Stanley_vrc's library 14 articles Export

	High-/spl kappa//metal-gate stack and its MOSFET characteristics [My Copy] Electron Device Letters, IEEE, Vol. 25, No. 6. (2004), pp. 408-410. by R. Chau, S. Datta, M. Doczy, B. Doyle, J. Kavalieros, M. Metz posted to high-k metal-gate by Stanley_vrc on 2006-12-01 15:13:25 as
	Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks. [My Copy] Solid State Phenomena, Vol. 103-104 (2005), pp. 93-96. by M. Claes, V. Paraschiv, S. Beckx, et al.M. Demand, W. Deweerd, S. Garaud, H. Kraus, R. Vos, J. Snow, W. Boullart, S. De Gendt posted to hfo2 high-k by Stanley_vrc on 2006-11-28 15:37:35 as along with 1 person these_morel
	Selective Dry Etching of HfO2 in CF4 and Cl2/HBr-Based Chemistries. [My Copy] posted to hfo2 high-k by Stanley_vrc on 2006-11-28 15:32:38 as
	Temperature Effect on Tungsten Etching Using a Cl2/O2 Helicon Discharge [My Copy] Journal of the Korean Physical Society, Vol. 43, No. 4. (October 2003), pp. 526-528. by Hyoun W. Kim posted to gate tungsten by Stanley_vrc on 2006-11-27 16:24:28 as along with 1 person these_morel
	Etching of High-k Dielectric HfO2 Films in BCl3-Containing Plasmas Enhanced with O2 Addition [My Copy] Japanese Journal of Applied Physics, Vol. 45, No. 10. (2006), pp. L297-L300. by Tomohiro Kitagawa, Keisuke Nakamura, Kazushi Osari, et al.Kazuo Takahashi, Kouichi Ono, Masanori Oosawa, Satoshi Hasaka, Minoru Inoue posted to hfo2 high-k by Stanley_vrc on 2006-11-27 16:15:58 as along with 2 people these_morel gramcd
	Effect of additive gases on the selective etching of tungsten films using inductively coupled halogen-based plasmas [My Copy] Thin Solid Films, Vol. 447-448 (30 January 2004), pp. 586-591. by S. D. Park, Y. J. Lee, N. G. Cho, et al.S. G. Kim, H. H. Choe, M. P. Hong, G. Y. Yeom posted to gate tungsten by Stanley_vrc on 2006-11-27 16:12:29 as along with 1 person ashrafrkhan
	Etching processes of tungsten in SF[sub 6]-O[sub 2] radio-frequency plasmas [My Copy] Journal of Applied Physics, Vol. 70, No. 6. (1991), pp. 3314-3323. by M. C. Peignon, Ch, G. Turban posted to no-tag by Stanley_vrc on 2006-11-27 16:02:42 as along with 1 person these_morel
	Patterning of W/WNx/poly-Si gate electrode using Cl2/O2 plasmas [My Copy] Microelectronic Engineering, Vol. 65, No. 3. (March 2003), pp. 285-292. by Hyoun-Woo Kim, Byong-Sun Jub, Chang-Jin Kangb, Joo-Tae Moon posted to gate tungsten by Stanley_vrc on 2006-11-27 15:55:16 as along with 2 people these_morel ashrafrkhan
	Challenges in metal gate etching for logic applications [My Copy] In SEMI Technical Symposium (2003) by Shashank Deshmukh, Jinhan Choi, Meihua Shen, et al.Yan Du, Kyeong T. Lee, Sang I. Yi, Jae B. Yu, Thorsten Lill posted to gate tungsten by Stanley_vrc on 2006-11-27 15:52:27 as along with 1 person these_morel
	Tungsten etching mechanisms in CF[sub 4]/O[sub 2] reactive ion etching plasmas [My Copy] Journal of Applied Physics, Vol. 66, No. 10. (1989), pp. 5034-5038. by Tim D. Bestwick, Gottlieb S. Oehrlein posted to gate tungsten by Stanley_vrc on 2006-11-27 15:47:25 as along with 1 person these_morel
	A low damage RIE process for the fabrication of compound semiconductor based transistors with sub-100 nm tungsten gates [My Copy] Microelectronic Engineering In Micro- and Nano-Engineering MNE 2005, Vol. 83, No. 4-9. ( 2006), pp. 1159-1162. by X. Li, X. Cao, H. Zhou, et al.C. D. W. Wilkinson, S. Thoms, D. Macintyre, M. Holland, I. G. Thayne posted to gate tungsten by Stanley_vrc on 2006-11-27 15:34:52 as along with 1 person these_morel
	The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layers [My Copy] Thin Solid Films, Vol. 320, No. 1. (4 May 1998), pp. 147-150. by H. C. Lee, S. Vanhaelemeersch posted to gate tungsten by Stanley_vrc on 2006-11-24 13:36:48 as along with 1 person these_morel
	30 nm Tungsten gates etched by a low damage ICP etching for the fabrication of compound semiconductor transistors [My Copy] Microelectronic Engineering In Micro- and Nano-Engineering MNE 2005, Vol. 83, No. 4-9. ( 2006), pp. 1152-1154. by X. Li, X. Cao, H. Zhou, et al.C. D. W. Wilkinson, S. Thoms, D. Macintyre, M. Holland, I. G. Thayne posted to gate tungsten by Stanley_vrc on 2006-11-24 12:43:56 as along with 1 person these_morel
	Characterization of midgap tungsten gate MOSFETs [My Copy] Device Research Conference, 2001 (2001), 73. by Huiling Shang, M. H. White, K. W. Guarini, E. Cartier, P. Solomon posted to gate tungsten by Stanley_vrc on 2006-11-24 10:10:29 as

Note: You may cite this page as: http://www.citeulike.org/user/Stanley_vrc

CiteULike organises scholarly (or academic) papers or literature and provides bibliographic (which means it makes bibliographies) for universities and higher education establishments. It helps undergraduates and postgraduates. People studying for PhDs or in postdoctoral (postdoc) positions. The service is similar in scope to EndNote or RefWorks or any other reference manager like BibTeX, but it is a social bookmarking service for scientists and humanities researchers.

Stanley_vrc's library 14 articles Export

Stanley_vrc's tags