Anisotropic etching of SiO[sub 2] in low-frequency CF[sub 4]/O[sub 2] and NF[sub 3]/Ar plasmas Export

@article{201, abstract = {View This Record in Scopus}, author = {Donnelly, V. M. and Flamm, D. L. and Smith, Dautremont W. C. and Werder, D. J.}, citeulike-article-id = {3224534}, citeulike-linkout-0 = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000055000001000242000001&idtype=cvips&gifs=yes}, citeulike-linkout-1 = {http://link.aip.org/link/?JAP/55/242}, journal = {Journal of Applied Physics}, keywords = {actinometry, dispositifs-experimentaux, nf3}, number = {1}, pages = {242--252}, posted-at = {2008-09-11 08:05:35}, priority = {2}, publisher = {AIP}, title = {Anisotropic etching of SiO[sub 2] in low-frequency CF[sub 4]/O[sub 2] and NF[sub 3]/Ar plasmas}, url = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000055000001000242000001&idtype=cvips&gifs=yes}, volume = {55}, year = {1984} }

TY - JOUR ID - 201 L3 - citeulike-article-id:3224534 N2 - View This Record in Scopus IS - 1 JF - Journal of Applied Physics EP - 252 TI - Anisotropic etching of SiO[sub 2] in low-frequency CF[sub 4]/O[sub 2] and NF[sub 3]/Ar plasmas PB - AIP VL - 55 SP - 242 KW - actinometry KW - dispositifs-experimentaux KW - nf3 AU - Donnelly, VM AU - Flamm, DL AU - Smith, Dautremont AU - Werder, DJ PY - 1984/// UR - http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000055000001000242000001&idtype=cvips&gifs=yes ER -