Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings Export

@article{citeulike:2898816, abstract = {Thin films of Al2O3 grown using atomic layer deposition (ALD) techniques can protect polymers from erosion by oxygen atoms. To quantify this protection, polyimide substrates with the same chemical repeat unit as Kapton® were applied to quartz crystal microbalance (QCM) sensors. Al2O3 ALD films with varying thicknesses were grown on the polyimide substrates. The ALD-coated polyimide materials were then exposed to a hyperthermal atomic-oxygen beam. The mass loss versus oxygen-atom exposure time was measured in situ by the QCM. Al2O3 ALD film thicknesses of \~{} 35 \r{A} were found to protect the polymer from erosion.}, author = {Cooper, Russell and Upadhyaya, Hari P. and Minton, Timothy K. and Berman, Michael R. and Du, Xiaohua and George, Steven M.}, citeulike-article-id = {2898816}, citeulike-linkout-0 = {http://dx.doi.org/10.1016/j.tsf.2007.07.150}, citeulike-linkout-1 = {http://www.sciencedirect.com/science/article/B6TW0-4P7R84V-1/1/6725f4d284519b2dacb133c4b34938d8}, day = {30}, doi = {10.1016/j.tsf.2007.07.150}, journal = {Thin Solid Films}, keywords = {ald, barrier-coating, flexible-electronics, macroelectronics}, month = {April}, number = {12}, pages = {4036--4039}, posted-at = {2008-06-16 15:53:33}, priority = {2}, title = {Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings}, url = {http://dx.doi.org/10.1016/j.tsf.2007.07.150}, volume = {516}, year = {2008} }

TY - JOUR ID - citeulike:2898816 L3 - citeulike-article-id:2898816 N2 - Thin films of Al2O3 grown using atomic layer deposition (ALD) techniques can protect polymers from erosion by oxygen atoms. To quantify this protection, polyimide substrates with the same chemical repeat unit as Kapton® were applied to quartz crystal microbalance (QCM) sensors. Al2O3 ALD films with varying thicknesses were grown on the polyimide substrates. The ALD-coated polyimide materials were then exposed to a hyperthermal atomic-oxygen beam. The mass loss versus oxygen-atom exposure time was measured in situ by the QCM. Al2O3 ALD film thicknesses of ~ 35 Å were found to protect the polymer from erosion. IS - 12 JF - Thin Solid Films EP - 4039 TI - Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings VL - 516 SP - 4036 KW - ald KW - barrier-coating KW - flexible-electronics KW - macroelectronics AU - Cooper, Russell AU - Upadhyaya, Hari AU - Minton, Timothy AU - Berman, Michael AU - Du, Xiaohua AU - George, Steven PY - 2008/04/30/ UR - http://dx.doi.org/10.1016/j.tsf.2007.07.150 ER -