Nanoimprint Lithography for Hybrid Plastic Electronics Export

@article{citeulike:4408268, abstract = {The merger of nanoscale devices with flexible, low cost plastics could enable a broad spectrum of electronic and photonic applications, although difficulties in processing plastics at the nanoscale have limited exploration of this potential. Here we describe the use of room temperature nanoimprint lithography for the general fabrication of nanometer- through millimeter-scale patterns on polymer substrates. Specifically, we demonstrate the patterning of arrays of nanoscale sourcedrain electrode pairs with continuous interconnects to the millimeter length scale, and the fabrication of hundred-nanometer gate features hierarchically patterned over large areas. These patterned plastic substrates have also been used in conjunction with semiconductor nanowires to assemble field-effect transistors.}, author = {Mcalpine, Michael C. and Friedman, Robin S. and Lieber, Charles M.}, citeulike-article-id = {4408268}, citeulike-linkout-0 = {http://dx.doi.org/10.1021/nl034031e}, citeulike-linkout-1 = {http://pubs.acs.org/doi/abs/10.1021/nl034031e}, day = {1}, doi = {10.1021/nl034031e}, journal = {Nano Letters}, keywords = {lithography, nanofabrication}, month = {April}, number = {4}, pages = {443--445}, posted-at = {2009-04-26 21:33:32}, priority = {2}, title = {Nanoimprint Lithography for Hybrid Plastic Electronics}, url = {http://dx.doi.org/10.1021/nl034031e}, volume = {3}, year = {2003} }

TY - JOUR ID - citeulike:4408268 L3 - citeulike-article-id:4408268 N2 - The merger of nanoscale devices with flexible, low cost plastics could enable a broad spectrum of electronic and photonic applications, although difficulties in processing plastics at the nanoscale have limited exploration of this potential. Here we describe the use of room temperature nanoimprint lithography for the general fabrication of nanometer- through millimeter-scale patterns on polymer substrates. Specifically, we demonstrate the patterning of arrays of nanoscale sourcedrain electrode pairs with continuous interconnects to the millimeter length scale, and the fabrication of hundred-nanometer gate features hierarchically patterned over large areas. These patterned plastic substrates have also been used in conjunction with semiconductor nanowires to assemble field-effect transistors. IS - 4 JF - Nano Letters EP - 445 TI - Nanoimprint Lithography for Hybrid Plastic Electronics VL - 3 SP - 443 KW - lithography KW - nanofabrication AU - Mcalpine, Michael AU - Friedman, Robin AU - Lieber, Charles PY - 2003/04/01/ UR - http://dx.doi.org/10.1021/nl034031e ER -