Tag pecvd [46 articles] Export

Recent papers classified by the tag pecvd.

	NanoSi low loss horizontal slot waveguides coupled to high Q ring resonators [My Copy] In Opt. Express, Vol. 17, No. 23. (9 November 2009), pp. 20762-20770. by Romain Guider, Nicola Daldosso, Alessandro Pitanti, Emmanuel Jordana, Jean-Marc Fedeli, Lorenzo Pavesi posted to waveguide tunable soi slot_waveguide silicon_oxide silicon ring_resonator photonics pecvd non_linear nanoparticles horizontal experiment citing_me by kristgy on 2009-12-06 11:12:05 as
	Dielectric properties of amorphous hydrogenated silicon carbide thin films grown by plasma-enhanced chemical vapor deposition [My Copy] Journal of Applied Physics, Vol. 93, No. 7. (2003), 4066. by D. Brassard, M. A. El Khakani posted to sic pecvd dielectric by DBgit on 2009-10-21 18:20:44 as
	Free-standing thin film Ge single crystals grown by plasma-enhanced chemical vapor deposition [My Copy] Journal of Applied Physics, Vol. 55, No. 6. (1984), pp. 1461-1463. by R. A. Outlaw, Jr posted to cristallin detached ge germanium growth pecvd by Javi on 2009-05-06 17:49:52 as
	A comparison of microcrystalline silicon prepared by plasma-enhanced chemical vapor deposition and hot-wire chemical vapor deposition: electronic and device properties [My Copy] Journal of Materials Science: Materials in Electronics, Vol. 14, No. 10. (1 October 2003), pp. 625-628. by R. Carius, T. Merdzhanova, Finger, Finger, S. Klein, O. Vetterl posted to device electronic hwcvd microcrystalline pecvd properties silicon by jefields on 2009-04-28 21:36:37 as
	Defect states in microcrystalline silicon probed by photoluminescence spectroscopy [My Copy] Thin Solid Films, Vol. 511-512 (26 July 2006), pp. 394-398. by T. Merdzhanova, R. Carius, S. Klein, F. Finger, D. Dimovamalinovska posted to defect hwcvd microcrystalline oxygen pecvd photoluminescence silicon by jefields on 2009-04-28 21:31:52 as
	Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films [My Copy] Journal of Non-Crystalline Solids, Vol. 266-269 (May 2000), pp. 31-37. by P. Rocaicabarrocas posted to amorphe arcam conditions microcrystalline pecvd plasma polymorphe by Javi on 2009-04-28 16:02:41 as
	Control of plasma chemistry for preparing highly stabilized amorphous silicon at high growth rate [My Copy] Solar Energy Materials and Solar Cells, Vol. 78, No. 1-4. (July 2003), pp. 3-26. by A. Matsuda posted to amorphe growth model pecvd plasma si silicium by Javi on 2009-04-28 13:41:13 as
	Mono- and disilicon radicals in silane and silane-argon dc discharges [My Copy] Journal of Applied Physics, Vol. 59, No. 10. (1986), pp. 3402-3411. by Robert Robertson, Alan Gallagher posted to growth model pecvd plasma si silicium by Javi on 2009-04-27 18:17:35 as
	Abstraction of hydrogen by SiH3 from hydrogen-terminated Si(001)-(2×1) surfaces [My Copy] Surface Science, Vol. 418, No. 1. (27 November 1998), pp. L8-L13. by S. Ramalingam posted to growth model pecvd plasma si silicium by Javi on 2009-04-27 18:11:22 as
	Particles in silicon deposition discharges [My Copy] Solar Energy Materials and Solar Cells, Vol. 78, No. 1-4. (July 2003), pp. 27-40. by A. Gallagher posted to growth model pecvd plasma si by Javi on 2009-04-27 14:01:50 as
	Hydrogenated microcrystalline silicon germanium: A bottom cell material for amorphous silicon-based tandem solar cells [My Copy] Applied Physics Letters, Vol. 69, No. 27. (1996), pp. 4224-4226. by G. Ganguly, T. Ikeda, T. Nishimiya, K. Saitoh, M. Kondo, A. Matsuda posted to ge growth microcrystalline pecvd by Javi on 2009-04-27 13:42:57 as
	Epitaxial film thickness in the low-temperature growth of Si(100) by plasma enhanced chemical vapor deposition [My Copy] Applied Physics Letters, Vol. 68, No. 3. (1996), pp. 349-351. by W. J. Varhue, J. L. Rogers, P. S. Andry, E. Adams posted to conditions epitaxial growth model pecvd si by Javi on 2009-04-23 14:59:06 as
	A fully automated hot-wall multiplasma-monochamber reactor for thin film deposition [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 9, No. 4. (1991), pp. 2331-2341. by Roca, J. B. Chévrier, J. Huc, A. Lloret, J. Y. Parey, J. P. M. Schmitt posted to arcam pecvd by Javi on 2009-04-17 14:54:08 as
	Strong white and blue photoluminescence from silicon nanocrystals in SiNx grown by remote PECVD using SiCl4/NH3 [My Copy] Nanotechnology, Vol. 18, No. 15. (2007), 155704. by A. Benami, G. Santana, A. Ortiz, et al.A. Ponce, D. Romeu, J. Aguilar-Hernandez, G. Contreras-Puente, J. C. Alonso posted to nanocrystals nitride pecvd photoluminescence remote silicon by abdoutadi on 2009-03-12 18:36:39 as
	Effect of oxide thickness on the low temperature (<= 400 [degree]C) growth of cone-shaped silicon nanowires [My Copy] Journal of Applied Physics, Vol. 102, No. 4. (2007) by Yang G. Jung, Sang W. Jee, Jung H. Lee posted to nanowire pecvd silicon by rcollins on 2009-01-14 01:35:44 as
	Synthesis and optical properties of silicon nanowires grown by different methods [My Copy] Applied Physics A: Materials Science & Processing, Vol. 85, No. 3. (17 November 2006), pp. 247-253. by A. Colli, S. Hofmann, A. Fasoli, et al.A. C. Ferrari, C. Ducati, R. E. Dunin-Borkowski, J. Robertson posted to cvd nanowire pecvd silicon by rcollins on 2009-01-14 01:32:07 as
	Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrix [My Copy] Journal of Applied Physics, Vol. 103, No. 6. (2008) by U. Coscia, G. Ambrosone, D. K. Basa posted to manufacturing pecvd plmeasurements sic by LarsOlav on 2008-11-21 10:51:38 as
	High efficiency visible electroluminescence from silicon nanocrystals embedded in silicon nitride using a transparent doping layer [My Copy] Applied Physics Letters, Vol. 86, No. 7. (2005) by Kwan S. Cho, Nae M. Park, Tae Y. Kim, Kyung H. Kim, Gun Y. Sung, Jung H. Shin posted to efficiency electroluminescence pecvd sic sin sinc by rvsj on 2008-10-06 08:41:28 as
	Abscheidung dünner Polymerschichten mit technischer und biologischer Funktion durch Niederdruck-Plasma [My Copy] (03 August 2006) by Vincenzo Sciarratta posted to analysemethoden carboxygroups niederdruckplasma pdms pecvd plasmamodifizierung polymers by chem-pion on 2008-09-08 22:20:21 as
	Principles of plasma discharges and materials processing [My Copy] (1994) by M. A. Lieberman, Allan J. Lichtenberg posted to magnetron pecvd plasma processing sputtering theory by kristgy on 2008-09-06 18:06:42 as
	Stress investigation of PECVD dielectric layers for advanced optical MEMS [My Copy] Journal of Micromechanics and Microengineering, Vol. 14, No. 3. (2004), pp. 317-323. by A. Tarraf, J. Daleiden, S. Irmer, D. Prasai, H. Hillmer posted to mems pecvd stress by ina-kassel on 2008-03-01 20:25:11 as along with 1 person hukrause
	Molecular transport in a crowded volume created from vertically aligned carbon nanofibres: a fluorescence recovery after photobleaching study [My Copy] Nanotechnology, Vol. 17, No. 22. (28 November 2006), pp. 5659-5668. by Fowlkes, D., Hullander, et al. E.D., Fletcher, B.L., Retterer, S.T., Melechko, A.V., Hensley, D.K., Simpson, M.L., Doktycz, M.J. posted to carbon fluorescence pecvd transport by Freecat to the group VACNF on 2007-11-21 21:58:57 as along with 1 person caseychanmd
	Structural and optical properties of silicon oxynitride on silicon planar waveguides [My Copy] Applied Optics, Vol. 29, No. 24. (1990), pp. 3489-3496. by Massimo D. Giudice, Franco Bruno, Tito Cicinelli, Marco Valli posted to absorption pecvd processing silicon_nitride by kristgy on 2007-05-29 13:45:22 as
	The hydrogen content of plasma-deposited silicon nitride [My Copy] Journal of Applied Physics, Vol. 49, No. 4. (1978), pp. 2473-2477. by W. A. Lanford, M. J. Rand posted to absorption experiment pecvd processing silicon_nitride by kristgy on 2007-05-28 20:41:20 as along with 1 person hameiriz
	Elastic stiffness and thermal expansion coefficients of various refractory silicides and silicon nitride films [My Copy] Thin Solid Films, Vol. 70, No. 2. (1 August 1980), pp. 241-247. by T. F. Retajczyk, A. K. Sinha posted to experiment lpcvd pecvd processing silicon_nitride stress thermo_mechanic by kristgy on 2007-05-02 14:53:44 as
	Thermal stresses and cracking resistance of dielectric films (SiN, Si[sub 3]N[sub 4], and SiO[sub 2]) on Si substrates [My Copy] Journal of Applied Physics, Vol. 49, No. 4. (1978), pp. 2423-2426. by A. K. Sinha, H. J. Levinstein, T. E. Smith posted to experiment lpcvd pecvd processing silicon_nitride silicon_oxide stress thermo_mechanic by kristgy on 2007-05-02 14:46:45 as
	Optical properties of thin-film silicon-compatible materials [My Copy] Applied Optics, Vol. 36, No. 21. (1997), pp. 5122-5128. by Daniel P. Poenar, Reinoud F. Wolffenbuttel posted to silicon_oxynitride bpsg bsg experiment lpcvd pecvd psg refractive_index silicon_nitride silicon_oxide spectroscopy by kristgy on 2007-04-18 10:10:27 as
	A two-level metal fully planarized interconnect structure implemented on a 64 kb CMOS SRAM [My Copy] VLSI Multilevel Interconnection Conference, 1989. Proceedings., Sixth International IEEE (1989), pp. 26-32. by D. Moy, M. Schadt, C. K. Hu, et al.F. Kaufman, A. K. Ray, N. Mazzeo, E. Baran, D. J. Pearson posted to etch-back experiment pecvd processing silane silicon_oxide sputtering by kristgy on 2006-12-04 12:38:23 as
	Fluorescent Plasma Nanocomposite Thin Films Containing Nonaggregated Rhodamine 6G Laser Dye Molecules [My Copy] Langmuir, Vol. 22, No. 16. (1 August 2006), pp. 6719-6722. by A. Barranco, P. Groening posted to deposition dye first_paper hardcopy pecvd phodye phodye_group_papers polymeric processing by kristgy on 2006-11-22 15:21:11 as
	Properties of borophosphosilicate glass films deposited by different chemical vapor deposition techniques [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 10, No. 2. (1992), pp. 633-642. by S. Rojas, R. Gomarasca, L. Zanotti, et al.A. Borghesi, A. Sassella, G. Ottaviani, L. Moro, P. Lazzeri posted to bpsg deposition experiment hardcopy lpcvd pecvd processing reflow silicon_oxide by kristgy on 2006-10-24 13:21:44 as
	Synthesis of well-aligned multiwalled carbon nanotubes on Ni catalyst using radio frequency plasma-enhanced chemical vapor deposition [My Copy] Thin Solid Films, Vol. 388, No. 1-2. (1 June 2001), pp. 73-77. by G. W. Ho, A. T. S. Wee, J. Lin, W. C. Tjiu posted to mwnt nickel pecvd thin-film by cardinal on 2005-08-31 18:25:06 as
	Single-walled carbon nanotubes produced by plasma-enhanced chemical vapor deposition [My Copy] Chemical Physics Letters, Vol. 381, No. 3-4. (14 November 2003), pp. 422-426. by Toshiaki Kato, Goo-Hwan Jeong, Takamichi Hirata, Rikizo Hatakeyama, Kazuyuki Tohji, Kenichi Motomiya posted to cobalt hydrogen iron methane pecvd swnt zeolite by cardinal on 2005-07-03 22:28:55 as
	Structure of carbon nanotubes grown by microwave-plasma-enhanced chemical vapor deposition [My Copy] Applied Physics Letters, Vol. 77, No. 21. (2000), pp. 3468-3470. by M. Okai, T. Muneyoshi, T. Yaguchi, S. Sasaki posted to hydrogen iron methane microwave nanofiber nickel pecvd by cardinal on 2005-07-01 22:52:21 as
	Nucleation and growth of carbon nanotubes by microwave plasma chemical vapor deposition [My Copy] Applied Physics Letters, Vol. 77, No. 17. (2000), pp. 2767-2769. by Chris Bower, Otto Zhou, Wei Zhu, D. J. Werder, Sungho Jin posted to acetylene ammonia cobalt microwave pecvd thin-film by cardinal on 2005-07-01 22:49:11 as
	Plasma-induced alignment of carbon nanotubes [My Copy] Applied Physics Letters, Vol. 77, No. 6. (2000), pp. 830-832. by Chris Bower, Wei Zhu, Sungho Jin, Otto Zhou posted to acetylene alignment ammonia cobalt microwave pecvd by cardinal on 2005-07-01 22:48:11 as along with 1 person wenhaosparty
	Bias-enhanced nucleation and growth of the aligned carbon nanotubes with open ends under microwave plasma synthesis [My Copy] Applied Physics Letters, Vol. 74, No. 23. (1999), pp. 3462-3464. by S. H. Tsai, C. W. Chao, C. L. Lee, H. C. Shih posted to bias hydrogen methane microwave palladium pecvd by cardinal on 2005-07-01 22:46:13 as
	Growth of highly oriented carbon nanotubes by plasma-enhanced hot filament chemical vapor deposition [My Copy] Applied Physics Letters, Vol. 73, No. 26. (1998), pp. 3845-3847. by Z. P. Huang, J. W. Xu, Z. F. Ren, J. H. Wang, M. P. Siegal, P. N. Provencio posted to acetylene ammonia hot-filament nickel pecvd by cardinal on 2005-07-01 22:42:18 as
	Electron field emission from phase pure nanotube films grown in a methane/hydrogen plasma [My Copy] Applied Physics Letters, Vol. 73, No. 15. (1998), pp. 2113-2115. by Olivier M. Kuttel, Oliver Groening, Christoph Emmenegger, Louis Schlapbach posted to hydrogen iron methane microwave nickel pecvd thin-film by cardinal on 2005-07-01 22:40:26 as
	Growing carbon nanotubes by microwave plasma-enhanced chemical vapor deposition [My Copy] Applied Physics Letters, Vol. 72, No. 26. (1998), pp. 3437-3439. by L. C. Qin, D. Zhou, A. R. Krauss, D. M. Gruen posted to hydrogen iron methane microwave pecvd by cardinal on 2005-07-01 22:39:03 as
	Model based comparison of thermal and plasma chemical vapor deposition of carbon nanotubes [My Copy] Journal of Applied Physics, Vol. 93, No. 1. (2003), pp. 750-752. by D. B. Hash, M. Meyyappan posted to cvd model pecvd by cardinal on 2005-07-01 22:14:01 as
	Growth of multiwall carbon nanotubes in an inductively coupled plasma reactor [My Copy] Journal of Applied Physics, Vol. 91, No. 9. (2002), pp. 6027-6033. by Lance Delzeit, Ian Mcaninch, Brett A. Cruden, et al.David Hash, Bin Chen, Jie Han, M. Meyyappan posted to iron methane multilayer mwnt pecvd thin-film by cardinal on 2005-07-01 22:13:05 as
	Tip growth model of carbon tubules grown on the glass substrate by plasma enhanced chemical vapor deposition [My Copy] Journal of Applied Physics, Vol. 91, No. 1. (2002), pp. 483-486. by Jaehee Han, Ji B. Yoo, Chong Y. Park, et al.Ha J. Kim, Gyeong S. Park, Minho Yang, In T. Han, Naesung Lee, Whikun Yi, Se G. Yu, J. M. Kim posted to nickel pecvd by cardinal on 2005-07-01 22:12:17 as
	Effect of surface morphology of Ni thin film on the growth of aligned carbon nanotubes by microwave plasma-enhanced chemical vapor deposition [My Copy] Journal of Applied Physics, Vol. 88, No. 8. (2000), pp. 4898-4903. by Young C. Choi, Young M. Shin, Seong C. Lim, et al.Dong J. Bae, Young H. Lee, Byung S. Lee, Dong C. Chung posted to nickel pecvd thin-film by cardinal on 2005-07-01 22:09:17 as
	Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition [My Copy] Journal of Applied Physics, Vol. 90, No. 10. (2001), pp. 5308-5317. by M. Chhowalla, K. B. K. Teo, C. Ducati, et al.N. L. Rupesinghe, G. A. J. Amaratunga, A. C. Ferrari, D. Roy, J. Robertson, W. I. Milne posted to acetylene ammonia dc nickel pecvd rate-limiting thin-film by cardinal on 2005-07-01 22:07:57 as
	Growth of aligned carbon nanotubes by plasma-enhanced chemical vapor deposition: Optimization of growth parameters [My Copy] Journal of Applied Physics, Vol. 90, No. 3. (2001), pp. 1529-1533. by M. Tanemura, K. Iwata, K. Takahashi, et al.Y. Fujimoto, F. Okuyama, H. Sugie, V. Filip posted to acetylene ammonia cobalt nickel pecvd by cardinal on 2005-07-01 22:04:33 as
	Growth and emission characteristics of vertically well-aligned carbon nanotubes grown on glass substrate by hot filament plasma-enhanced chemical vapor deposition [My Copy] Journal of Applied Physics, Vol. 88, No. 12. (2000), pp. 7363-7365. by Jae H. Han, Won S. Yang, Ji B. Yoo, Chong Y. Park posted to acetylene ammonia mwnt nickel pecvd by cardinal on 2005-07-01 22:01:42 as

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nickel	9
growth	8
processing	8
silicon	8
experiment	7
silicon_oxide	7
acetylene	6
ammonia	6
methane	6
microwave	6
model	6
plasma	6
thin-film	6
hydrogen	5
iron	5
si	5
silicon_nitride	5
cobalt	4
lpcvd	4
microcrystalline	4
nanowire	4
stress	4
cvd	3
dielectric	3
mwnt	3
sic	3
silicium	3
absorption	2
amorphe	2
annealing	2
arcam	2
bpsg	2
carbon	2
conditions	2
deposition	2
fluorescence	2
ge	2
hardcopy	2
hwcvd	2
photoluminescence	2
sinc	2
sputtering	2
stress_reduction	2
thermo_mechanic	2
transport	2
alignment	1
analysemethoden	1
bias	1
bsg	1
carboxygroups	1
citing_me	1
cristallin	1
dc	1
defect	1
detached	1
device	1
dye	1
efficiency	1
electroluminescence	1
electronic	1
epitaxial	1
etch-back	1
first_paper	1
germanium	1
horizontal	1
hot-filament	1
magnetron	1
mems	1
nanocrystals	1
nanofiber	1
nanoparticles	1
niederdruckplasma	1
nitride	1
non_linear	1
oxygen	1
palladium	1
phodye	1
phodye_group_papers	1
photonics	1
pl	1
plasmamodifizierung	1
plmeasurements	1
polymeric	1
polymers	1
polymorphe	1
psg	1
rate-limiting	1
reflow	1
refractive_index	1
silane	1
silicon_oxynitride	1
slot_waveguide	1
soi	1
spectroscopy	1
swnt	1
theory	1
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tunable	1
waveguide	1
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