CMOS compatible cost-efficient fabrication of SOI grating couplers Export

@article{citeulike:5976741, abstract = {A CMOS compatible process for the cost-efficient fabrication of SOI grating couplers is presented. Test devices have been fabricated and characterized in a fully automated measurement setup at telecom wavelength (1550 nm). Coupling efficiencies of −3.6 and −4.1 dB have been achieved for TE and TM polarization, respectively. The 3 dB bandwidth has been measured to be about 50 nm.}, author = {Bolten, Jens and Hofrichter, Jens and Moll, Nikolaj and Sch\"{o}nenberger, Sophie and Horst, Folkert and Offrein, Bert J. and Wahlbrink, Thorsten and Mollenhauer, Thomas and Kurz, Heinrich}, citeulike-article-id = {5976741}, citeulike-linkout-0 = {http://dx.doi.org/10.1016/j.mee.2008.11.038}, citeulike-linkout-1 = {http://linkinghub.elsevier.com/retrieve/pii/S0167931708005431}, doi = {10.1016/j.mee.2008.11.038}, issn = {01679317}, journal = {Microelectronic Engineering}, keywords = {coupler, electron\_beam, fiber\_optics, grating, hsq, lithography, silicon, silicon\_oxide, soi}, month = {April}, number = {4-6}, pages = {1114--1116}, posted-at = {2009-10-20 21:47:20}, priority = {2}, title = {CMOS compatible cost-efficient fabrication of SOI grating couplers}, url = {http://dx.doi.org/10.1016/j.mee.2008.11.038}, volume = {86}, year = {2009} }

TY - JOUR ID - citeulike:5976741 L3 - citeulike-article-id:5976741 N2 - A CMOS compatible process for the cost-efficient fabrication of SOI grating couplers is presented. Test devices have been fabricated and characterized in a fully automated measurement setup at telecom wavelength (1550 nm). Coupling efficiencies of −3.6 and −4.1 dB have been achieved for TE and TM polarization, respectively. The 3 dB bandwidth has been measured to be about 50 nm. IS - 4-6 JF - Microelectronic Engineering SN - 01679317 EP - 1116 TI - CMOS compatible cost-efficient fabrication of SOI grating couplers VL - 86 SP - 1114 KW - coupler KW - electron_beam KW - fiber_optics KW - grating KW - hsq KW - lithography KW - silicon KW - silicon_oxide KW - soi AU - Bolten, Jens AU - Hofrichter, Jens AU - Moll, Nikolaj AU - Schönenberger, Sophie AU - Horst, Folkert AU - Offrein, Bert AU - Wahlbrink, Thorsten AU - Mollenhauer, Thomas AU - Kurz, Heinrich PY - 2009/04// UR - http://dx.doi.org/10.1016/j.mee.2008.11.038 ER -