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Tag xps [81 articles]

Recent papers classified by the tag xps.
  • Surface Oxidation and Reduction of CuO and Cu2O Studied Using XPS and XAES
    Surface and Interface Analysis, Vol. 24, No. 12. (1996), pp. 811-820.
    by S Poulston, PM Parlett, P Stone, M Bowker
    posted to aes annealing copper hydrogen oxidation oxide oxygen reduction vacuum xaes xps by thomaswaechtler on 2007-02-14 09:45:19 as **
  • Reduction of copper oxides by UV radiation and atomic hydrogen studied by XPS
    Applications of Surface Science, Vol. 10, No. 1. (1982), pp. 51-62.
    by TH Fleisch, GJ Mains
    posted to copper hydrogen oxide reduction uv xps by thomaswaechtler on 2007-02-14 08:48:00 as **
  • Sub-0.1 mu m gate etch processes: Towards some limitations of the plasma technology?
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 18, No. 1. (2000), pp. 156-165.
    by L Desvoivres, L Vallier, O Joubert
    posted to oxidation recess silicon xps by these_morel on 2008-03-05 08:58:33 as read
  • notes Selective etching of high-k HfO[sub 2] films over Si in hydrogen-added fluorocarbon (CF[sub 4]/Ar/H[sub 2] and C[sub 4]F[sub 8]/Ar/H[sub 2]) plasmas
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, No. 3. (2006), pp. 437-443.
    by Kazuo Takahashi, Kouichi Ono
    posted to etching fluorocarbon hfo2 plasmas xps by these_morel on 2006-12-13 15:38:19 as read along with 1 group LTM_LETI_etching
  • Influence of the reactor wall composition on radicals' densities and total pressure in Cl[sub 2] inductively coupled plasmas: I. Without silicon etching
    Journal of Applied Physics, Vol. 102, No. 9. (2007)
    by G Cunge, N Sadeghi, R Ramos
    posted to absorption cl2 icp plasma xps by these_morel on 2008-03-05 09:16:38 as read
  • notes Ultra thin tungsten nitride film growth on dielectric surfaces
    Thin Solid Films, Vol. 458, No. 1-2. (30 June 2004), pp. 251-256.
    by Sun, ER Engbrecht, T Bolom, C Cilino, JH Sim, JM White, JG Ekerdt, K Pfeifer
    posted to chemical-vapor-deposition tungsten-nitride wco6 xps by these_morel on 2006-06-19 10:07:54 as read along with 1 group LTM_LETI_etching
  • Parallel angle resolved XPS investigations on 12 in. wafers for the study of W and WSix oxidation in air
    Microelectronic Engineering, Vol. 85, No. 9. (September 2008), pp. 1882-1887.
    by B Pelissier, A Beaurain, JP Barnes, R Gassilloud, F Martin, O Joubert
    posted to xps tungsten oxidation arxps by these_morel on 2008-09-19 08:41:13 as **
  • Thermal decomposition mechanisms of tungsten nitride CVD precursors on Cu(1 1 1)
    Surface Science, Vol. 600, No. 3. (1 February 2006), pp. 743-754.
    by Yaw-Wen Yang, Jin-Bao Wu, Jelin Wang, Yi-Feng Lin, Hsin-Tien Chiu
    posted to chemical-vapor-deposition tungsten-nitride xps by these_morel on 2007-03-30 15:56:19 as read along with 1 group LTM_LETI_etching
  • notes Tungsten etching mechanisms in CF[sub 4]/O[sub 2] reactive ion etching plasmas
    Journal of Applied Physics, Vol. 66, No. 10. (1989), pp. 5034-5038.
    by Tim D Bestwick, Gottlieb S Oehrlein
    posted to cf4-o2 rie tungsten xps by these_morel on 2006-05-12 09:49:54 as read along with 1 person and 1 group Stanley_vrc LTM_LETI_etching
  • Influence of Carbon-Chlorine Surface Complexes on the Properties of Tungsten Oxide Supported on Activated Carbons. 1. Dispersion, Distribution, and Chemical Nature of the Metal Oxide Phase
    J. Phys. Chem. B, Vol. 107, No. 21. (29 May 2003), pp. 4997-5002.
    by AF Perez-Cadenas, FJ Maldonado-Hodar, JLG Fierro, C Moreno-Castilla
    posted to tungsten tungsten-oxide xps by these_morel on 2007-09-28 07:24:02 as read
  • Dry etching of titanium nitride thin films in CF[sub 4]--O[sub 2] plasmas
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 13, No. 2. (1995), pp. 335-342.
    by F Fracassi, R D'agostino, R Lamendola, I Mangieri
    posted to cf4-o2 etching titane_nitride xps by these_morel on 2006-12-13 15:42:58 as read along with 1 group LTM_LETI_etching
  • notes Etching of tungsten with XeF[sub 2]: An x-ray photoelectron spectroscopy study
    Journal of Applied Physics, Vol. 62, No. 11. (1987), pp. 4587-4590.
    by A Bensaoula, E Grossman, A Ignatiev
    posted to fluorine tungsten xps by these_morel on 2007-08-03 10:53:57 as read along with 1 group LTM_LETI_etching
  • Influence of the reactor wall composition on radicals' densities and total pressure in Cl[sub 2] inductively coupled plasmas: II. During silicon etching
    Journal of Applied Physics, Vol. 102, No. 9. (2007)
    by G Cunge, N Sadeghi, R Ramos
    posted to absorption cl2 dissociation etching parois plasma silicon xps by these_morel on 2008-03-05 09:18:49 as read
  • notes The effect of nitrogen ion implantation on tungsten surfaces
    Applied Surface Science, Vol. 150, No. 1-4. (11 August 1999), pp. 34-38.
    by HL Zhang, DZ Wang, NK Huang
    posted to tungsten-nitride xps by these_morel on 2006-12-13 15:58:04 as read along with 1 group LTM_LETI_etching
  • Monitoring chamber walls coating deposited during plasma processes: Application to silicon gate etch processes
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 3. (2004), pp. 553-563.
    by O Joubert, G Cunge, B Pelissier, L Vallier, M Kogelschatz, E Pargon
    posted to floating_sample plasma xps by these_morel on 2007-10-08 14:47:12 as ****
  • notes XPS, XES and XAS studies of the electronic structure of tungsten oxides
    Journal of Alloys and Compounds, Vol. 305, No. 1-2. (6 June 2000), pp. 1-6.
    by Khyzhun
    posted to tungsten-oxide xps by these_morel on 2006-12-13 15:52:09 as read along with 1 group LTM_LETI_etching
  • Effect of NH[sub 3] on Film Properties of MOCVD Tungsten Nitride from Cl[sub 4](CH[sub 3]CN)W(N[sup i]Pr)
    Journal of The Electrochemical Society, Vol. 151, No. 10. (2004), pp. G697-G703.
    by Omar J Bchir, Kee C Kim, Timothy J Anderson, Valentin Craciun, Benjamin C Brooks, Lisa M White
    posted to nh3 tungsten-nitride xps by these_morel on 2008-08-27 16:04:19 as **
  • Handbook of X Ray Photoelectron Spectroscopy (P/N 624755)
    (1992)
    by John F Moulder, William F Stickle, Peter E Sobol
    posted to dispositifs-experimentaux xps by these_morel on 2008-07-21 15:06:24 as **
  • Etching characteristics of high-k dielectric HfO[sub 2] thin films in inductively coupled fluorocarbon plasmas
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 23, No. 6. (2005), pp. 1691-1697.
    by Kazuo Takahashi, Kouichi Ono, Yuichi Setsuhara
    posted to etching fluorocarbon hfo2 plasma xps by these_morel on 2006-12-13 15:40:29 as read along with 1 group LTM_LETI_etching
  • X-ray photoelectron spectroscopy characteristics of the W/TiN/Si and W/TiN/SiO2/Si structures
    Journal of Electron Spectroscopy and Related Phenomena, Vol. 63, No. 2. (2 August 1993), pp. 145-153.
    by Sunil Kumar, DR Chopra, Gregory C Smith
    posted to titane_nitride tungsten xps by these_morel on 2007-04-04 12:55:19 as read along with 1 group LTM_LETI_etching
  • Poly-Si/TiN/HfO[sub 2] gate stack etching in high-density plasmas
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, No. 3. (2007), pp. 767-778.
    by A Le Gouil, O Joubert, G Cunge, T Chevolleau, L Vallier, B Chenevier, I Matko
    posted to effet-de-charge etching poly-si tin xps by these_morel on 2008-03-05 09:03:24 as read
  • Practical Surface Analysis: Auger and X-Ray Photoelectron Spectroscopy
    (23 August 1983)
    by D Briggs, MP Seah
    posted to dispositifs-experimentaux xps by these_morel on 2008-07-21 15:01:32 as **
  • Chemical downstream etching of tungsten
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 16, No. 4. (1998), pp. 2115-2119.
    by MG Blain, RL Jarecki, RJ Simonson
    posted to tungsten tungsten-oxide xps by these_morel on 2007-09-28 07:20:17 as read
  • notes Tungsten nitride films grown via pulsed laser deposition studied in situ by electron spectroscopies
    Applied Surface Science, Vol. 214, No. 1-4. (31 May 2003), pp. 58-67.
    by G Soto, W Delacruz, FF Castillon, JA Diaz, R Machorro, MH Farias
    posted to tungsten-nitride xps by these_morel on 2006-12-13 15:55:32 as read along with 1 group LTM_LETI_etching
  • notes Etching characteristics of TiN used as hard mask in dielectric etch process
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, No. 5. (2006), pp. 2262-2270.
    by M Darnon, T Chevolleau, D Eon, L Vallier, J Torres, O Joubert
    posted to titane_nitride xps by these_morel on 2007-02-28 07:59:19 as read along with 1 group LTM_LETI_etching
  • Quantitative analysis of angle-resolved XPS spectra recorded in parallel data acquisition mode
    Surface and Interface Analysis, Vol. 36, No. 13. (2004), pp. 1629-1636.
    by MS Vinodh, LPH Jeurgens
    posted to arxps dispositifs-experimentaux xps by these_morel on 2008-08-12 07:02:25 as **
  • RBS-ERDA, XPS and XRD characterizations of PECVD tungsten nitride films
    Applied Surface Science, Vol. 125, No. 3-4. (March 1998), pp. 313-320.
    by C Meunier, C Monteil, C Savall, F Palmino, J Weber, R Berjoan, J Durand
    posted to tungsten-nitride xps by these_morel on 2008-08-29 15:49:33 as **
  • Reactive sputter deposition of tungsten nitride thin films
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 20, No. 5. (2002), pp. 1699-1703.
    by Colin C Baker, Ismat S Shah
    posted to resistivity sputter-deposition tungsten-nitride xps by these_morel on 2006-12-13 15:35:21 as read along with 1 group LTM_LETI_etching
  • Temperature programmed decomposition of uranyl nitrate hexahydrate
    Journal of Nuclear Materials, Vol. 264, No. 3. (5 January 1999), pp. 271-282.
    by S Dash, M Kamruddin, Santanu Bera, PK Ajikumar, AK Tyagi, SV Narasimhan, Baldev Raj
    posted to xps by svnarasimhan on 2008-03-22 15:25:32 as **
  • Electrochemical passivation of iron alloys and the film characterisation by XPS
    Corrosion Science, Vol. 42, No. 10. (October 2000), pp. 1709-1724.
    by Santanu Bera, S Rangarajan, SV Narasimhan
    posted to xps by svnarasimhan on 2008-03-22 15:04:45 as **
  • Optical Absorption and Photoluminescence Spectroscopy of the Growth of Silver Nanoparticles
    Physical Review Letters, Vol. 94, No. 4. (2005)
    by P Gangopadhyay, R Kesavamoorthy, Santanu Bera, P Magudapathy, KGM Nair, BK Panigrahi, SV Narasimhan
    posted to xps by svnarasimhan on 2008-03-22 15:01:41 as **
  • XPS and SIMS analysis of gold silicide grown on a bromine passivated Si(111) substrate
    Applied Surface Science, Vol. 137, No. 1-4. (1 January 1999), pp. 103-112.
    by B Sundaravel, K Sekar, G Kuri, PV Satyam, BN Dev, Santanu Bera, SV Narasimhan, P Chakraborty, F Caccavale
    posted to xps by svnarasimhan on 2008-03-22 15:30:20 as **
  • Formation of zinc ferrite by solid-state reaction and its characterization by XRD and XPS
    Journal of Materials Science, Vol. 36, No. 22. (1 November 2001), pp. 5379-5384.
    by S Bera, AAM Prince, S Velmurugan, PS Raghavan, R Gopalan, G Panneerselvam, SV Narasimhan
    posted to xps by svnarasimhan on 2008-03-22 14:58:53 as **
  • Interaction of alkali metals with perylene-3,4,9,10- tetracarboxylic--dianhydride thin films
    Journal of Applied Physics, Vol. 98, No. 1. (2005)
    by J Wusten, S Berger, K Heimer, S Lach, Ch
    posted to alkali contact ftir ipes ptcda ups xps by soes on 2008-04-25 10:32:29 as ** along with 1 person katsuhide
  • Growth and vibrational properties of PTCDA thin films on InSb(1 1 1)A
    Surface Science, Vol. 547, No. 1-2. (10 December 2003), pp. 45-54.
    by PJ Unwin, D Onoufriou, TS Jones
    posted to hreels insb ptcda xps by soes on 2008-04-17 09:46:59 as **
  • Fabrication of Biomolecular Nanostructures by Scanning Near-Field Photolithography of Oligo(ethylene glycol)-Terminated Self-Assembled Monolayers
    Langmuir, Vol. 23, No. 13. (19 June 2007), pp. 7328-7337.
    by M Montague, RE Ducker, KSL Chong, RJ Manning, FJM Rutten, MC Davies, GJ Leggett
    posted to hotelectrons oeg_photdegradation sam_modification sims xps by sjanusz on 2007-06-27 20:20:58 as read
  • Influence of Adsorbate Ordering on Rates of UV Photooxidation of Self-Assembled Monolayers
    J. Phys. Chem., Vol. 100, No. 16. (18 April 1996), pp. 6657-6662.
    by DA Hutt, GJ Leggett
    posted to 1 3 fundamental_xps_sams photochemistry sam_packingdensity xps by sjanusz on 2007-07-30 11:58:42 as *****
  • A NEXAFS and UPS study of thiol monolayers self-assembled on gold
    Surface Science, Vol. 331-333, No. Part 1. (1 July 1995), pp. 189-195.
    by H Rieley, NJ Price, RG White, RIR Blyth, AW Robinson
    posted to 1 ausams fundamental_xps_sams sams xps by sjanusz on 2007-08-29 09:27:11 as ****
  • Near-edge X-ray absorption fine structure studies of oriented molecular chains in polyethylene and Langmuir-Blodgett monolayers on Si(111)
    Thin Solid Films, Vol. 159, No. 1-2. (May 1988), pp. 275-283.
    by JP Rabe, JD Swalen, DA Outka, J Stohr
    posted to 1 sam_structure silane_sams xps by sjanusz on 2007-09-26 09:28:37 as **
  • Chemically Mediated Grain Growth in Nanotextured Au, Au/Cu Thin Films: Novel Substrates for the Formation of Self-Assembled Monolayers
    Langmuir, Vol. 18, No. 14. (9 July 2002), pp. 5529-5538.
    by M Twardowski, RG Nuzzo
    posted to 1 ausams substrate_reconstruction xps by sjanusz on 2007-08-29 11:16:11 as ****
  • XPS Studies of Chain Conformation in PEG, PTrMO, and PTMG Linear Polyethers
    J. Phys. Chem. B, Vol. 104, No. 12. (30 March 2000), pp. 2656-2672.
    by G Beamson, BT Pickup, W Li, SM Mai
    posted to 1 biocompatibility theoreticalchem xps by sjanusz on 2007-09-10 13:08:22 as **
  • Coverage Effects and the Nature of the Metal-Sulfur Bond in S/Au(111): High-Resolution Photoemission and Density-Functional Studies
    J. Am. Chem. Soc., Vol. 125, No. 1. (8 January 2003), pp. 276-285.
    by JA Rodriguez, J Dvorak, T Jirsak, G Liu, J Hrbek, Y Aray, C Gonzalez
    posted to 1 disulfide sams structarg theoreticalchem xps by sjanusz on 2007-09-01 11:52:58 as read
  • Surface Analysis of Polymers by XPS and Static SIMS (Cambridge Solid State Science Series)
    (28 May 1998)
    by D Briggs
    posted to xps by sjanusz on 2008-05-06 08:12:10 as **
  • Influence of Specific Intermolecular Interactions on the Self-Assembly and Phase Behavior of Oligo(Ethylene Glycol)-Terminated Alkanethiolates on Gold
    J. Phys. Chem. B, Vol. 105, No. 23. (14 June 2001), pp. 5459-5469.
    by R Valiokas, S Svedhem, M Östblom, SCT Svensson, B Liedberg
    posted to protein_resistance sam_stabilisation xps by sjanusz on 2007-06-07 15:46:35 as ****
  • Preparation and Properties of Three-dimensional Braided UHMWPE Fiber Reinforced PMMA Composites
    Journal of Reinforced Plastics and Composites, Vol. 25, No. 15. (1 October 2006), pp. 1601-1609.
    by YD Zhang, YL Wang, Y Huang, YZ Wan
    posted to background xps by michaelgilbert on 2008-05-14 04:44:47 as ***
  • Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions
    J. Am. Chem. Soc., Vol. 130, No. 9. (5 March 2008), pp. 2793-2797.
    by K Andersson, G Ketteler, H Bluhm, S Yamamoto, H Ogasawara, LGM Pettersson, M Salmeron, A Nilsson
    posted to dissociation spectroscopy surface water xps by guidoketteler on 2008-07-21 12:49:08 as read
  • Electron Spectroscopy of Aqueous Solution Interfaces Reveals Surface Enhancement of Halides
    Science, Vol. 307, No. 5709. (28 January 2005), pp. 563-566.
    by Sutapa Ghosal, John C Hemminger, Hendrik Bluhm, Bongjin S Mun, Eleonore L Hebenstreit, Guido Ketteler, Frank F Ogletree, Felix G Requejo, Miquel Salmeron
    posted to alkali chemistry environmental halide spectroscopy surface xps by guidoketteler on 2008-07-21 12:50:53 as read along with 1 person wswhy
  • In Situ Spectroscopic Study of the Oxidation and Reduction of Pd(111)
    J. Am. Chem. Soc., Vol. 127, No. 51. (28 December 2005), pp. 18269-18273.
    by G Ketteler, DF Ogletree, H Bluhm, H Liu, ELD Hebenstreit, M Salmeron
    posted to catalysis oxidation palladium spectroscopy xps by guidoketteler on 2008-07-21 12:48:08 as read
  • Characterization of Indium-Tin Oxide Interfaces Using X-ray Photoelectron Spectroscopy and Redox Processes of a Chemisorbed Probe Molecule: Effect of Surface Pretreatment Conditions
    Langmuir, Vol. 18, No. 2. (22 January 2002), pp. 450-457.
    by C Donley, D Dunphy, D Paine, C Carter, K Nebesny, P Lee, D Alloway, NR Armstrong
    posted to ito xps by darick to the group ZnO_project on 2008-04-10 18:37:50 as **
  • Pattern design in large area using octadecyltrichlorosilane self-assembled monolayers as resist material
    Applied Surface Science, Vol. 252, No. 12. (15 April 2006), pp. 4230-4235.
    by Peng Jiang, Shun-Yu Li, Hiroyuki Sugimura, Osamu Takai
    posted to xps patterning ots ca afm by carygallen to the group ZnO_project on 2007-04-02 21:28:31 as **
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