denisamparo's Amparo:D [6 articles] Export

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	Effect of Electrical Stress on Josephson Tunneling Characteristics of <formula formulatype="inline"><tex Notation="TeX">$rm Nb/Al/AlO_x/rm Nb$</tex></formula> Junctions [My Copy] Applied Superconductivity, IEEE Transactions on, Vol. 19, No. 3. (30 June 2009), pp. 154-158. by D. Amparo, S. K. Tolpygo posted to no-tag by denisamparo on 2009-09-14 22:53:53 as
	Process-Induced Variability of <formula formulatype="inline"> <tex Notation="TeX">$rm Nb/Al/rm AlO_rm x/rm Nb$</tex></formula> Junctions in Superconductor Integrated <newline/>Circuits and Protection Against It [My Copy] Applied Superconductivity, IEEE Transactions on, Vol. 19, No. 3. (30 June 2009), pp. 135-139. by S. K. Tolpygo, D. Amparo, D. T. Yohannes, M. Meckbach, A. F. Kirichenko posted to no-tag by denisamparo on 2009-09-14 20:51:46 as
	Electrical stress effect on Josephson tunneling through ultrathin AlOx barrier in Nb/Al/AlOx/Nb junctions [My Copy] Journal of Applied Physics, Vol. 104 (September 2008), 063904. by Sergey K. Tolpygo, Denis Amparo posted to breakdown electricalstress josephson junction nbaloxnb by denisamparo on 2008-09-19 18:54:32 as
	Fabrication process development for superconducting VLSI circuits: minimizing plasma charging damage [My Copy] Journal of Physics: Conference Series, Vol. 97, No. 1. (2008), 012227. by S. K. Tolpygo, D. Amparo posted to no-tag by denisamparo on 2008-04-15 16:18:40 as
	Plasma process-induced damage to Josephson tunnel junctions in superconducting integrated circuits [My Copy] Superconductor Science and Technology, Vol. 20, No. 11. (2007), pp. S341-S349. by Sergey K. Tolpygo, Denis Amparo, Alex Kirichenko, Daniel Yohannes posted to damage josephson junction plasma by denisamparo on 2007-10-30 14:55:53 as
	20 kA/cm^2 Process Development for Superconducting Integrated Circuits With 80 GHz Clock Frequency [My Copy] Applied Superconductivity, IEEE Transactions on In Applied Superconductivity, IEEE Transactions on, Vol. 17, No. 2. (2007), pp. 946-951. by S. K. Tolpygo, D. Yohannes, R. T. Hunt, et al.J. A. Vivalda, D. Donnelly, D. Amparo, A. F. Kirichenko posted to fabrication highjc nbaloxnb by denisamparo on 2007-10-15 17:46:49 as

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josephson	15
nbaloxnb	15
junction	14
stress	5
fabrication	5
breakdown	4
capacitance	3
annealing	3
mtj	3
highjc	3
plasma	2
damage	2
qubit	2
thermal	2
electricalstress	1
mar	1
hydrogen	1
ultrathin	1
sqpc	1
ecr	1
oxygen	1
characterization	1
resonance	1
diagnostics	1
iv	1
characteristic	1
sem	1
inductance	1
quantumcomputing	1
rsfq	1
hypres	1
dielectric	1
electrical	1
definition	1
niobium	1
switching	1
oxide	1
submicron	1
proximityeffect	1
ic	1
anodization	1
microanalysis	1
josephon	1
statistics	1
jc	1
hysteresis	1
cryocooled	1

denisamparo's Amparo:D [6 articles] Export

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