Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition Export

@article{citeulike:3747982, abstract = {doi: 10.1021/nl801827v In this work we present a low cost and scalable technique, via ambient pressure chemical vapor deposition (CVD) on polycrystalline Ni films, to fabricate large area (∼cm2) films of single- to few-layer graphene and to transfer the films to nonspecific substrates. These films consist of regions of 1 to ∼12 graphene layers. Single- or bilayer regions can be up to 20 μm in lateral size. The films are continuous over the entire area and can be patterned lithographically or by prepatterning the underlying Ni film. The transparency, conductivity, and ambipolar transfer characteristics of the films suggest their potential as another materials candidate for electronics and opto-electronic applications.}, author = {Reina, Alfonso and Jia, Xiaoting and Ho, John and Nezich, Daniel and Son, Hyungbin and Bulovic, Vladimir and Dresselhaus, Mildred S. and Kong, Jing}, citeulike-article-id = {3747982}, citeulike-linkout-0 = {http://dx.doi.org/10.1021/nl801827v}, citeulike-linkout-1 = {http://pubs.acs.org/doi/abs/10.1021/nl801827v}, doi = {10.1021/nl801827v}, journal = {Nano Letters}, keywords = {experiment, graphene, graphene-fabrication, graphene-substrate}, number = {0}, posted-at = {2009-03-30 00:28:10}, priority = {2}, title = {Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition}, url = {http://dx.doi.org/10.1021/nl801827v}, volume = {0}, year = {0000} }

TY - JOUR ID - citeulike:3747982 L3 - citeulike-article-id:3747982 N2 - doi: 10.1021/nl801827v In this work we present a low cost and scalable technique, via ambient pressure chemical vapor deposition (CVD) on polycrystalline Ni films, to fabricate large area (∼cm2) films of single- to few-layer graphene and to transfer the films to nonspecific substrates. These films consist of regions of 1 to ∼12 graphene layers. Single- or bilayer regions can be up to 20 μm in lateral size. The films are continuous over the entire area and can be patterned lithographically or by prepatterning the underlying Ni film. The transparency, conductivity, and ambipolar transfer characteristics of the films suggest their potential as another materials candidate for electronics and opto-electronic applications. IS - 0 JF - Nano Letters TI - Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition VL - 0 KW - experiment KW - graphene KW - graphene-fabrication KW - graphene-substrate AU - Reina, Alfonso AU - Jia, Xiaoting AU - Ho, John AU - Nezich, Daniel AU - Son, Hyungbin AU - Bulovic, Vladimir AU - Dresselhaus, Mildred AU - Kong, Jing PY - 2000/// UR - http://dx.doi.org/10.1021/nl801827v ER -