Influence of the reactor wall composition on radicals' densities and total pressure in Cl[sub 2] inductively coupled plasmas: II. During silicon etching Export

@article{107, abstract = {\ }, author = {Cunge, G. and Sadeghi, N. and Ramos, R.}, citeulike-article-id = {2470722}, citeulike-linkout-0 = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000102000009093305000001&idtype=cvips&gifs=yes}, citeulike-linkout-1 = {http://link.aip.org/link/?JAP/102/093305}, journal = {Journal of Applied Physics}, keywords = {absorption, cl2, dissociation, etching, parois, plasma, silicon, xps}, number = {9}, posted-at = {2008-03-05 09:18:49}, priority = {0}, publisher = {AIP}, title = {Influence of the reactor wall composition on radicals' densities and total pressure in Cl[sub 2] inductively coupled plasmas: II. During silicon etching}, url = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000102000009093305000001&idtype=cvips&gifs=yes}, volume = {102}, year = {2007} }

TY - JOUR ID - 107 L3 - citeulike-article-id:2470722 N2 -   IS - 9 JF - Journal of Applied Physics TI - Influence of the reactor wall composition on radicals' densities and total pressure in Cl[sub 2] inductively coupled plasmas: II. During silicon etching PB - AIP VL - 102 KW - absorption KW - cl2 KW - dissociation KW - etching KW - parois KW - plasma KW - silicon KW - xps AU - Cunge, G AU - Sadeghi, N AU - Ramos, R PY - 2007/// UR - http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000102000009093305000001&idtype=cvips&gifs=yes ER -