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Dry development of sub-0.25 mu m features patterned with 193 nm silylation resist

The 42nd national symposium of the American Vacuum Society, Vol. 14, No. 3. (1996), pp. 1132-1136.

by S. C. Palmateer, A. R. Forte, R. R. Kunz, M. W. Horn

posted to 193nm development dry fabrication lithography photolithography silylation submicron patterns photoresist resist by rodney on 2007-09-03 21:29:55 as

along with 1 group Kopelman_Group

Profile control in dry development of high-aspect-ratio resist structures

The 38th International symposium on electron, ion, and photon beams, Vol. 13, No. 6. (1995), pp. 3017-3021.

by M. B. Stern, S. C. Palmateer, M. W. Horn, M. Rothschild, B. E. Maxwell, J. E. Curtin

posted to aspect-ratio development dry fabrication lithography photolithography profile photoresist resist by rodney on 2007-09-03 21:22:33 as

along with 1 group Kopelman_Group

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