Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces Export

@article{citeulike:832621, abstract = {In this article nanosphere lithography (NSL) is demonstrated to be a materials general fabrication process for the production of periodic particle array (PPA) surfaces having nanometer scale features. A variety of PPA surfaces have been prepared using identical single-layer (SL) and double-layer (DL) NSL masks made by self-assembly of polymer nanospheres with diameter, D=264 nm, and varying both the substrate material S and the particle material M. In the examples shown here, S was an insulator, semiconductor, or metal and M was a metal, inorganic ionic insulator, or an organic -electron semiconductor. PPA structural characterization and determination of nanoparticle metrics was accomplished with atomic force microscopy. This is the first demonstration of nanometer scale PPA surfaces formed from molecular materials. \©1995 American Vacuum Society}, author = {Hulteen, John C. and Van Duyne, Richard P.}, citeulike-article-id = {832621}, citeulike-linkout-0 = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTAD6000013000003001553000001&idtype=cvips&gifs=yes}, citeulike-linkout-1 = {http://link.aip.org/link/?JVA/13/1553}, citeulike-linkout-2 = {http://dx.doi.org/10.1116/1.579726}, doi = {10.1116/1.579726}, journal = {Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films}, keywords = {nanosphere-lithography}, number = {3}, pages = {1553--1558}, posted-at = {2009-02-17 17:08:15}, priority = {2}, publisher = {AVS}, title = {Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces}, url = {http://dx.doi.org/10.1116/1.579726}, volume = {13}, year = {1995} }

TY - JOUR ID - citeulike:832621 L3 - citeulike-article-id:832621 N2 - In this article nanosphere lithography (NSL) is demonstrated to be a materials general fabrication process for the production of periodic particle array (PPA) surfaces having nanometer scale features. A variety of PPA surfaces have been prepared using identical single-layer (SL) and double-layer (DL) NSL masks made by self-assembly of polymer nanospheres with diameter, D=264 nm, and varying both the substrate material S and the particle material M. In the examples shown here, S was an insulator, semiconductor, or metal and M was a metal, inorganic ionic insulator, or an organic -electron semiconductor. PPA structural characterization and determination of nanoparticle metrics was accomplished with atomic force microscopy. This is the first demonstration of nanometer scale PPA surfaces formed from molecular materials. ©1995 American Vacuum Society IS - 3 JF - Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films EP - 1558 TI - Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces PB - AVS VL - 13 SP - 1553 KW - nanosphere-lithography AU - Hulteen, John AU - Van Duyne, Richard PY - 1995/// UR - http://dx.doi.org/10.1116/1.579726 ER -