol. 12, No. 5. (2000), pp. 492-494. by Yong Ma, Seoijin Park, Liwei Wang, Seng T. Ho posted to etching experiment fabrication indium_phosphide multimode optics splitting waveguide by kristgy on 2009-06-11 16:39:15 as
	Selective Etching of SiGe on SiGe/Si Heterostructures [My Copy] Journal of The Electrochemical Society, Vol. 138, No. 1. (1991), pp. 202-204. by G. K. Chang, T. K. Carns, S. S. Rhee, K. L. Wang posted to bessy etching sige by JohnnyP on 2009-05-24 14:00:36 as
	Chemical Etching of Si[sub 1 - x]Ge[sub x] in HF:H[sub 2]O[sub 2]:CH[sub 3]COOH [My Copy] Journal of The Electrochemical Society, Vol. 142, No. 4. (1995), pp. 1260-1266. by T. K. Cams, M. O. Tanner, Wang posted to bessy etching sige by JohnnyP on 2009-05-24 14:00:11 as
	Etch characteristics of KOH, TMAH and dual doped TMAH for bulk micromachining of silicon [My Copy] Microelectronics Journal, Vol. 37, No. 6. (June 2006), pp. 519-525. by K. Biswas, S. Kal posted to etching koh tmah by JohnnyP on 2009-05-21 12:53:08 as
	Etching-back of uniaxially strained silicon on insulator investigated by spectroscopic ellipsometry [My Copy] physica status solidi (a), Vol. 205, No. 4. (2008), pp. 841-844. by C. Himcinschi, R. Singh, O. Moutanabbir, et al.R. Scholz, M. Reiche, S. H. Christiansen, U. Gösele, D. R. T. Zahn posted to etching ssoi tmah by JohnnyP on 2009-05-21 12:31:35 as
	Relaxed graded SiGe donor substrates incorporating hydrogen-gettering and buried etch stop layers for strained silicon layer transfer applications [My Copy] Journal of Applied Physics, Vol. 101, No. 1. (2007), 013522. by David M. Isaacson, Arthur J. Pitera, Eugene A. Fitzgerald posted to etching sige tmah by JohnnyP on 2009-05-21 12:25:45 as
	Nanoscale patterning of Si/SiGe heterostructures by electron-beam lithography and selective wet-chemical etching [My Copy] Semiconductor Science and Technology, Vol. 15, No. 8. (2000), pp. 862-867. by U. Wieser, D. Iamundo, U. Kunze, T. Hackbarth, U. Konig posted to etching sige tmah by JohnnyP on 2009-05-20 16:35:58 as
	Wet etching of undercut sidewalls in ?001?-silicon [My Copy] Sensors and Actuators A: Physical, Vol. 79, No. 1. (25 January 2000), pp. 55-63. by J. Frühauf posted to etching ipa koh by JohnnyP on 2009-05-20 16:02:35 as
	Characterization of prototype silicon pitch artifacts fabricated by scanning probe lithography and anisotropic wet etching [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 1. (2005), pp. 66-71. by F. S. S. Chien, W. F. Hsieh, S. Gwo, et al.J. Jun, R. M. Silver, A. E. Vladár, J. A. Dagata posted to etching lao tmah by JohnnyP on 2009-05-19 16:35:15 as
	Nanomachining of (110)-oriented silicon by scanning probe lithography and anisotropic wet etching [My Copy] Applied Physics Letters, Vol. 75, No. 16. (1999), pp. 2429-2431. by F. S. S. Chien, C. L. Wu, Y. C. Chou, T. T. Chen, S. Gwo, W. F. Hsieh posted to etching koh lao by JohnnyP on 2009-05-19 16:11:46 as
	Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching [My Copy] Journal of Applied Physics, Vol. 91, No. 12. (2002), pp. 10044-10050. by F. S. S. Chien, W. F. Hsieh, S. Gwo, A. E. Vladar, J. A. Dagata posted to afm etching lao tmah by JohnnyP on 2009-05-19 15:45:15 as
	Microstructures etched in doped TMAH solutions [My Copy] Microelectronic Engineering, Vol. 53, No. 1-4. (June 2000), pp. 547-551. by S. Brida, A. Faes, V. Guarnieri, et al.F. Giacomozzi, B. Margesin, M. Paranjape, G. Pignatel, M. Zen posted to etching tmah by JohnnyP on 2009-05-19 11:04:24 as
	Investigation of TMAH for front-side bulk micromachining process from manufacturing aspect [My Copy] Sensors and Actuators A: Physical, Vol. 92, No. 1-3. (1 August 2001), pp. 375-383. by J. Tsaur posted to etching tmah by JohnnyP on 2009-05-19 11:00:14 as
	Surface roughness of single-crystal silicon etched by TMAH solution [My Copy] Sensors and Actuators A: Physical, Vol. 90, No. 3. (20 May 2001), pp. 223-231. by M. Shikida posted to etching tmah by JohnnyP on 2009-05-19 10:55:18 as
	Roughening of single-crystal silicon surface etched by KOH water solution [My Copy] Sensors and Actuators A: Physical, Vol. 73, No. 1-2. (9 March 1999), pp. 122-130. by K. Sato posted to etching koh by JohnnyP on 2009-05-19 10:50:29 as
	Silicon anisotropic etching in alkaline solutions II on the influence of anisotropy on the smoothness of etched surfaces [My Copy] Sensors and Actuators A: Physical, Vol. 70, No. 3. (30 October 1998), pp. 260-268. by I. Zubel posted to etching ipa koh roughness by JohnnyP on 2009-05-18 10:29:54 as
	Silicon anisotropic etching in alkaline solutions I. The geometric description of figures developed under etching Si(100) in various solutions [My Copy] Sensors and Actuators A: Physical, Vol. 70, No. 3. (30 October 1998), pp. 250-259. by I. Barycka posted to etching ipa koh by JohnnyP on 2009-05-18 10:28:07 as
	Effects of mechanical agitation and surfactant additive on silicon anisotropic etching in alkaline KOH solution [My Copy] Sensors and Actuators A: Physical, Vol. 119, No. 1. (28 March 2005), pp. 263-270. by C. Yang, P. Chen, Y. Chiou, R. Lee posted to etching ipa koh by JohnnyP on 2009-05-18 10:19:15 as
	The characteristic behavior of TMAH water solution for anisotropic etching on both Silicon substrate and SiO2 layer [My Copy] Sensors and Actuators A: Physical, Vol. 93, No. 2. (30 September 2001), pp. 132-137. by P. Chen posted to etching roughness tmah by JohnnyP on 2009-05-18 10:00:59 as
	The influence of atomic configuration of (h k l) planes on adsorption processes associated with anisotropic etching of silicon [My Copy] Sensors and Actuators A: Physical, Vol. 94, No. 1-2. (31 October 2001), pp. 76-86. by I. Zubel posted to etching ipa koh by JohnnyP on 2009-05-18 09:57:08 as
	The effect of isopropyl alcohol on etching rate and roughness of (1 0 0) Si surface etched in KOH and TMAH solutions [My Copy] Sensors and Actuators A: Physical, Vol. 93, No. 2. (30 September 2001), pp. 138-147. by I. Zubel posted to etching ipa koh roughness tmah by JohnnyP on 2009-05-18 09:54:27 as
	Microwave enhanced fast anisotropic etching of monocrystalline silicon [My Copy] Sensors and Actuators A: Physical, Vol. 85, No. 1-3. (25 August 2000), pp. 133-138. by J. Dziuban posted to etching koh by JohnnyP on 2009-05-18 09:48:58 as
	Silicon anisotropic etching in alkaline solutions III: On the possibility of spatial structures forming in the course of Si(100) anisotropic etching in KOH and KOH+IPA solutions [My Copy] Sensors and Actuators A: Physical, Vol. 84, No. 1-2. (1 August 2000), pp. 116-125. by I. Zubel posted to etching ipa koh by JohnnyP on 2009-05-18 09:42:14 as
	Silicon anisotropic etching in alkaline solutions IV The effect of organic and inorganic agents on silicon anisotropic etching process [My Copy] Sensors and Actuators A: Physical, Vol. 87, No. 3. (5 January 2001), pp. 163-171. by I. Zubel posted to etching ipa koh tmah by JohnnyP on 2009-05-17 21:56:29 as
	Anisotropic etching of 100 and 110 planes in (100) silicon [My Copy] Journal of Micromechanics and Microengineering, Vol. 11, No. 3. (2001), pp. 217-220. by Oliver Powell, Barry H. Harrison posted to etching koh by JohnnyP on 2009-05-17 21:14:21 as
	The effect of alcohol additives on etching characteristics in KOH solutions [My Copy] Sensors and Actuators A: Physical, Vol. 101, No. 3. (30 October 2002), pp. 255-261. by I. Zubel posted to etching ipa koh by JohnnyP on 2009-05-16 21:09:30 as
	A survey on the reactive ion etching of silicon in microtechnology [My Copy] Journal of Micromechanics and Microengineering, Vol. 6, No. 1. (1996), pp. 14-28. by Henri Jansen, Han Gardeniers, Meint Boer, Miko Elwenspoek, Jan Fluitman posted to etching silicon-nanograss by JonasGroten on 2009-04-15 09:45:13 as
	Super-Hydrophobic PDMS Surface with Ultra-Low Adhesive Force [My Copy] Macromolecular Rapid Communications, Vol. 26, No. 22. (2005), pp. 1805-1809. by Meihua Jin, Xinjian Feng, Jinming Xi, et al.Jin Zhai, Kilwon Cho, Lin Feng, Lei Jiang posted to dual-scale-roughness etching pdms superhydrophobic surface by JonasGroten on 2009-04-09 14:08:05 as
	Vapor Hydrofluoric Acid Sacrificial Release Technique for Micro Electro Mechanical Systems Using Labware [My Copy] Japanese Journal of Applied Physics, Vol. 42, No. Part 1, No. 6A. (15 June 2003), pp. 3690-3694. by Yamato Fukuta, Hiroyuki Fujita, Hiroshi Toshiyoshi posted to etching hf mems processing silicon_oxide vapor by kristgy on 2009-04-06 09:47:55 as
	Wet anisotropic etching for fluidic 1D nanochannels [My Copy] Journal of Micromechanics and Microengineering, Vol. 13, No. 4. (2003), pp. S62-S66. by J. Haneveld, H. Jansen, E. Berenschot, N. Tas, M. Elwenspoek posted to etching nanofluids by coldav on 2009-04-03 17:20:47 as
	High resolution study of etch figures on CaF[sub 2] (111) [My Copy] Journal of Applied Physics, Vol. 105, No. 6. (2009), 064309. by Christian Motzer, Michael Reichling posted to afm caf2 etching by JohnnyP on 2009-03-27 14:11:01 as
	Nanotextured super-hydrophobic transparent poly(methyl methacrylate) surfaces using high-density plasma processing [My Copy] Nanotechnology, Vol. 18, No. 12. (2007) by Nikolaos Vourdas, Angeliki Tserepi, Evangelos Gogolides posted to etching plasma polymer superhydrophobic by JonasGroten on 2009-03-09 14:22:23 as along with 1 person freddan
	Partial release and detachment of microfabricated metal and polymer structures by anodic metal dissolution [My Copy] Microelectromechanical Systems, Journal of In Microelectromechanical Systems, Journal of, Vol. 14, No. 2. (2005), pp. 383-391. by S. Metz, A. Bertsch, P. Renaud posted to electrochemistry etching mems by msterner on 2009-02-24 09:31:27 as
	Improvements in the fabrication of microstructured fiber Bragg grating sensors [My Copy] Third European Workshop on Optical Fibre Sensors, Vol. 6619, No. 1. (2007) by D. Paladino, A. Iadicicco, G. Servodio, et al.S. Campopiano, A. Cutolo, M. Giordano, A. Cusano edited by Antonello Cutolo, Brian Culshaw, Jos posted to etching fbg by Alemohammad on 2009-02-05 21:44:30 as
	Design and characteristics of refractive index sensor based on thinned and microstructure fiber Bragg grating [My Copy] Appl. Opt., Vol. 47, No. 4. (1 February 2008), pp. 504-511. by Xue-Feng Huang, Zhe-Min Chen, Li-Yang Shao, et al.Ke-Fa Cen, De-Ren Sheng, Jun Chen, Hao Zhou posted to etching fbg index refractive sensor by Alemohammad on 2009-02-05 21:42:23 as

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silicon	26
microfabrication	17
icp	15
sapphire	15
koh	14
plasma	14
drie	13
anisotropic_etching	12
tmah	12
tungsten	12
bosch_process	10
ipa	9
microchannels	9
micromachining	9
mems	8
rie	8
processing	7
cl2	6
poly-si	6
wet_etching	6
fbg	5
metal	5
process	5
xps	5
cl2-o2	4
hf	4
hfo2	4
high-k	4
index	4
optics	4
optimization	4
refractive	4
review	4
sige	4
silicon_oxide	4
wet	4
zno	4
3d_integration	3
anodic_bonding	3
bcl3	3
bulk_micromachining	3
cf4-o2	3
chemical	3
chromium	3
copper	3
diamond	3
dielectric	3
etch_rates	3
fabrication	3
fluorocarbon	3
gate	3
hbr-cl2-o2	3
interconnects	3
lao	3
materials	3
oxidation	3
plasmas	3
rie_etching	3
roughness	3
sensor	3
silicon_nitride	3
tin	3
via	3
wafer_stack	3
waferbonding	3
absorption	2
afm	2
bessy	2
bosch	2
cf4	2
characterization	2
dissociation	2
ecr	2
electroplating	2
experiment	2
fusionbonding	2
heat_transfer	2
integrated_sensor	2
isotropic_etching	2
luminescent	2
mass-spectrometry	2
microfluidics	2
molybdenum	2
nanorods	2
nanowires	2
parois	2
recess	2
sf6	2
sf6-n2	2
sf6-o2	2
silicon-nanograss	2
sio2	2
superhydrophobic	2
surface_roughness	2
wsi	2
bondstrength	1
caf2	1
microsystems	1
piranha_regeneration	1
production	1

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