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Quantum Yields of Photoacid Generation in 193-nm Chemically Amplified Resists by Fluorescence Imaging Spectroscopy Export

Chemistry of Materials, Vol. 16, No. 26. (1 December 2004), pp. 5726-5730.

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lithography ph polymers

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doi: 10.1021/cm049448f A fast, convenient fluorescence imaging technique has been developed for evaluating the acid generation efficiency of photoacids in chemically amplified photoresists. The spectroscopic content of each feature in the dose ramp is determined and the resulting data are analyzed using a two-level optical titration model.


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