Oxidation mechanism of LaTiO_3.5 thin films Export

@article{citeulike:766334, abstract = {LaTiO 3.5 is a layered compound made up of four LaTiO 3 units:\^{a}€‚two regular perovskite units stacked between two distorted units that share an additional oxygen layer. In a single-crystalline thin film the (100) plane can be aligned parallel to the substrate surface; i.e.; the additional oxygen layers are inserted parallel to the substrate surface. A detailed structural characterization reveals planar defects originating from substrate surface steps. These results; in combination with the in situ reflection high-energy electron-diffraction observations; suggest an oxidation mechanism using such antiphase boundaries as oxidation paths.}, author = {Seo, J. W. and Fompeyrine, J. and Siegwart, H. and Locquet, J. P.}, citeulike-article-id = {766334}, citeulike-linkout-0 = {http://dx.doi.org/10.1103/PhysRevB.63.205401}, citeulike-linkout-1 = {http://link.aps.org/abstract/PRB/v63/i20/e205401}, citeulike-linkout-2 = {http://link.aps.org/pdf/PRB/v63/i20/e205401}, citeulike-linkout-3 = {http://dx.doi.org/10.1103/PhysRevB.63.205401}, citeulike-linkout-4 = {http://link.aps.org/abstract/PRB/v63/e205401}, day = {12}, doi = {10.1103/PhysRevB.63.205401}, journal = {Physical Review B}, keywords = {film, latio3}, month = {April}, number = {20}, pages = {205401+}, posted-at = {2006-07-20 09:42:01}, priority = {2}, publisher = {American Physical Society}, title = {Oxidation mechanism of LaTiO\_{3.5} thin films}, url = {http://dx.doi.org/10.1103/PhysRevB.63.205401}, volume = {63}, year = {2001} }

TY - JOUR ID - citeulike:766334 L3 - citeulike-article-id:766334 N2 - LaTiO 3.5 is a layered compound made up of four LaTiO 3 units: two regular perovskite units stacked between two distorted units that share an additional oxygen layer. In a single-crystalline thin film the (100) plane can be aligned parallel to the substrate surface; i.e.; the additional oxygen layers are inserted parallel to the substrate surface. A detailed structural characterization reveals planar defects originating from substrate surface steps. These results; in combination with the in situ reflection high-energy electron-diffraction observations; suggest an oxidation mechanism using such antiphase boundaries as oxidation paths. IS - 20 JF - Physical Review B TI - Oxidation mechanism of LaTiO_{3.5} thin films PB - American Physical Society VL - 63 SP - 205401 KW - film KW - latio3 AU - Seo, JW AU - Fompeyrine, J AU - Siegwart, H AU - Locquet, JP PY - 2001/04/12/ UR - http://dx.doi.org/10.1103/PhysRevB.63.205401 ER -