Depositing graphene films on solid and perforated substrates Export

@article{citeulike:3065643, abstract = {Graphene--a monolayer of graphite--has attracted vast interest recently owing to its perfect two-dimensional crystallographic nature and its potential use in a new generation of microelectronic devices. Yet, a deposition method, which results in a large coverage of monolayer thick graphite, is still lacking. By using a chemical mechanical polishing (CMP) method we were able to deposit stress-free graphene on solid and perforated substrates alike, achieving area coverage of hundreds of microns squared.}, author = {Banerjee, A. and Grebel, H.}, citeulike-article-id = {3065643}, citeulike-linkout-0 = {http://dx.doi.org/10.1088/0957-4484/19/36/365303}, doi = {10.1088/0957-4484/19/36/365303}, journal = {Nanotechnology}, keywords = {depoiting, experiment, graphene, graphene-substrate}, number = {36}, pages = {365303+}, posted-at = {2008-10-01 19:12:30}, priority = {2}, title = {Depositing graphene films on solid and perforated substrates}, url = {http://dx.doi.org/10.1088/0957-4484/19/36/365303}, volume = {19}, year = {2008} }

TY - JOUR ID - citeulike:3065643 L3 - citeulike-article-id:3065643 N2 - Graphene--a monolayer of graphite--has attracted vast interest recently owing to its perfect two-dimensional crystallographic nature and its potential use in a new generation of microelectronic devices. Yet, a deposition method, which results in a large coverage of monolayer thick graphite, is still lacking. By using a chemical mechanical polishing (CMP) method we were able to deposit stress-free graphene on solid and perforated substrates alike, achieving area coverage of hundreds of microns squared. IS - 36 JF - Nanotechnology TI - Depositing graphene films on solid and perforated substrates VL - 19 SP - 365303 KW - depoiting KW - experiment KW - graphene KW - graphene-substrate AU - Banerjee, A AU - Grebel, H PY - 2008/// UR - http://dx.doi.org/10.1088/0957-4484/19/36/365303 ER -