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We investigate the physical mechanisms responsible for waveguide formation in silica glass induced by 1 kHz intense femtosecond laser pulses from a Ti-sapphire laser at 0.8 μm as well as from a femtosecond optical parametric amplifier at 1.5 μm. It is demonstrated that the densification taking place at the irradiated region is the principal cause for refractive index change in the waveguides written with both 0.8 and 1.5 μm pulses. The birefringence induced by the stress arising from such densification and its behavior against thermal annealing are also studied.
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