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	Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods [My Copy] Lithography Asia 2009, Vol. 7520, No. 1. (2009), 75200X. by Linyong Pang, Peter Hu, Danping Peng, et al.Dongxue Chen, Tom Cecil, Lin He, Guangming Xiao, Vikram Tolani, Thuc Dam, Ki H. Baik, Bob Gleason edited by Alek C. Chen, Woo S. Han, Burn J. Lin, Anthony Yen posted to no-tag by ozzy24 on 2009-12-24 18:58:52 as along with 1 person mattismyname
	An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging [My Copy] In Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, Vol. 7140 (November 2008) by S. Hsu, H. Hsu, L. Chen, et al.Z. Li, S. Park, K. Gronlund, Liu, H.-Y., N. Callan, R. Socha, S. Hansen posted to file-import-09-12-11 by ozzy24 on 2009-12-11 19:41:50 as
	Fast pixel-based mask optimization for inverse lithography [My Copy] Journal of Microlithography, Microfabrication, and Microsystems, Vol. 5, No. 4. (2006), 043002. by Yuri Granik posted to pixel mask_optimization lithography by ozzy24 on 2009-12-11 19:20:46 as
	Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process [My Copy] Optical Microlithography XXII, Vol. 7274, No. 1. (2009), 72740A. by Kafai Lai, Alan E. Rosenbluth, Saeed Bagheri, et al.John Hoffnagle, Kehan Tian, David Melville, Jaione T. Azpiroz, Moutaz Fakhry, Young Kim, Scott Halle, Greg McIntyre, Alfred Wagner, Geoffrey Burr, Martin Burkhardt, Daniel Corliss, Emily Gallagher, Tom Faure, Michael Hibbs, Donis Flagello, Joerg Zimmermann, Bernhard Kneer, Frank Rohmund, Frank Hartung, Christoph Hennerkes, Manfred Maul, Robert Kazinczi, Andre Engelen, Rene Carpaij, Remco Groenendijk, Joost Hageman, Carsten Russ edited by Harry J. Levinson, Mircea V. Dusa posted to no-tag by ozzy24 on 2009-11-02 23:34:38 as along with 1 person mattismyname
	Benefits and trade-offs of global source optimization in optical lithography [My Copy] Optical Microlithography XXII, Vol. 7274, No. 1. (2009), 72740C. by Kehan Tian, Azalia Krasnoperova, David Melville, et al.Alan E. Rosenbluth, Dario Gil, Jaione T. Azpiroz, Kafai Lai, Saeed Bagheri, Chia C. Chen, Bradley Morgenfeld edited by Harry J. Levinson, Mircea V. Dusa posted to no-tag by ozzy24 on 2009-11-02 16:24:06 as
	Source optimization for three-dimensional image designs through film stacks [My Copy] Optical Microlithography XXII, Vol. 7274, No. 1. (2009), 72743D. by David O. S. Melville, Alan E. Rosenbluth, Kehan Tian, Dario Goldfarb, Stefan Harrer, Matthew Colburn edited by Harry J. Levinson, Mircea V. Dusa posted to no-tag by ozzy24 on 2009-11-02 16:23:08 as
	Intensive optimization of masks and sources for 22nm lithography [My Copy] Optical Microlithography XXII, Vol. 7274, No. 1. (2009), 727409. by Alan E. Rosenbluth, David O. Melville, Kehan Tian, et al.Saeed Bagheri, Jaione T. Azpiroz, Kafai Lai, Andreas Waechter, Tadanobu Inoue, Laszlo Ladanyi, Francisco Barahona, Katya Scheinberg, Masaharu Sakamoto, Hidemasa Muta, Emily Gallagher, Tom Faure, Michael Hibbs, Alexander Tritchkov, Yuri Granik edited by Harry J. Levinson, Mircea V. Dusa posted to no-tag by ozzy24 on 2009-11-02 16:21:24 as
	Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO) [My Copy] Photomask Technology 2008, Vol. 7122, No. 1. (2008), 71221W. by Linyong Pang, Guangming Xiao, Vikram Tolani, et al.Peter Hu, Thomas Cecil, Thuc Dam, Ki H. Baik, Bob Gleason edited by Hiroichi Kawahira, Larry S. Zurbrick posted to meef smo by ozzy24 on 2009-07-25 20:03:11 as
	Imprint Lithography with 25-Nanometer Resolution [My Copy] Science, Vol. 272, No. 5258. (5 April 1996), pp. 85-87. by Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom posted to no-tag by ozzy24 on 2009-02-25 14:22:05 as along with 1 person and 1 group ZhaoZhang Macroelectronics
	Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography [My Copy] Papers from the 43rd international conference on electron, ion, and photon beam technology and nanofabrication, Vol. 17, No. 6. (1999), pp. 2957-2960. by Jian Wang, Steven Schablitsky, Zhaoning Yu, Wei Wu, Stephen Y. Chou posted to no-tag by ozzy24 on 2009-02-25 14:19:53 as
	Fabrication of 10 nm enclosed nanofluidic channels [My Copy] Applied Physics Letters, Vol. 81, No. 1. (2002), pp. 174-176. by Han Cao, Zhaoning Yu, Jian Wang, et al.Jonas O. Tegenfeldt, Robert H. Austin, Erli Chen, Wei Wu, Stephen Y. Chou posted to 3d by ozzy24 on 2009-02-25 14:17:43 as
	Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's [My Copy] Optical Microlithography XX, Vol. 6520, No. 1. (2007) by Alan E. Rosenbluth, David Melville, Kehan Tian, et al.Kafai Lai, Nakgeuon Seong, Dirk Pfeiffer, Matthew Colburn edited by Donis G. Flagello posted to mask_optimization smo by ozzy24 on 2009-01-09 16:35:42 as
	Customized illumination aperture filter for low k1 photolithography process [My Copy] In Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, Vol. 4000 (July 2000), pp. 271-282. by T. S. Gau, R. G. Liu, C. K. Chen, C. M. Lai, F. J. Liang, C. C. Hsia edited by C. J. Progler posted to source_optimization by ozzy24 on 2008-12-23 15:30:56 as
	Simultaneous source mask optimization (SMO) [My Copy] In Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, Vol. 5853 (June 2005), pp. 180-193. by R. Socha, X. Shi, D. Lehoty edited by M. Komuro posted to smo by ozzy24 on 2008-12-23 14:25:01 as
	Source optimization for image fidelity and throughput [My Copy] Journal of Microlithography, Microfabrication, and Microsystems, Vol. 3, No. 4. (2004), pp. 509-522. by Yuri Granik posted to source_optimization by ozzy24 on 2008-12-23 14:24:17 as
	Illuminator design for the printing of regular contact patterns [My Copy] Microelectron. Eng., Vol. 41-42 (1998), pp. 91-95. by Martin Burkhardt, Anthony Yen, Christopher Progler, Greg Wells posted to smo source_optimization by ozzy24 on 2008-12-23 14:22:10 as
	Optimum mask and source patterns to print a given shape [My Copy] Journal of Microlithography, Microfabrication, and Microsystems, Vol. 1, No. 1. (2002), pp. 13-30. by Alan E. Rosenbluth, Scott Bukofsky, Carlos Fonseca, et al.Michael Hibbs, Kafai Lai, Antoinette F. Molless, Rama N. Singh, Alfred K. K. Wong posted to smo by ozzy24 on 2008-12-23 14:19:47 as
	Global optimization of the illumination distribution to maximize integrated process window [My Copy] Optical Microlithography XIX, Vol. 6154, No. 1. (2006) by Alan E. Rosenbluth, Nakgeuon Seong edited by Donis G. Flagello posted to smo by ozzy24 on 2008-12-23 14:16:53 as

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