Silicon etching mechanisms in a CF[sub 4]/H[sub 2] glow discharge Export

@article{198, abstract = {View This Record in Scopus}, author = {Oehrlein, Gottlieb S. and Williams, Holly L.}, citeulike-article-id = {3191620}, citeulike-linkout-0 = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000062000002000662000001&idtype=cvips&gifs=yes}, citeulike-linkout-1 = {http://link.aip.org/link/?JAP/62/662}, journal = {Journal of Applied Physics}, keywords = {cf4, etching, fluorocarbon, silicon}, number = {2}, pages = {662--672}, posted-at = {2008-09-04 13:20:25}, priority = {2}, publisher = {AIP}, title = {Silicon etching mechanisms in a CF[sub 4]/H[sub 2] glow discharge}, url = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000062000002000662000001&idtype=cvips&gifs=yes}, volume = {62}, year = {1987} }

TY - JOUR ID - 198 L3 - citeulike-article-id:3191620 N2 - View This Record in Scopus IS - 2 JF - Journal of Applied Physics EP - 672 TI - Silicon etching mechanisms in a CF[sub 4]/H[sub 2] glow discharge PB - AIP VL - 62 SP - 662 KW - cf4 KW - etching KW - fluorocarbon KW - silicon AU - Oehrlein, Gottlieb AU - Williams, Holly PY - 1987/// UR - http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000062000002000662000001&idtype=cvips&gifs=yes ER -