Minimizing Fizeau fringes during the contact printing of diffraction gratings Export

@inproceedings{citeulike:1658815, abstract = {An index matching fluid has been used to minimize the effect of interference fringes which develop when contact printing diffraction gratings on silicon wafers. These fringes are the result of interference effects when there is a small but uneven gap between the photomask and resist surface. They are especially troublesome when printing and etching large area, coarse diffraction gratings on the surface of silicon wafers and silicon disks.}, author = {Ciarlo, D. R. and Rushford, M. C. and Kuzmenko, P. J. and Ge, J.}, booktitle = {Proc. SPIE Vol. 4440, p. 202-208, Lithographic and Micromachining Techniques for Optical Component Fabrication, Ernst-Bernhard Kley; Hans-Peter Herzig; Eds.}, citeulike-article-id = {1658815}, citeulike-linkout-0 = {http://adsabs.harvard.edu/cgi-bin/nph-bib_query?bibcode=2001SPIE.4440..202C}, editor = {Kley, E. B. and Herzig, H. P.}, keywords = {citedby1, contact, diffraction, fizeau}, month = {November}, pages = {202--208}, posted-at = {2007-09-14 21:19:32}, priority = {2}, series = {Presented at the Society of Photo-Optical Instrumentation Engineers (SPIE) Conference}, title = {Minimizing Fizeau fringes during the contact printing of diffraction gratings}, url = {http://adsabs.harvard.edu/cgi-bin/nph-bib_query?bibcode=2001SPIE.4440..202C}, volume = {4440}, year = {2001} }

TY - CONF ID - citeulike:1658815 L3 - citeulike-article-id:1658815 N2 - An index matching fluid has been used to minimize the effect of interference fringes which develop when contact printing diffraction gratings on silicon wafers. These fringes are the result of interference effects when there is a small but uneven gap between the photomask and resist surface. They are especially troublesome when printing and etching large area, coarse diffraction gratings on the surface of silicon wafers and silicon disks. SE - Presented at the Society of Photo-Optical Instrumentation Engineers (SPIE) Conference EP - 208 TI - Minimizing Fizeau fringes during the contact printing of diffraction gratings VL - 4440 T2 - Proc. SPIE Vol. 4440, p. 202-208, Lithographic and Micromachining Techniques for Optical Component Fabrication, Ernst-Bernhard Kley; Hans-Peter Herzig; Eds. SP - 202 KW - citedby1 KW - contact KW - diffraction KW - fizeau AU - Ciarlo, DR AU - Rushford, MC AU - Kuzmenko, PJ AU - Ge, J A2 - Kley, EB A2 - Herzig, HP PY - 2001/November// UR - http://adsabs.harvard.edu/cgi-bin/nph-bib_query?bibcode=2001SPIE.4440..202C ER -