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Electrooptical effects in silicon

by: R. Soref, B. Bennett
Quantum Electronics, IEEE Journal of, Vol. 23, No. 1. (January 1987), pp. 123-129, doi:10.1109/jqe.1987.1073206  Key: citeulike:6937487

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Abstract

A numerical Kramers-Kronig analysis is used to predict the refractive-index perturbations produced in crystalline silicon by applied electric fields or by charge carriers. Results are obtained over the1.0-2.0 mum optical wavelength range. The analysis makes use of experimental electroabsorption spectra and impurity-doping spectra taken from the literature. For electrorefraction at the indirect gap, we findDelta n = 1.3 times 10^5atlambda = 1.07 mum whenE = 10^5V/cm, while the Kerr effect givesDelta n = 10^-6at that field strength. The charge-carrier effects are larger, and a depletion or injection of 1018carriers/cm3produces an index change ofpm1.5 times 10^-3atlambda = 1.3 mum.


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