rodney's photolithography [27 articles] Export

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	Flow of a Viscous Liquid on a Rotating Disk [My Copy] Journal of Applied Physics, Vol. 29, No. 5. (1958), pp. 858-862. by Alfred G. Emslie, Francis T. Bonner, Leslie G. Peck posted to disk flow lithography photolithography viscosity rotational by rodney on 2008-07-27 22:00:40 as
	Methods for measurement of development parameters in the manufacturing line for use in photolithography modeling [My Copy] Semiconductor Manufacturing, IEEE Transactions on In Semiconductor Manufacturing, IEEE Transactions on, Vol. 9, No. 2. (1996), pp. 182-190. by K. P. Fahey posted to development model parameters photolithography prolith2 simulation by rodney on 2007-09-05 21:05:31 as along with 1 group Kopelman_Group
	Process-specific tuning of lithography simulation tools [My Copy] In Proc. SPIE Vol. 3051, p. 491-498, Optical Microlithography X, Gene E. Fuller; Ed., Vol. 3051 (July 1997), pp. 491-498. by M. E. Mason, R. A. Soper, R. M. Terry, C. A. Mack edited by G. E. Fuller posted to development fabrication lithography parameters photolithography prolith2 simulation by rodney on 2007-09-05 20:58:02 as along with 1 group Kopelman_Group
	Lithography model tuning: matching simulation to experiment [My Copy] In Proc. SPIE Vol. 2726, p. 223-235, Optical Microlithography IX, Gene E. Fuller; Ed., Vol. 2726 (June 1996), pp. 223-235. by S. H. Thornton, C. A. Mack edited by G. E. Fuller posted to development dose exposure fabrication lithography parameters photolithography prolith2 simulation thickness experimental photoresist resist by rodney on 2007-09-05 20:55:15 as along with 1 group Kopelman_Group
	Imaging interferometric lithography for arbitrary patterns [My Copy] In Proc. SPIE Vol. 3331, p. 214-224, Emerging Lithographic Technologies II, Yuli Vladimirsky; Ed., Vol. 3331 (June 1998), pp. 214-224. by X. Chen, S. R. Brueck edited by Y. Vladimirsky posted to lithography patterns photolithography by rodney on 2007-09-05 00:10:27 as along with 1 group Kopelman_Group
	Generation of subquarter-micron resist structures using optical interference lithography and image reversal [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.1949-1953, Vol. 15 (November 1997), pp. 1949-1953. by J. Y. Decker, A. Fernandez, D. W. Sweeney posted to fabrication image lithography optical photolithography reversal submicron holographic photoresist resist by rodney on 2007-09-05 00:08:46 as along with 1 group Kopelman_Group
	Methods for fabricating arrays of holes using interference lithography [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.2439-2443, Vol. 15 (November 1997), pp. 2439-2443. by A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney, M. D. Perry posted to fabrication lithography photolithography arrays holes holographic by rodney on 2007-09-05 00:07:32 as along with 1 group Kopelman_Group
	Large-area achromatic interferometric lithography for 100 nm period gratings and grids [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 6, November 1996, pp.4167-4170, Vol. 14 (November 1996), pp. 4167-4170. by T. A. Savas, M. L. Schattenburg, J. M. Carter, H. I. Smith posted to achromatic fabrication grids large-field lithography photolithography submicron by rodney on 2007-09-05 00:04:27 as along with 1 group Kopelman_Group
	Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 5, September 1996, pp.3339-3349, Vol. 14 (September 1996), pp. 3339-3349. by X. Chen, S. H. Zaidi, S. R. J. Brueck, D. J. Devine posted to display emission fabrication field lithography photolithography submicron arrays holes holographic fe iron by rodney on 2007-09-05 00:02:40 as along with 1 group Kopelman_Group
	Fabrication of sub-0.5 micron diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm × 50 cm glass substrates using laser interference lithograph [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 3, May 1996, pp.2005-2007, Vol. 14 (May 1996), pp. 2005-2007. by J. P. Spallas, R. D. Boyd, J. A. Britten, et al.A. Fernandez, A. M. Hawryluk, M. D. Perry, D. R. Kania posted to cobalt dots fabrication glass large-field lithography pedestals photolithography silicon submicron substrates arrays holographic photoresist resist by rodney on 2007-09-05 00:00:08 as along with 1 group Kopelman_Group
	Optically matched trilevel resist process for nanostructure fabrication [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.3007-3011, Vol. 13 (November 1995), pp. 3007-3011. by M. L. Schattenburg, R. J. Aucoin, R. C. Fleming posted to fabrication lithography matched nanostructures optical photolithography trilevel photoresist resist by rodney on 2007-09-04 23:58:03 as along with 1 group Kopelman_Group
	Achromatic interferometric lithography for 100-nm-period gratings and grids [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2732-2735, Vol. 13 (November 1995), pp. 2732-2735. by T. A. Savas, S. N. Shah, M. L. Schattenburg, J. M. Carter, H. I. Smith posted to achromatic grids lithography photolithography submicron holographic by rodney on 2007-09-04 23:56:25 as along with 1 group Kopelman_Group
	Field emitter array mask patterning using laser interference lithography [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 5, September 1995, pp.1973-1978, Vol. 13 (September 1995), pp. 1973-1978. by J. P. Spallas, A. M. Hawryluk, D. R. Kania posted to emitter field lithography photolithography arrays holographic masks patterns by rodney on 2007-09-04 23:54:55 as along with 1 group Kopelman_Group
	Multiple-exposure interferometric lithography [My Copy] In Proc. SPIE Vol. 2197, p. 869-875, Optical/Laser Microlithography VII, Timothy A. Brunner; Ed., Vol. 2197 (May 1994), pp. 869-875. by S. H. Zaidi, S. R. Brueck edited by T. A. Brunner posted to exposure lithography multiple photolithography holographic by rodney on 2007-09-04 23:47:22 as along with 1 group Kopelman_Group
	Sub-0.1 micron patterning with high aspect ratio of 5 achieved by preventing pattern collapse [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 35, No. 4 A. (1996), pp. 2385-2386. by Y. Yamashita posted to aspect-ratio collapse fabrication lithography photolithography submicron patterns by rodney on 2007-09-03 21:36:31 as along with 1 group Kopelman_Group
	Surface adhesion reduction in silicon microstructures using femtosecond laser pulses [My Copy] Applied Physics Letters, Vol. 68 (January 1996), pp. 197-199. by N. C. Tien, S. Jeong, L. M. Phinney, K. Fushinobu, J. Bokor posted to adhesion fabrication lithography microstructures photolithography pulses silicon surface fe iron lasers by rodney on 2007-09-03 21:33:42 as along with 1 group Kopelman_Group
	Dry development of photosensitive polyimides for high resolution and aspect ratio applications [My Copy] Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2179-2183, Vol. 13 (November 1995), pp. 2179-2183. by J. Muñoz, C. Dom\ínguez posted to aspect-ratio development dry fabrication high lithography photolithography photosensitizers polyimides resolution photoresist resist by rodney on 2007-09-03 21:32:10 as along with 1 group Kopelman_Group
	Dry development of sub-0.25 mu m features patterned with 193 nm silylation resist [My Copy] The 42nd national symposium of the American Vacuum Society, Vol. 14, No. 3. (1996), pp. 1132-1136. by S. C. Palmateer, A. R. Forte, R. R. Kunz, M. W. Horn posted to 193nm development dry fabrication lithography photolithography silylation submicron patterns photoresist resist by rodney on 2007-09-03 21:29:55 as along with 1 group Kopelman_Group
	Effect of low-solubility surface layer on development of AZ-PF514 [My Copy] Proceedings of the 16th international symposium on electron, ion, and photon beams, Vol. 11, No. 6. (1993), pp. 2829-2833. by Azalia A. Krasnoperova, Stephen W. Turner, Leo Ocola, Franco Cerrina posted to az-pf514 development fabrication lithography low-solubility photolithography surface photoresist resist by rodney on 2007-09-03 21:27:29 as along with 1 group Kopelman_Group
	Photoresist-Assisted Release of Movable Microstructures [My Copy] Japanese Journal of Applied Physics, Vol. 32 (November 1993), pp. L1642-L1644. by D. Kobayashi, C. J. Kim, H. Fujita posted to fabrication lithography microstructures movable photolithography photoresist resist by rodney on 2007-09-03 21:25:33 as along with 1 group Kopelman_Group
	Profile control in dry development of high-aspect-ratio resist structures [My Copy] The 38th International symposium on electron, ion, and photon beams, Vol. 13, No. 6. (1995), pp. 3017-3021. by M. B. Stern, S. C. Palmateer, M. W. Horn, M. Rothschild, B. E. Maxwell, J. E. Curtin posted to aspect-ratio development dry fabrication lithography photolithography profile photoresist resist by rodney on 2007-09-03 21:22:33 as along with 1 group Kopelman_Group
	Surface tension, adhesion and wetting of materials for photolithographic process [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 14, No. 4. (1996), pp. 2485-2492. by J. Bauer, G. Drescher, M. Illig posted to adhesion collapse contact fabrication lithography photolithography surface tension angle angles angular by rodney on 2007-09-03 21:15:12 as along with 2 people and 1 group SiljaSenkbeil carygallen Kopelman_Group
	Adhesion of Resist Micropatterns during Drying after Water Rinse [My Copy] Japanese Journal of Applied Physics, Vol. 34 (August 1995), pp. L1093-L1094. by A. Kawai posted to adhesion collapse fabrication lithography photolithography water patterns photoresist resist by rodney on 2007-09-03 21:14:01 as along with 1 group Kopelman_Group
	Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water [My Copy] Applied Physics Letters, Vol. 66, No. 20. (1995), pp. 2655-2657. by Hideo Namatsu, Kenji Kurihara, Masao Nagase, Kazumi Iwadate, Katsumi Murase posted to collapse fabrication lithography photolithography silicon surface tension water patterns by rodney on 2007-09-03 21:12:31 as along with 1 group Kopelman_Group
	Mechanism of Resist Pattern Collapse during Development Process [My Copy] Japanese Journal of Applied Physics, Vol. 32 (December 1993), 6059. by T. Tanaka, M. Morigami, N. Atoda posted to collapse development fabrication lithography photolithography patterns photoresist resist by rodney on 2007-09-03 21:10:45 as along with 1 group Kopelman_Group
	Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process [My Copy] Japanese Journal of Applied Physics, Vol. 33 (December 1994), pp. L1803-L1805. by T. Tanaka, M. Morigami, H. Oizumi, T. Ogawa, Uchino posted to collapse exposure fabrication flood lithography photolithography patterns photoresist resist by rodney on 2007-09-03 21:08:43 as along with 1 group Kopelman_Group
	Patterning characteristics of a chemically-amplified negative resist in synchrotron radiation lithography [My Copy] Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 31, No. 9 A. (1992), pp. 2954-2958. by Kimiyoshi Deguchi, Kazunori Miyoshi, Tetsuyoshi Ishii, Tadahito Matsuda posted to amplified chemical collapse fabrication lithography negative patterns photolithography photoresist radiation resist synchrotron by rodney on 2007-09-03 21:07:00 as along with 1 group Kopelman_Group

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rodney's photolithography [27 articles] Export

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