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High-Q torsional mode Si triangular beam resonators encapsulated using SiGe thin film

by: Y. Naito, P. Helin, K. Nakamura, J. De Coster, B. Guo, L. Haspeslagh, K. Onishi, H. A. C. Tilmans
In Electron Devices Meeting (IEDM), 2010 IEEE International (December 2010), pp. 7.1.1-7.1.4, doi:10.1109/iedm.2010.5703313  Key: citeulike:12035314

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Abstract

This paper reports on an SOI-based 20 MHz MEMS torsional resonator, wafer-level packaged using SiGe thin film and hermetically sealed using Al sputtering at 1Pa. The packaged resonators display a high quality factor (220,000) and a low motional resistance (12 k Ω) for low DC bias (1 V). The quality factor remains above 100,000 and the temperature coefficient of frequency (TCf) was measured to be -25ppm/°C and linear over the temperature range of -40 to +140 °C. Successful operation of a CMOS-based oscillator using the MEMS torsional resonator as the frequency determining element was demonstrated.


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