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The dislocation origin and model of excess tunnel current in GaP <i>p-n</i> structures

by: V. V. Evstropov, M. Dzhumaeva, Yu Zhilyaev, N. Nazarov, A. A. Sitnikova, L. M. Fedorov
Semiconductors, Vol. 34, No. 11. (24 November 2000), pp. 1305-1310, doi:10.1134/1.1325428  Key: citeulike:11241452

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Abstract

An excess tunnel current in GaP epitaxial nondegenerate p-n junctions on GaP and Si substrates was studied. An important experimental result is that the slope of exponential current-voltage ( I–V ) characteristic (in ln I–V coordinates) is independent of the width of the space-charge region, i.e., on n -and p -region doping levels. This fact is unexplained by existing models. A dislocation shunt model based on multihop tunneling through a dislocation line, which may be considered as a chain of parabolic potential barriers, is proposed. The density of dislocations predicted by this model is in agreement with the transmission electron microscopy (TEM) observations.


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