Deep reactive ion etching as a tool for nanostructure fabrication Export

@article{citeulike:4775170, author = {Fu, Y. Q. and Colli, A. and Fasoli, A. and Luo, J. K. and Flewitt, A. J. and Ferrari, A. C. and Milne, W. I.}, citeulike-article-id = {4775170}, citeulike-linkout-0 = {http://dx.doi.org/10.1116/1.3065991}, doi = {10.1116/1.3065991}, issn = {10711023}, journal = {Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures}, keywords = {fabrication, rie}, number = {3}, pages = {1520+}, posted-at = {2009-06-08 12:38:43}, priority = {2}, title = {Deep reactive ion etching as a tool for nanostructure fabrication}, url = {http://dx.doi.org/10.1116/1.3065991}, volume = {27}, year = {2009} }

TY - JOUR ID - citeulike:4775170 L3 - citeulike-article-id:4775170 IS - 3 JF - Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures SN - 10711023 TI - Deep reactive ion etching as a tool for nanostructure fabrication VL - 27 SP - 1520 KW - fabrication KW - rie AU - Fu, YQ AU - Colli, A AU - Fasoli, A AU - Luo, JK AU - Flewitt, AJ AU - Ferrari, AC AU - Milne, WI PY - 2009/// UR - http://dx.doi.org/10.1116/1.3065991 ER -