Register | Log in | FAQ      [?] 

Tag hfo2 [13 articles]

Recent papers classified by the tag hfo2.
  • notes Evaluation of the effectiveness of H[sub 2] plasmas in removing boron from Si after etching of HfO[sub 2] films in BCl[sub 3] plasmas
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 2. (2005), pp. 547-553.
    by C Wang, VM Donnelly
    posted to bcl3 etching hfo2 plasma by these_morel on 2006-02-17 15:28:10 as read along with 1 group LTM_LETI_etching
  • notes Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 4. (2004), pp. 1552-1558.
    by Jinghao Chen, Won J Yoo, Zerlinda YL Tan, Yingqian Wang, Daniel SH Chan
    posted to cl2-o2 hbr-o2 hfalo hfo2 hfon hfsio high-k by these_morel on 2006-02-17 15:12:43 as read along with 1 group LTM_LETI_etching
  • Etching characteristics of high-k dielectric HfO[sub 2] thin films in inductively coupled fluorocarbon plasmas
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 23, No. 6. (2005), pp. 1691-1697.
    by Kazuo Takahashi, Kouichi Ono, Yuichi Setsuhara
    posted to etching fluocarbon hfo2 plasma xps by these_morel on 2006-12-13 15:40:29 as read along with 1 group LTM_LETI_etching
  • notes Improvement in high-k (HfO/sub 2//SiO/sub 2/) reliability by incorporation of fluorine
    Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International (2005), 4 pp..
    by K Seo, R Sreenivasan, PC Mclntyre, KC Saraswat
    posted to fluorine hfo2 incorporation by these_morel on 2006-12-14 14:01:11 as read along with 1 group LTM_LETI_etching
  • notes Selective etching of high-k HfO[sub 2] films over Si in hydrogen-added fluorocarbon (CF[sub 4]/Ar/H[sub 2] and C[sub 4]F[sub 8]/Ar/H[sub 2]) plasmas
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, No. 3. (2006), pp. 437-443.
    by Kazuo Takahashi, Kouichi Ono
    posted to etching fluocarbon hfo2 plasmas xps by these_morel on 2006-12-13 15:38:19 as read along with 1 group LTM_LETI_etching
  • Plasma etching of HfO[sub 2] at elevated temperatures in chlorine-based chemistry
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, No. 1. (2006), pp. 30-40.
    by M Helot, T Chevolleau, L Vallier, O Joubert, E Blanquet, A Pisch, P Mangiagalli, T Lill
    posted to cl2 dielectric etching hfo2 high-k by these_morel on 2006-02-21 09:56:36 as ** along with 1 group LTM_LETI_etching
  • Plasma etching of high dielectric constant materials on silicon in halogen chemistries
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 1. (2004), pp. 88-95.
    by Lin Sha, Jane P Chang
    posted to bcl3 cl2 hfo2 high-k zro2 by these_morel on 2006-02-21 09:44:45 as ** along with 1 group LTM_LETI_etching
  • notes Effects of Annealing and Ar Ion Bombardment on the Removal of HfO[sub 2] Gate Dielectric
    Electrochemical and Solid-State Letters, Vol. 7, No. 3. (2004), pp. F18-F20.
    by Jinghao Chen, Won J Yoo, Daniel SH Chan, Dim L Kwong
    posted to ar hf hfo2 high-k icp plasma wet-etching by these_morel on 2006-02-17 15:00:46 as read along with 1 group LTM_LETI_etching
  • Ion-enhanced chemical etching of HfO[sub 2] for integration in metal--oxide--semiconductor field effect transistors
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 6. (2003), pp. 2420-2427.
    by Lin Sha, Ragesh Puthenkovilakam, You S Lin, Jane P Chang
    posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:36:28 as ** along with 1 group LTM_LETI_etching
  • notes Plasma etching of high-k and metal gate materials
    Vacuum, Vol. In Press, Corrected Proof
    by Keisuke Nakamura, Tomohiro Kitagawa, Kazushi Osari, Kazuo Takahashi, Kouichi Ono
    posted to ecr hfo2 high-k metal by these_morel on 2006-02-17 15:39:06 as read along with 1 group LTM_LETI_etching
  • Etch characteristics of HfO2 films on Si substrates
    Applied Surface Science, Vol. 187, No. 1-2. (14 February 2002), pp. 75-81.
    by S Norasetthekul, PY Park, KH Baik, KP Lee, JH Shin, BS Jeong, V Shishodia, DP Norton, SJ Pearton
    posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:28:42 as ** along with 1 group LTM_LETI_etching
  • notes Implementation of high-k and metal gate materials for the 45 nm node and beyond: gate patterning development
    Microelectronics and Reliability, Vol. 45, No. 5-6. ( 2005), pp. 1007-1011.
    by S Beckx, M Demand, S Locorotondo, K Henson, M Claes, V Paraschiv, D Shamiryan, P Jaenen, W Boullart, S Degendt
    posted to hfo2 metal-gate poly-si ruthenium tan tin by these_morel on 2006-02-17 15:34:25 as read along with 1 group LTM_LETI_etching
  • Single Metal Gate on High-k Gate Stacks for 45nm Low Power CMOS
    Electron Devices Meeting, 2006. IEDM '06. International (2006), pp. 1-4.
    by WJ Taylor, C Capasso, B Min, B Winstead, E Verret, K Loiko, D Gilmer, RI Hegde, J Schaeffer, J Schaeffer, E Luckowski, A10, A Martinez, A11, M Raymond, A12, C Happ, A13, DH Triyoso, A14, S Kalpat, A15, A Haggag, A16, D Roan, A17, JY Nguyen, A18, LB La, A19, L Hebert, A20, J Smith, A21, D Jovanovic, A22, D Burnett, A23, M Foisy, A24, N Cave, A25, PJ Tobin, A26, SB Samavedam, A27, Jr, A28, S Venkatesan, A29
    posted to tac metal-gate high-k hfo2 by these_morel on 2008-05-21 07:12:22 as **
    • Note: You may cite this page as: http://www.citeulike.org/tag/hfo2

    RIS BibTeX RSS
    CiteULike organises scholarly (or academic) papers or literature and provides bibliographic (which means it makes bibliographies) for universities and higher education establishments. It helps undergraduates and postgraduates. People studying for PhDs or in postdoctoral (postdoc) positions. The service is similar in scope to EndNote or RefWorks or any other reference manager like BibTeX, but it is a social bookmarking service for scientists and humanities researchers.