rodney's lithography [42 articles] Export

Recent papers added to rodney's library classified by the tag lithography. You can also see everyone's lithography.

	Template-Assisted Three-Dimensional Nanolithography via Geometrically Irreversible Processing [My Copy] Nano Letters, Vol. 0, No. 0. (0000) by Xindi Yu, Huigang Zhang, John K. Oliverio, Paul V. Braun posted to microsphere lithography fabrication crystal by rodney on 2009-11-23 22:47:10 as
	Conformal contact and pattern stability of stamps used for soft lithography [My Copy] Journal of Applied Physics, Vol. 88, No. 7. (2000), pp. 4310-4318. by Alexander Bietsch, Bruno Michel posted to stamp printing lithography journalclub contact conformal by rodney on 2009-08-04 19:14:38 as
	Laser-induced oxidation of metallic thin films as a method for creating grayscale photomasks [My Copy] Advances in Resist Technology and Processing XXIII, Vol. 6153, No. 1. (2006) by Glenn H. Chapman, Yuqiang Tu, Chinheng Choo, Jun Wang, David K. Poon, Marian Chang edited by Qinghuang Lin posted to citedby1 films lithography masks metallic oxidation lasers by rodney on 2009-01-12 18:20:05 as
	Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks [My Copy] Photon Processing in Microelectronics and Photonics IV, Vol. 5713, No. 1. (2005), pp. 247-258. by Glenn H. Chapman, James Dykes, David Poon, et al.Chinheng Choo, Jun Wang, Jun Peng, Yuqiang Tu edited by Jim Fieret, Peter R. Herman, Tatsuo Okada, et al.Craig B. Arnold, Friedrich G. Bachmann, Willem Hoving, Kunihiko Washio, Yongfeng Lu, David B. Geohegan, Frank Trager, Jan J. Dubowski posted to 3-d bimetallic citedby1 grayscale lasers lithography masks metallic microstructures photoresist resist thermal by rodney on 2009-01-12 04:47:47 as
	Linewidth uniformity in Lloyd's mirror interference lithography systems [My Copy] Vol. 26, No. 6. (2008), pp. 2131-2134. by Thomas B. O'Reilly, Henry I. Smith posted to citedby1 holographic interference linewidth lithography gratings by rodney on 2009-01-12 04:04:16 as
	Direct measurement of the complex refractive index in the extreme ultraviolet spectral region using diffraction from a nanosphere array [My Copy] Applied Physics Letters, Vol. 93, No. 23. (2008) by B. Mills, C. F. Chau, E. T. F. Rogers, et al.Grant J. Jacob, S. L. Stebbings, M. Praeger, A. M. de Paula, C. A. Froud, R. T. Chapman, T. J. Butcher, J. J. Baumberg, W. S. Brocklesby, J. G. Frey posted to arrays colloidal diffraction index lithography mie nanoparticles refraction scattering ultraviolet xuv gratings nanospheres by rodney on 2008-12-17 17:40:11 as
	Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays [My Copy] Science, Vol. 322, No. 5900. (17 October 2008), pp. 429-432. by Chuanbing Tang, Erin M. Lennon, Glenn H. Fredrickson, Edward J. Kramer, Craig J. Hawker posted to arrays block copolymer cylindrical lithography nanoparticles by rodney on 2008-12-14 04:55:57 as
	Developed profile of holographically exposed photoresist gratings [My Copy] Appl. Opt., Vol. 34, No. 4. (1 February 1995), pp. 597-603. by De, Ivan F. da Costa, Carlos R. Lima, Lucila Cescato posted to development holographic lithography profile photoresist resist by rodney on 2008-07-27 22:45:08 as
	Multiple-level phase gratings fabricated using focused ion-beam milling and electron-beam lithography [My Copy] The 38th international symposium on electron, ion, and photon beams, Vol. 12, No. 6. (1994), pp. 3643-3647. by S. M. Shank, F. T. Chen, M. Skvarla, et al.H. G. Craighead, P. Cook, R. Bussjager, F. Haas, D. A. Honey posted to diffraction e-beam fabrication ion-beam lithography phase by rodney on 2008-07-27 22:22:05 as
	Flow of a Viscous Liquid on a Rotating Disk [My Copy] Journal of Applied Physics, Vol. 29, No. 5. (1958), pp. 858-862. by Alfred G. Emslie, Francis T. Bonner, Leslie G. Peck posted to disk flow lithography photolithography viscosity rotational by rodney on 2008-07-27 22:00:40 as
	Process-specific tuning of lithography simulation tools [My Copy] In Proc. SPIE Vol. 3051, p. 491-498, Optical Microlithography X, Gene E. Fuller; Ed., Vol. 3051 (July 1997), pp. 491-498. by M. E. Mason, R. A. Soper, R. M. Terry, C. A. Mack edited by G. E. Fuller posted to development fabrication lithography parameters photolithography prolith2 simulation by rodney on 2007-09-05 20:58:02 as along with 1 group Kopelman_Group
	Lithography model tuning: matching simulation to experiment [My Copy] In Proc. SPIE Vol. 2726, p. 223-235, Optical Microlithography IX, Gene E. Fuller; Ed., Vol. 2726 (June 1996), pp. 223-235. by S. H. Thornton, C. A. Mack edited by G. E. Fuller posted to development dose exposure fabrication lithography parameters photolithography prolith2 simulation thickness experimental photoresist resist by rodney on 2007-09-05 20:55:15 as along with 1 group Kopelman_Group
	Imaging interferometric lithography for arbitrary patterns [My Copy] In Proc. SPIE Vol. 3331, p. 214-224, Emerging Lithographic Technologies II, Yuli Vladimirsky; Ed., Vol. 3331 (June 1998), pp. 214-224. by X. Chen, S. R. Brueck edited by Y. Vladimirsky posted to lithography patterns photolithography by rodney on 2007-09-05 00:10:27 as along with 1 group Kopelman_Group
	Generation of subquarter-micron resist structures using optical interference lithography and image reversal [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.1949-1953, Vol. 15 (November 1997), pp. 1949-1953. by J. Y. Decker, A. Fernandez, D. W. Sweeney posted to fabrication image lithography optical photolithography reversal submicron holographic photoresist resist by rodney on 2007-09-05 00:08:46 as along with 1 group Kopelman_Group
	Methods for fabricating arrays of holes using interference lithography [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.2439-2443, Vol. 15 (November 1997), pp. 2439-2443. by A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, M. D. Perry posted to fabrication lithography photolithography arrays holes holographic by rodney on 2007-09-05 00:07:32 as along with 1 group Kopelman_Group
	Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 3, May 1997, pp.729-735, Vol. 15 (May 1997), pp. 729-735. by A. Fernandez, H. T. Nguyen, J. A. Britten, et al.R. D. Boyd, M. D. Perry, D. R. Kania, A. M. Hawryluk posted to displays emission fabrication field flat lithography panel submicron arrays holographic fe iron patterns photoresist resist by rodney on 2007-09-05 00:06:03 as along with 1 group Kopelman_Group
	Large-area achromatic interferometric lithography for 100 nm period gratings and grids [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 6, November 1996, pp.4167-4170, Vol. 14 (November 1996), pp. 4167-4170. by T. A. Savas, M. L. Schattenburg, J. M. Carter, H. I. Smith posted to achromatic fabrication grids large-field lithography photolithography submicron by rodney on 2007-09-05 00:04:27 as along with 1 group Kopelman_Group
	Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 5, September 1996, pp.3339-3349, Vol. 14 (September 1996), pp. 3339-3349. by X. Chen, S. H. Zaidi, S. R. J. Brueck, D. J. Devine posted to display emission fabrication field lithography photolithography submicron arrays holes holographic fe iron by rodney on 2007-09-05 00:02:40 as along with 1 group Kopelman_Group
	Fabrication of sub-0.5 micron diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm × 50 cm glass substrates using laser interference lithograph [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 3, May 1996, pp.2005-2007, Vol. 14 (May 1996), pp. 2005-2007. by J. P. Spallas, R. D. Boyd, J. A. Britten, et al.A. Fernandez, A. M. Hawryluk, M. D. Perry, D. R. Kania posted to cobalt dots fabrication glass large-field lithography pedestals photolithography silicon submicron substrates arrays holographic photoresist resist by rodney on 2007-09-05 00:00:08 as along with 1 group Kopelman_Group
	Optically matched trilevel resist process for nanostructure fabrication [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.3007-3011, Vol. 13 (November 1995), pp. 3007-3011. by M. L. Schattenburg, R. J. Aucoin, R. C. Fleming posted to fabrication lithography matched nanostructures optical photolithography trilevel photoresist resist by rodney on 2007-09-04 23:58:03 as along with 1 group Kopelman_Group
	Achromatic interferometric lithography for 100-nm-period gratings and grids [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2732-2735, Vol. 13 (November 1995), pp. 2732-2735. by T. A. Savas, S. N. Shah, M. L. Schattenburg, J. M. Carter, H. I. Smith posted to achromatic grids lithography photolithography submicron holographic by rodney on 2007-09-04 23:56:25 as along with 1 group Kopelman_Group
	Field emitter array mask patterning using laser interference lithography [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 5, September 1995, pp.1973-1978, Vol. 13 (September 1995), pp. 1973-1978. by J. P. Spallas, A. M. Hawryluk, D. R. Kania posted to emitter field lithography photolithography arrays holographic masks patterns by rodney on 2007-09-04 23:54:55 as along with 1 group Kopelman_Group
	Multiple-exposure interferometric lithography [My Copy] In Proc. SPIE Vol. 2197, p. 869-875, Optical/Laser Microlithography VII, Timothy A. Brunner; Ed., Vol. 2197 (May 1994), pp. 869-875. by S. H. Zaidi, S. R. Brueck edited by T. A. Brunner posted to exposure lithography multiple photolithography holographic by rodney on 2007-09-04 23:47:22 as along with 1 group Kopelman_Group
	Sub-0.1 micron patterning with high aspect ratio of 5 achieved by preventing pattern collapse [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 35, No. 4 A. (1996), pp. 2385-2386. by Y. Yamashita posted to aspect-ratio collapse fabrication lithography photolithography submicron patterns by rodney on 2007-09-03 21:36:31 as along with 1 group Kopelman_Group
	Surface adhesion reduction in silicon microstructures using femtosecond laser pulses [My Copy] Applied Physics Letters, Vol. 68 (January 1996), pp. 197-199. by N. C. Tien, S. Jeong, L. M. Phinney, K. Fushinobu, J. Bokor posted to adhesion fabrication lithography microstructures photolithography pulses silicon surface fe iron lasers by rodney on 2007-09-03 21:33:42 as along with 1 group Kopelman_Group
	Dry development of photosensitive polyimides for high resolution and aspect ratio applications [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2179-2183, Vol. 13 (November 1995), pp. 2179-2183. by J. Muñoz, C. Dom\ínguez posted to aspect-ratio development dry fabrication high lithography photolithography photosensitizers polyimides resolution photoresist resist by rodney on 2007-09-03 21:32:10 as along with 1 group Kopelman_Group
	Dry development of sub-0.25 mu m features patterned with 193 nm silylation resist [My Copy] The 42nd national symposium of the American Vacuum Society, Vol. 14, No. 3. (1996), pp. 1132-1136. by S. C. Palmateer, A. R. Forte, R. R. Kunz, M. W. Horn posted to 193nm development dry fabrication lithography photolithography silylation submicron patterns photoresist resist by rodney on 2007-09-03 21:29:55 as along with 1 group Kopelman_Group
	Effect of low-solubility surface layer on development of AZ-PF514 [My Copy] Proceedings of the 16th international symposium on electron, ion, and photon beams, Vol. 11, No. 6. (1993), pp. 2829-2833. by Azalia A. Krasnoperova, Stephen W. Turner, Leo Ocola, Franco Cerrina posted to az-pf514 development fabrication lithography low-solubility photolithography surface photoresist resist by rodney on 2007-09-03 21:27:29 as along with 1 group Kopelman_Group
	Photoresist-Assisted Release of Movable Microstructures [My Copy] Japanese Journal of Applied Physics, Vol. 32 (November 1993), pp. L1642-L1644. by D. Kobayashi, C. J. Kim, H. Fujita posted to fabrication lithography microstructures movable photolithography photoresist resist by rodney on 2007-09-03 21:25:33 as along with 1 group Kopelman_Group
	Profile control in dry development of high-aspect-ratio resist structures [My Copy] The 38th International symposium on electron, ion, and photon beams, Vol. 13, No. 6. (1995), pp. 3017-3021. by M. B. Stern, S. C. Palmateer, M. W. Horn, M. Rothschild, B. E. Maxwell, J. E. Curtin posted to aspect-ratio development dry fabrication lithography photolithography profile photoresist resist by rodney on 2007-09-03 21:22:33 as along with 1 group Kopelman_Group
	Surface tension, adhesion and wetting of materials for photolithographic process [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 14, No. 4. (1996), pp. 2485-2492. by J. Bauer, G. Drescher, M. Illig posted to adhesion collapse contact fabrication lithography photolithography surface tension angle angles angular by rodney on 2007-09-03 21:15:12 as along with 2 people and 1 group SiljaSenkbeil carygallen Kopelman_Group
	Adhesion of Resist Micropatterns during Drying after Water Rinse [My Copy] Japanese Journal of Applied Physics, Vol. 34 (August 1995), pp. L1093-L1094. by A. Kawai posted to adhesion collapse fabrication lithography photolithography water patterns photoresist resist by rodney on 2007-09-03 21:14:01 as along with 1 group Kopelman_Group
	Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water [My Copy] Applied Physics Letters, Vol. 66, No. 20. (1995), pp. 2655-2657. by Hideo Namatsu, Kenji Kurihara, Masao Nagase, Kazumi Iwadate, Katsumi Murase posted to collapse fabrication lithography photolithography silicon surface tension water patterns by rodney on 2007-09-03 21:12:31 as along with 1 group Kopelman_Group
	Mechanism of Resist Pattern Collapse during Development Process [My Copy] Japanese Journal of Applied Physics, Vol. 32 (December 1993), 6059. by T. Tanaka, M. Morigami, N. Atoda posted to collapse development fabrication lithography photolithography patterns photoresist resist by rodney on 2007-09-03 21:10:45 as along with 1 group Kopelman_Group
	Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process [My Copy] Japanese Journal of Applied Physics, Vol. 33 (December 1994), pp. L1803-L1805. by T. Tanaka, M. Morigami, H. Oizumi, T. Ogawa, Uchino posted to collapse exposure fabrication flood lithography photolithography patterns photoresist resist by rodney on 2007-09-03 21:08:43 as along with 1 group Kopelman_Group
	Patterning characteristics of a chemically-amplified negative resist in synchrotron radiation lithography [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 31, No. 9 A. (1992), pp. 2954-2958. by Kimiyoshi Deguchi, Kazunori Miyoshi, Tetsuyoshi Ishii, Tadahito Matsuda posted to amplified chemical collapse fabrication lithography negative patterns photolithography photoresist radiation resist synchrotron by rodney on 2007-09-03 21:07:00 as along with 1 group Kopelman_Group
	Calibration and validation of projection lithography focusing by fluorescence detection of latent photoacid images in chemically amplified resist [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 20, Issue 1, January 2002, pp.164-166, Vol. 20 (January 2002), pp. 164-166. by G. D. Feke, R. D. Grober, G. Pohlers, J. F. Cameron posted to amplified calibration detection fluorescence focus latent lithography photoacid projection chemical photoresist resist by rodney on 2007-08-16 02:34:03 as along with 1 group Kopelman_Group
	Natural lithography [My Copy] Applied Physics Letters, Vol. 41, No. 4. (1982), pp. 377-379. by H. W. Deckman, J. H. Dunsmuir posted to fabrication lithography layers nanospheres by rodney on 2007-08-06 03:52:09 as along with 1 person and 1 group ijbuss Kopelman_Group
	Rapid communication Fabrication of nano-dot- and nano-ring-arrays by nanosphere lithography [My Copy] Applied Physics A: Materials Science & Processing, Vol. 63 (1996), pp. 617-619. by M. Winzer, M. Kleiber, N. Dix, R. Wiesendanger posted to arrays fabrication layers lithography nanodots nanoparticles nanospheres by rodney on 2007-08-02 22:18:08 as along with 1 person and 1 group xxxxxxxxxxx Kopelman_Group
	Tracking Single Molecular Diffusion on Glass Substrate Modified with Periodic Ag Nano-architecture [My Copy] Japanese Journal of Applied Physics, Vol. 45 (July 2006), 6039. by B. Takimoto, H. Nabika, K. Murakoshi posted to diffusion glass lithography nanostructures periodic silver molecular nanoparticles nanoprisms nanospheres by rodney on 2007-08-01 02:17:38 as along with 1 group Kopelman_Group
	Biomolecular recognition using submicron laser lithography [My Copy] Applied Physics Letters, Vol. 73, No. 3. (1998), pp. 417-419. by G. V. Shivashankar, A. Libchaber posted to au avidin binding biotin dna gold heat lasers lithography nanoparticles optical surface by rodney on 2007-07-26 05:19:33 as along with 1 group Kopelman_Group
	Scaling behavior in interference lithography [My Copy] Emerging Lithographic Technologies II, Vol. 3331, No. 1. (1998), pp. 662-672. by Rodney R. Agayan, William C. Banyai, Andres J. Fernandez edited by Yuli Vladimirsky posted to diffraction freeze-drying lithography optical by rodney on 2007-03-03 22:45:08 as along with 1 group Kopelman_Group

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optical	517
nanoparticles	309
tweezers	299
trap	195
microparticles	135
fluorescence	133
rotational	127
plasmons	115
surface	111
spectroscopy	98
microscopy	97
metallic	95
magnetic	90
lasers	88
gold	86
theory	85
diffusion	83
iron	83
fe	83
molecular	82
cells	76
forces	69
microspheres	65
review	64
two-photon	62
resonance	59
colloidal	56
detection	55
microtubules	54
absorption	54
ultrafast	48
silver	47
pdt	47
torques	46
enhancement	45
spheres	45
spr	45
fabrication	43
arrays	43
motors	42
lithography	42
dimers	42
brownian	41
raman	39
proteins	36
holographic	35
friction	35
layers	35
alignment	34
oxygen	33
radiation	33
citedby4	33
dna	32
motor	32
therapy	32
pulses	32
films	30
citedby2	30
nanoshells	29
photodynamic	29
correlation	29
hybrid	29
doublets	29
near-field	28
dynamics	28
quantum	28
confocal	27
photolithography	27
kinesin	27
dielectric	27
heat	26
silica	26
diffraction	25
mie	25
bacteria	24
fluids	24
energy	24
assembly	24
optics	23
focus	23
angle	23
simulation	23
manipulation	23
polarization	22
crystals	22
angular	22
pressure	22
aspherical	22
resist	22
photoresist	22
membranes	22
patterns	22
angles	22
hydrodynamics	21
flow	21
2-d	21
aggregates	21
light	20
spherical	20
3-d	20
nir	19
characterization	19
nanorods	19
viscosity	18
experimental	18
water	18
ions	18
orientation	18
imaging	18
citedby6	18
thermal	18
anisotropy	17
biosensors	17
atoms	17
dumbbell	17
atomic	17
cro2	17
fibers	17
nonuniform	17
particles	17
atom	17
near-infrared	17
anisotropic	17
temperature	16
shear	16
transport	16
fcs	16
refraction	16
silicon	15
cancer	15
biology	15
self-assembly	15
microrheology	15
core-shell	15
time-resolved	15
clusters	15
surfaces	15
dendrimers	15
electric	14
c1ref	14
translational	14
sers	14
nanotechnology	14
tir	13
reflection	13
sensors	13
liquid	13
coherence	13
photonics	13
contact	13
qip	13
carbon	13
photosensitizers	13
nanotubes	13
numerical	12
dots	12
rayoptics	12
microscale	12
dispersion	12
nanoscale	12
forfun	12
evanescent	12
adhesion	12
computing	12
aberrations	11
field	11
polymer	11
afm	11
gradient	11
tirf	11
dipole	11
submicron	11
resolution	11
ao_2002	11
electromagnetics	11
physics	11
development	11
totalinternalreflection	10
adsorption	10
synthesis	10
photoacoustics	10
half-coated	10
male	10
dark-field	10
microfluidics	10
efficiency	10
nsom	10
xx	10
dioxide	10
lipid	10
multiphoton	10
genetics	10
gaussian	10
objective	10
half-shell	10
model	10
synthetic	9
momentum	9
magnetization	9
diode	9
solvent	9
motion	9
relaxation	9
fret	9
single	9
citedby5	9
nanowires	9
shape	9
rayleigh	9
force	9
protein	9
myosin	9
cross-section	8
ellipsoidal	8
biological	8
tips	8
suspensions	8
dynamic	8
muscle	8
cr	8
perylene	8
phase	8
journalclub	8
polystyrene	8
ag	8
uv	8
oxide	8
oscillators	8
nanoprisms	8
au	8
nanostructures	8
glass	8
chromium	8
dda	8
collapse	8
chemical	8
beam	7
aperture	7
high	7
nonlinear	7
noise	7
aqueous	7
science	7
nanospheres	7
planar	7
delivery	7
acoustic	7
frequency	7
excitons	7
stokes	7
ultraviolet	7
fluctuations	7
cw	7
capped	7
phospholipid	7
control	7
emission	7
noble	7
parallel	7
vortex	7
actin	7
pebbles	7
roughness	7
motility	7
droplets	7
continuouswave	7
bubbles	7
green	7
isopolar	6
mechanical	6
microswimmers	6
ph	6
photon	6
spatial	6
viscoelasticity	6
micron	6
filaments	6
iii-nitride	6
semiconductor	6
tunable	6
charge	6
dyes	6
autocorrelation	6
rotation	6
computed	6
solution	6
position	6
fluorophores	6
ti-sapphire	6
gliding	6
stochastic	6
na	6
lookat	6
quantumdots	6
1-d	6
beads	6
antibodies	6
mode	6
lens	6
undergraduate	5
substrates	5
aspect-ratio	5
glycerol	5
technology	5
rigid	5
time	5
passage	5
icg	5
transmission	5
resistance	5
first	5
nanocrystals	5
encapsulation	5
surface-enhanced	5
drug	5
power	5
electrophoresis	5
fpt	5
magnesium	5
chaos	5
lab-on-a-chip	5
circular	5
growth	5
moons	5
nm	5
calcium	5
nonspherical	5
length	5
order	5
asymmetric	5
gratings	5
calibration	5
vesicles	5
rheology	5
distribution	5
integrated	5
transfer	5
periodic	5
scattering	5
size	5
labonachip	5
microstructures	5
citedby3	5
statistics	5
biomimetic	5
viscous	5
kinetics	5
ir	5
organic	5
conductivity	5
parameters	5
nanometer	5
holes	5
waveguides	5
visible	5
plane	5
step	4
dry	4
mems	4
nems	4
double	4
circuits	4
electronic	4
capacity	4
functionalization	4
negative	4
stereogram	4
cell	4
mgo	4
density	4
low-reynolds	4
microchip	4
red	4
transform	4
shift	4
nanoplates	4
citedby1	4
surfactant	4
chemistry	4
elasticity	4
stm	4
masks	4
bragg	4
led	4
viability	4
titanium	4
shuttles	4
tissue	4
rod	4
elliptical	4
electron	4
microtubule	4
economics	4
tension	4
coli	4
picosecond	4
directed	4
flat	4
escherichia	4
dfb	4
micelle	4
concentration	4
dual	4
sensing	4
profile	4
acids	4
localized	4
tumor	4
copper	4
ccd	4
coupling	4
back-focal-plane	4
design	4
tomography	4
kramers	3
reynolds	3
nanotribology	3
monomers	3
top-down	3
sensitizers	3
kronig	3
reactive	3
citedby7	3
magneto-optical	3
parametric	3
community	3
conical	3
random	3
networks	3
tribology	3
breakdown	3
fields	3
slip	3
mass	3
chromophores	3
research	3
persistence	3
photodiodes	3
interference	3
mills	3
viruses	3
biotin	3
ormosil	3
infrared	3
saturation	3
plants	3
filters	3
wire	3
dynein	3
algorithms	3
antennae	3
coupled	3
mice	3
ros	3
editorial	3
orbital	3
prolith2	3
insitu	3
exposure	3
resonators	3
gel	3
neutrophils	3
gallery	3
species	3
fft	3
deuterium	3
axial	3
hydrogel	3
local-field	3
decay	3
adaptive	3
gallium	3
cobalt	3
gfp	3
large-field	3
microdisks	3
pcs	3
rotor	3
microgels	3
muscles	3
nickel	3
monodisperse	3
multiple	3
mobility	3
tissues	3
scaffolds	3
ferromagnetic	3
spectrum	3
errors	3
microsphere	3
mode-locked	3
kerr	3
susceptibility	3
precession	3
cytoskeleton	3
erythrocytes	3
paramagnetic	3
complex	3
ecoli	3

rodney's lithography [42 articles] Export

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