The use of titanium-based contact barrier layers in silicon technology Export

@article{citeulike:4299065, author = {Ting, C. and Wittmer, M.}, citeulike-article-id = {4299065}, citeulike-linkout-0 = {http://dx.doi.org/10.1016/0040-6090(82)90516-8}, citeulike-linkout-1 = {http://linkinghub.elsevier.com/retrieve/pii/0040609082905168}, day = {22}, doi = {10.1016/0040-6090(82)90516-8}, issn = {00406090}, journal = {Thin Solid Films}, keywords = {contacts, schottky, silicon}, month = {October}, number = {4}, pages = {327--345}, posted-at = {2009-04-10 22:41:41}, priority = {2}, title = {The use of titanium-based contact barrier layers in silicon technology}, url = {http://dx.doi.org/10.1016/0040-6090(82)90516-8}, volume = {96}, year = {1982} }

TY - JOUR ID - citeulike:4299065 L3 - citeulike-article-id:4299065 IS - 4 JF - Thin Solid Films SN - 00406090 EP - 345 TI - The use of titanium-based contact barrier layers in silicon technology VL - 96 SP - 327 KW - contacts KW - schottky KW - silicon AU - Ting, C AU - Wittmer, M PY - 1982/October/22/ UR - http://dx.doi.org/10.1016/0040-6090(82)90516-8 ER -