Tag photolithography [47 articles] Export

Recent papers classified by the tag photolithography.

	Vertically Coupled Polymer Microdisk Resonators Fabricated by Photolithography Technique [My Copy] Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th (25 June 2007), pp. 2035-2040. by Lin Luan, Sang-Yeon Cho, Nan Jokerst posted to photolithography microdisk microcavities coupling by gagnon_d on 2009-11-11 14:45:39 as along with 1 person kristgy
	Micropatterning Fluid Lipid Bilayers on Solid Supports [My Copy] Science, Vol. 275, No. 5300. (31 January 1997), pp. 651-653. by Jay T. Groves, Nick Ulman, Steven G. Boxer posted to vesicle titanium proj2 photolithography membrane lipid gold fluorescence bilayer adsorption by Buntworthy on 2009-08-24 23:08:19 as along with 2 people and 1 group samjlord rodney Kopelman_Group
	Substrate−Membrane Interactions: Mechanisms for Imposing Patterns on a Fluid Bilayer Membrane [My Copy] Langmuir, Vol. 14, No. 12. (1 June 1998), pp. 3347-3350. by Jay T. Groves, Nick Ulman, Paul S. Cremer, Steven G. Boxer posted to vesicle titanium silicon proj2 photolithography membrane lipid gold fluorescence bilayer array aluminium adsorption by Buntworthy on 2009-08-24 23:07:11 as
	Solution-Processed Full-Color Polymer Organic Light-Emitting Diode Displays Fabricated by Direct Photolithography [My Copy] Advanced Functional Materials, Vol. 17, No. 2. (2007), pp. 191-200. by M. . C. Gather, A. Köhnen, A. Falcou, H. Becker, K. Meerholz posted to photolithography fabrication by aegeddi on 2009-08-16 14:25:15 as
	P-181: Solution-Processed Full-Color Polymer-OLED Displays Fabricated by Direct Photolithography [My Copy] SID Symposium Digest of Technical Papers, Vol. 37, No. 1. (2006), pp. 909-911. by Malte Gather, Anne Köhnen, Klaus Meerholz, Heinrich Becker, Aurélie Falcou posted to photolithography fabrication by aegeddi on 2009-08-16 14:08:56 as
	65 nm feature sizes using visible wavelength 3-D multiphoton lithography [My Copy] Opt. Express, Vol. 15, No. 6. (19 March 2007), pp. 3426-3436. by Wojciech Haske, Vincent W. Chen, Joel M. Hales, et al.Wenting Dong, Stephen Barlow, Seth R. Marder, Joseph W. Perry posted to 311_termpaper photolithography by marissalee on 2009-05-27 01:40:21 as
	Rapid sub-diffraction-limit laser micro/nanoprocessing in a threshold material system [My Copy] Applied Physics Letters, Vol. 80, No. 2. (2002), pp. 312-314. by Tomokazu Tanaka, Hong B. Sun, Satoshi Kawata posted to 311_termpaper photolithography by marissalee on 2009-05-27 01:39:17 as
	One- and Two-Photon Induced Polymerization of Methylmethacrylate Using Colloidal CdS Semiconductor Quantum Dots [My Copy] Journal of the American Chemical Society, Vol. 130, No. 26. (1 July 2008), pp. 8280-8288. by Nicholas C. Strandwitz, Anzar Khan, Shannon W. Boettcher, et al.Alexander A. Mikhailovsky, Craig J. Hawker, Thuc-Quyen Nguyen, Galen D. Stucky posted to 311_termpaper photolithography quantum_dots by marissalee on 2009-05-27 01:38:27 as
	Real three-dimensional microstructures fabricated by photopolymerization of resins through two-photon absorption [My Copy] Opt. Lett., Vol. 25, No. 15. (1 August 2000), pp. 1110-1112. by Hong-Bo Sun, Takeshi Kawakami, Ying Xu, et al.Jia-Yu Ye, Shigeki Matuso, Hiroaki Misawa, Masafumi Miwa, Reizo Kaneko posted to 311_termpaper photolithography two_photons by marissalee on 2009-05-27 01:37:19 as
	Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication [My Copy] Nature, Vol. 398, No. 6722. (4 March 1999), pp. 51-54. by Brian H. Cumpston, Sundaravel P. Ananthavel, Stephen Barlow, et al.Daniel L. Dyer, Jeffrey E. Ehrlich, Lael L. Erskine, Ahmed A. Heikal, Stephen M. Kuebler, Sandy I. Y. Lee, Dianne Mccord-Maughon, Jinqui Qin, Harald Rockel, Mariacristina Rumi, Xiang-Li Wu, Seth R. Marder, Joseph W. Perry posted to 311_termpaper photolithography by marissalee on 2009-05-27 01:35:15 as along with 2 people aspen eeruowl
	Finer features for functional microdevices [My Copy] Nature, Vol. 412, No. 6848. (16 August 2001), pp. 697-698. by Satoshi Kawata, Hong-Bo Sun, Tomokazu Tanaka, Kenji Takada posted to 311_termpaper photolithography by marissalee on 2009-05-27 01:35:01 as
	Two-Color Single-Photon Photoinitiation and Photoinhibition for Subdiffraction Photolithography [My Copy] Science, Vol. 324, No. 5929. (15 May 2009), pp. 913-917. by Timothy F. Scott, Benjamin A. Kowalski, Amy C. Sullivan, Christopher N. Bowman, Robert R. Mcleod posted to photolithography by marissalee on 2009-05-20 01:26:30 as along with 2 people and 1 group rosema samjlord moernerlab
	Confining Light to Deep Subwavelength Dimensions to Enable Optical Nanopatterning [My Copy] Science, Vol. 324, No. 5929. (15 May 2009), pp. 917-921. by Trisha L. Andrew, Hsin-Yu Tsai, Rajesh Menon posted to photolithography by marissalee on 2009-05-20 01:26:22 as
	Two Beams Squeeze Feature Sizes in Optical Lithography [My Copy] Science, Vol. 324, No. 5929. (15 May 2009), pp. 892-893. by Joseph W. Perry posted to photolithography by marissalee on 2009-05-20 01:26:07 as
	Multiphoton polymerization [My Copy] Materials Today, Vol. 10, No. 6. (June 2007), pp. 30-37. by L. Li, J. Fourkas posted to 311_termpaper photolithography by marissalee on 2009-05-20 01:25:49 as along with 1 person aspen
	Multiphoton Fabrication [My Copy] Angewandte Chemie International Edition, Vol. 46, No. 33. (2007), pp. 6238-6258. by Christopher n, John t, Tommaso Baldacchini, Richard a posted to photolithography by marissalee on 2009-05-20 01:25:37 as
	New Directions in 3-D Multiphoton Lithography. [My Copy] APS Meeting Abstracts (March 2006) by J. fourkas, C. lafratta, R. farrer, L. li, M. naughton posted to photolithography by marissalee on 2009-05-20 01:25:12 as
	Achieving lambda/20 Resolution by One-Color Initiation and Deactivation of Polymerization [My Copy] Science, Vol. 324, No. 5929. (15 May 2009), pp. 910-913. by Linjie Li, Rafael R. Gattass, Erez Gershgoren, Hana Hwang, John T. Fourkas posted to multiphoton_absorption photolithography superresolution by marissalee on 2009-05-19 23:54:58 as along with 1 person and 1 group samjlord moernerlab
	Low-voltage 0.1 mu m organic transistors and complementary inverter circuits fabricated with a low-cost form of near-field photolithography [My Copy] Applied Physics Letters, Vol. 75, No. 7. (1999), pp. 1010-1012. by John A. Rogers, Ananth Dodabalapur, Zhenan Bao, Howard E. Katz posted to photolithography submicrometer by haa on 2008-12-19 13:14:53 as
	Enabling nanotechnology with self assembled block copolymer patterns [My Copy] Polymer, Vol. 44, No. 22. (October 2003), pp. 6725-6760. by Cheolmin Park, Jongseung Yoon, Edwin L. Thomas posted to block_copolymer nanotechnology photolithography by j_vinals on 2008-08-06 16:54:34 as
	Flow of a Viscous Liquid on a Rotating Disk [My Copy] Journal of Applied Physics, Vol. 29, No. 5. (1958), pp. 858-862. by Alfred G. Emslie, Francis T. Bonner, Leslie G. Peck posted to disk flow lithography photolithography viscosity rotational by rodney on 2008-07-27 22:00:40 as
	Methods for measurement of development parameters in the manufacturing line for use in photolithography modeling [My Copy] Semiconductor Manufacturing, IEEE Transactions on In Semiconductor Manufacturing, IEEE Transactions on, Vol. 9, No. 2. (1996), pp. 182-190. by K. P. Fahey posted to simulation prolith2 photolithography parameters model manufacturing development by rodney to the group Kopelman_Group on 2007-09-05 21:05:31 as
	Process-specific tuning of lithography simulation tools [My Copy] In Proc. SPIE Vol. 3051, p. 491-498, Optical Microlithography X, Gene E. Fuller; Ed., Vol. 3051 (July 1997), pp. 491-498. by M. E. Mason, R. A. Soper, R. M. Terry, C. A. Mack edited by G. E. Fuller posted to simulation prolith2 photolithography parameters lithography gratings finle fabrication development by rodney to the group Kopelman_Group on 2007-09-05 20:58:02 as
	Lithography model tuning: matching simulation to experiment [My Copy] In Proc. SPIE Vol. 2726, p. 223-235, Optical Microlithography IX, Gene E. Fuller; Ed., Vol. 2726 (June 1996), pp. 223-235. by S. H. Thornton, C. A. Mack edited by G. E. Fuller posted to thickness simulation resist prolith2 photoresist photolithography parameters lithography gratings finle fabrication exposure experiment dose development by rodney to the group Kopelman_Group on 2007-09-05 20:55:15 as
	Imaging interferometric lithography for arbitrary patterns [My Copy] In Proc. SPIE Vol. 3331, p. 214-224, Emerging Lithographic Technologies II, Yuli Vladimirsky; Ed., Vol. 3331 (June 1998), pp. 214-224. by X. Chen, S. R. Brueck edited by Y. Vladimirsky posted to photolithography patterns lithography interferometry interference imaging by rodney to the group Kopelman_Group on 2007-09-05 00:10:27 as
	Generation of subquarter-micron resist structures using optical interference lithography and image reversal [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.1949-1953, Vol. 15 (November 1997), pp. 1949-1953. by J. Y. Decker, A. Fernandez, D. W. Sweeney posted to submicron reversal resist photoresist photolithography optical lithography interference image holography fabrication by rodney to the group Kopelman_Group on 2007-09-05 00:08:46 as
	Methods for fabricating arrays of holes using interference lithography [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.2439-2443, Vol. 15 (November 1997), pp. 2439-2443. by A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, M. D. Perry posted to photolithography lithography interference holography holes fabrication arrays by rodney to the group Kopelman_Group on 2007-09-05 00:07:32 as
	Large-area achromatic interferometric lithography for 100 nm period gratings and grids [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 6, November 1996, pp.4167-4170, Vol. 14 (November 1996), pp. 4167-4170. by T. A. Savas, M. L. Schattenburg, J. M. Carter, H. I. Smith posted to achromatic fabrication grids large-field lithography photolithography submicron by rodney on 2007-09-05 00:04:27 as along with 1 group Kopelman_Group
	Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 5, September 1996, pp.3339-3349, Vol. 14 (September 1996), pp. 3339-3349. by X. Chen, S. H. Zaidi, S. R. J. Brueck, D. J. Devine posted to submicron photolithography lithography interferometry interference holography hole field fed fabrication emission display arrays by rodney to the group Kopelman_Group on 2007-09-05 00:02:40 as
	Fabrication of sub-0.5 micron diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm × 50 cm glass substrates using laser interference lithograph [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 3, May 1996, pp.2005-2007, Vol. 14 (May 1996), pp. 2005-2007. by J. P. Spallas, R. D. Boyd, J. A. Britten, et al.A. Fernandez, A. M. Hawryluk, M. D. Perry, D. R. Kania posted to cobalt dots fabrication glass large-field lithography pedestals photolithography silicon submicron substrates arrays holographic photoresist resist by rodney on 2007-09-05 00:00:08 as along with 1 group Kopelman_Group
	Optically matched trilevel resist process for nanostructure fabrication [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.3007-3011, Vol. 13 (November 1995), pp. 3007-3011. by M. L. Schattenburg, R. J. Aucoin, R. C. Fleming posted to fabrication lithography matched nanostructures optical photolithography trilevel photoresist resist by rodney on 2007-09-04 23:58:03 as along with 1 group Kopelman_Group
	Achromatic interferometric lithography for 100-nm-period gratings and grids [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2732-2735, Vol. 13 (November 1995), pp. 2732-2735. by T. A. Savas, S. N. Shah, M. L. Schattenburg, J. M. Carter, H. I. Smith posted to submicron photolithography lithography interferometry interference holography grids gratings achromatic by rodney to the group Kopelman_Group on 2007-09-04 23:56:25 as
	Field emitter array mask patterning using laser interference lithography [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 5, September 1995, pp.1973-1978, Vol. 13 (September 1995), pp. 1973-1978. by J. P. Spallas, A. M. Hawryluk, D. R. Kania posted to emitter field lithography photolithography arrays holographic masks patterns by rodney on 2007-09-04 23:54:55 as along with 1 group Kopelman_Group
	Multiple-exposure interferometric lithography [My Copy] In Proc. SPIE Vol. 2197, p. 869-875, Optical/Laser Microlithography VII, Timothy A. Brunner; Ed., Vol. 2197 (May 1994), pp. 869-875. by S. H. Zaidi, S. R. Brueck edited by T. A. Brunner posted to photolithography multiple lithography interferometry interference holography exposure by rodney to the group Kopelman_Group on 2007-09-04 23:47:22 as
	Sub-0.1 micron patterning with high aspect ratio of 5 achieved by preventing pattern collapse [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 35, No. 4 A. (1996), pp. 2385-2386. by Y. Yamashita posted to aspect-ratio collapse fabrication lithography photolithography submicron patterns by rodney on 2007-09-03 21:36:31 as along with 1 group Kopelman_Group
	Surface adhesion reduction in silicon microstructures using femtosecond laser pulses [My Copy] Applied Physics Letters, Vol. 68 (January 1996), pp. 197-199. by N. C. Tien, S. Jeong, L. M. Phinney, K. Fushinobu, J. Bokor posted to adhesion fabrication lithography microstructures photolithography pulses silicon surface fe iron lasers by rodney on 2007-09-03 21:33:42 as along with 1 group Kopelman_Group
	Dry development of photosensitive polyimides for high resolution and aspect ratio applications [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2179-2183, Vol. 13 (November 1995), pp. 2179-2183. by J. Muñoz, C. Dom\ínguez posted to resolution resist polyimides photosensitive photoresist photolithography lithography high fabrication dry development aspect-ratio by rodney to the group Kopelman_Group on 2007-09-03 21:32:10 as
	Dry development of sub-0.25 mu m features patterned with 193 nm silylation resist [My Copy] The 42nd national symposium of the American Vacuum Society, Vol. 14, No. 3. (1996), pp. 1132-1136. by S. C. Palmateer, A. R. Forte, R. R. Kunz, M. W. Horn posted to 193nm development dry fabrication lithography photolithography silylation submicron patterns photoresist resist by rodney on 2007-09-03 21:29:55 as along with 1 group Kopelman_Group
	Effect of low-solubility surface layer on development of AZ-PF514 [My Copy] Proceedings of the 16th international symposium on electron, ion, and photon beams, Vol. 11, No. 6. (1993), pp. 2829-2833. by Azalia A. Krasnoperova, Stephen W. Turner, Leo Ocola, Franco Cerrina posted to surface resist photoresist photolithography low-solubility lithography fabrication development az-pf514 by rodney to the group Kopelman_Group on 2007-09-03 21:27:29 as
	Photoresist-Assisted Release of Movable Microstructures [My Copy] Japanese Journal of Applied Physics, Vol. 32 (November 1993), pp. L1642-L1644. by D. Kobayashi, C. J. Kim, H. Fujita posted to fabrication lithography microstructures movable photolithography photoresist resist by rodney on 2007-09-03 21:25:33 as along with 1 group Kopelman_Group
	Profile control in dry development of high-aspect-ratio resist structures [My Copy] The 38th International symposium on electron, ion, and photon beams, Vol. 13, No. 6. (1995), pp. 3017-3021. by M. B. Stern, S. C. Palmateer, M. W. Horn, M. Rothschild, B. E. Maxwell, J. E. Curtin posted to resist profile photoresist photolithography lithography fabrication dry development aspect-ratio by rodney to the group Kopelman_Group on 2007-09-03 21:22:33 as
	Surface tension, adhesion and wetting of materials for photolithographic process [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 14, No. 4. (1996), pp. 2485-2492. by J. Bauer, G. Drescher, M. Illig posted to adhesion collapse contact fabrication lithography photolithography surface tension angle angles angular by rodney on 2007-09-03 21:15:12 as along with 2 people and 1 group SiljaSenkbeil carygallen Kopelman_Group
	Adhesion of Resist Micropatterns during Drying after Water Rinse [My Copy] Japanese Journal of Applied Physics, Vol. 34 (August 1995), pp. L1093-L1094. by A. Kawai posted to adhesion collapse fabrication lithography photolithography water patterns photoresist resist by rodney on 2007-09-03 21:14:01 as along with 1 group Kopelman_Group
	Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water [My Copy] Applied Physics Letters, Vol. 66, No. 20. (1995), pp. 2655-2657. by Hideo Namatsu, Kenji Kurihara, Masao Nagase, Kazumi Iwadate, Katsumi Murase posted to water tension surface silicon rinse photolithography pattern nanolines lithography grating fabrication collapse by rodney to the group Kopelman_Group on 2007-09-03 21:12:31 as
	Mechanism of Resist Pattern Collapse during Development Process [My Copy] Japanese Journal of Applied Physics, Vol. 32 (December 1993), 6059. by T. Tanaka, M. Morigami, N. Atoda posted to collapse development fabrication lithography photolithography patterns photoresist resist by rodney on 2007-09-03 21:10:45 as along with 1 group Kopelman_Group
	Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process [My Copy] Japanese Journal of Applied Physics, Vol. 33 (December 1994), pp. L1803-L1805. by T. Tanaka, M. Morigami, H. Oizumi, T. Ogawa, Uchino posted to rinse resist photoresist photolithography pattern lithography flood fabrication exposure collapse by rodney to the group Kopelman_Group on 2007-09-03 21:08:43 as
	Patterning characteristics of a chemically-amplified negative resist in synchrotron radiation lithography [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 31, No. 9 A. (1992), pp. 2954-2958. by Kimiyoshi Deguchi, Kazunori Miyoshi, Tetsuyoshi Ishii, Tadahito Matsuda posted to synchotron resist radiation photoresist photolithography pattern negative lithography fabrication collapse chemically amplified by rodney to the group Kopelman_Group on 2007-09-03 21:07:00 as

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lithography	51
fabrication	44
photoresist	26
resist	26
development	16
collapse	14
submicron	14
interference	10
patterns	10
pattern	8
surface	8
311_termpaper	7
holographic	7
holography	7
silicon	7
adhesion	6
arrays	6
aspect-ratio	6
dry	6
exposure	6
parameters	6
prolith2	6
simulation	6
gratings	5
interferometry	5
achromatic	4
field	4
grids	4
large-field	4
microstructures	4
optical	4
tension	4
water	4
array	3
holes	3
rinse	3
193nm	2
adsorption	2
amplified	2
angle	2
az-pf514	2
bilayer	2
cobalt	2
contact	2
display	2
dose	2
dots	2
emission	2
emitter	2
fe	2
finle	2
flood	2
fluorescence	2
glass	2
gold	2
high	2
image	2
iron	2
lipid	2
low-solubility	2
matched	2
membrane	2
microfabrication	2
model	2
movable	2
multiple	2
nanostructures	2
nanotechnology	2
negative	2
pattern_transfer	2
pedestals	2
polyimides	2
profile	2
proj2	2
pulses	2
radiation	2
resolution	2
reversal	2
silylation	2
substrates	2
thickness	2
titanium	2
trilevel	2
vesicle	2
aluminium	1
angular	1
direct_writing	1
drying	1
embossing	1
experimental	1
hole	1
imaging	1
light-diffraction	1
microcavities	1
microdisk	1
microfluidics	1
multiphoton_absorption	1
process	1
two_photons	1
wetting	1

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