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Growth of amorphous silicon nanowires via a solid–liquid–solid mechanism

by: H. F. Yan, Y. J. Xing, Q. L. Hang, D. P. Yu, Y. P. Wang, J. Xu, Z. H. Xi, S. Q. Feng
Chemical Physics Letters, Vol. 323, No. 3-4. (June 2000), pp. 224-228, doi:10.1016/s0009-2614(00)00519-4  Key: citeulike:11866845

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Abstract

Amorphous silicon nanowires (a-SiNW) with an average diameter of ca. 20 nm were synthesized at about 950°C under an Ar/H2 atmosphere on a large area of a (111) Si substrate without supplying any gaseous or liquid Si sources. The Si substrate, deposited with a layer of Ni (ca. 40 nm thick), served itself as a silicon source for the growth of the a-SiNWs. In contrast to the well-known vapor–liquid–solid (VLS) for conventional whisker growth, it was found that growth of the a-SiNWs was controlled by a solid–liquid–solid (SLS) mechanism, which is analogous to the VLS model.


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