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Microfluidic method for in-situ deposition and precision patterning of thin-film metals on curved surfaces Export

Appl Phys Lett, Vol. 85, No. 16. (2004), pp. 3629-3631.

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We present a technique for patterning thin-film metals (silver and gold) without the need for photolithography. The technique involves microfluidics and can be performed on planar or curved surfaces. Patterns of thin-film metal are fabricated by flowing electroless silver or gold plating solutions through predefined microchannels made of polydimethylsiloxane sealed against a surface of interest. We demonstrate metal resistors with 100-?m-wide traces fabricated on planar and curved surfaces. The surface profile, mechanical gauge factor, and temperature coefficient of resistance have been characterized. Application of the resistors as hot-wire flow sensors has also been demonstrated. © 2004 American Institute of Physics.


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