Three-dimensional phase field simulation for surface roughening of heteroepitaxial films with elastic anisotropy Export

@article{citeulike:325843, abstract = {The phase field methods have been employed to study the surface roughening of heteroepitaxial films with cubic elastic anisotropy in three dimensions during the annealing process. And the stress field for an arbitrarily-shaped surface has been simultaneously solved using the phase field microelasticity model. Our simulations reveal that the self-organized surface morphologies are strongly dependent on the elastic anisotropy. It is interesting to note that one can obtain favorable surface morphologies via selection of appropriate epitaxial orientations combined with tuning the strength of elastic anisotropy or modifying the asymmetric strains induced by lattice mismatches between the epitaxial materials and substrates.}, author = {Ni, Y. and He, L. H. and Soh, A. K.}, citeulike-article-id = {325843}, citeulike-linkout-0 = {http://dx.doi.org/10.1016/j.jcrysgro.2005.07.026}, citeulike-linkout-1 = {http://www.sciencedirect.com/science/article/B6TJ6-4H0S79J-2/2/64e6613f6b3e32aff6e579dec6569572}, day = {15}, doi = {10.1016/j.jcrysgro.2005.07.026}, journal = {Journal of Crystal Growth}, keywords = {asaro-tiller-grinfeld, microstructural-evolution, thin-films}, month = {October}, number = {1-2}, pages = {281--292}, posted-at = {2005-09-19 08:56:19}, priority = {2}, title = {Three-dimensional phase field simulation for surface roughening of heteroepitaxial films with elastic anisotropy}, url = {http://dx.doi.org/10.1016/j.jcrysgro.2005.07.026}, volume = {284}, year = {2005} }

TY - JOUR ID - citeulike:325843 L3 - citeulike-article-id:325843 N2 - The phase field methods have been employed to study the surface roughening of heteroepitaxial films with cubic elastic anisotropy in three dimensions during the annealing process. And the stress field for an arbitrarily-shaped surface has been simultaneously solved using the phase field microelasticity model. Our simulations reveal that the self-organized surface morphologies are strongly dependent on the elastic anisotropy. It is interesting to note that one can obtain favorable surface morphologies via selection of appropriate epitaxial orientations combined with tuning the strength of elastic anisotropy or modifying the asymmetric strains induced by lattice mismatches between the epitaxial materials and substrates. IS - 1-2 JF - Journal of Crystal Growth EP - 292 TI - Three-dimensional phase field simulation for surface roughening of heteroepitaxial films with elastic anisotropy VL - 284 SP - 281 KW - asaro-tiller-grinfeld KW - microstructural-evolution KW - thin-films AU - Ni, Y AU - He, LH AU - Soh, AK PY - 2005/10/15/ UR - http://dx.doi.org/10.1016/j.jcrysgro.2005.07.026 ER -