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A compact refractometric sensor based on grated silicon photonic wires Export

Sensors and Actuators B: Chemical, Vol. 139, No. 1. (20 May 2009), pp. 194-198.

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Grated silicon photonic wires for refractometric applications have been fabricated using a 248-nm deep UV lithography. It is shown experimentally, that a device with length of only 180 μm has an index sensitivity of 10 −6 assuming a detector power resolution of 1%. It is also demonstrated that the device is suitable to monitor index changes in a liquid cladding, which could be used to monitor on chip chemical reactions.


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