Thickness controlled and smooth polycrystalline CVD diamond film deposition on SiO2 with electrostatic self assembly seeding process Export

@article{citeulike:5340605, abstract = {Sub micrometer thick continuous CVD diamond film was synthesized on thermally grown SiO 2 film employing the electrostatic self assembly seeding with nano-meter sized ultra dispersed diamond particles. Hot filament CVD system was used to deposit diamond film. Formation of mono-dispersed and mono-layered nano diamond seeding layer by well-known Electrostatic Self-Assembly method was effective to increase density and homogeneity of seeding particles. Because of high density of uniformed seeding particles, the nm controlled continuous CVD films with the surface roughness of less than 13 nm on silicon oxide without any mechanical damage were obtained. Linear growth rate with short incubation time was also observed. Depending on the film thickness, coloring effect was observed ranging from blue to yellow and orange. There was no visible fringe on the coated surface which affirms the good thickness uniformity.}, author = {Kim, J. H. and Lee, S. K. and Kwon, O. M. and Hong, S. I. and Lim, D. S.}, citeulike-article-id = {5340605}, citeulike-linkout-0 = {http://dx.doi.org/10.1016/j.diamond.2009.04.012}, citeulike-linkout-1 = {http://linkinghub.elsevier.com/retrieve/pii/S0925963509001836}, day = {06}, doi = {10.1016/j.diamond.2009.04.012}, issn = {09259635}, journal = {Diamond and Related Materials}, keywords = {assembly, control, cvd, diamond, electrostatic, filament, hot, nano, self, thickness}, month = {October}, number = {10}, pages = {1218--1222}, posted-at = {2009-08-31 10:51:23}, priority = {0}, title = {Thickness controlled and smooth polycrystalline CVD diamond film deposition on SiO2 with electrostatic self assembly seeding process}, url = {http://dx.doi.org/10.1016/j.diamond.2009.04.012}, volume = {18}, year = {2009} }

TY - JOUR ID - citeulike:5340605 L3 - citeulike-article-id:5340605 N2 - Sub micrometer thick continuous CVD diamond film was synthesized on thermally grown SiO 2 film employing the electrostatic self assembly seeding with nano-meter sized ultra dispersed diamond particles. Hot filament CVD system was used to deposit diamond film. Formation of mono-dispersed and mono-layered nano diamond seeding layer by well-known Electrostatic Self-Assembly method was effective to increase density and homogeneity of seeding particles. Because of high density of uniformed seeding particles, the nm controlled continuous CVD films with the surface roughness of less than 13 nm on silicon oxide without any mechanical damage were obtained. Linear growth rate with short incubation time was also observed. Depending on the film thickness, coloring effect was observed ranging from blue to yellow and orange. There was no visible fringe on the coated surface which affirms the good thickness uniformity. IS - 10 JF - Diamond and Related Materials SN - 09259635 EP - 1222 TI - Thickness controlled and smooth polycrystalline CVD diamond film deposition on SiO2 with electrostatic self assembly seeding process VL - 18 SP - 1218 KW - assembly KW - control KW - cvd KW - diamond KW - electrostatic KW - filament KW - hot KW - nano KW - self KW - thickness AU - Kim, JH AU - Lee, SK AU - Kwon, OM AU - Hong, SI AU - Lim, DS PY - 2009/10/06/ UR - http://dx.doi.org/10.1016/j.diamond.2009.04.012 ER -