Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas Export

@article{215, author = {Detter, X. and Palla, R. and Boutherin, Thomas I. and Pargon, E. and Cunge, G. and Joubert, O. and Vallier, L.}, citeulike-article-id = {3481866}, citeulike-linkout-0 = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTBD9000021000005002174000001&idtype=cvips&gifs=yes}, citeulike-linkout-1 = {http://link.aip.org/link/?JVB/21/2174}, journal = {Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures}, keywords = {etching, hbr, overetch, poly-si}, number = {5}, pages = {2174--2183}, posted-at = {2008-11-05 09:48:40}, priority = {2}, publisher = {AVS}, title = {Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas}, url = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTBD9000021000005002174000001&idtype=cvips&gifs=yes}, volume = {21}, year = {2003} }

TY - JOUR ID - 215 L3 - citeulike-article-id:3481866 IS - 5 JF - Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures EP - 2183 TI - Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas PB - AVS VL - 21 SP - 2174 KW - etching KW - hbr KW - overetch KW - poly-si AU - Detter, X AU - Palla, R AU - Boutherin, Thomas AU - Pargon, E AU - Cunge, G AU - Joubert, O AU - Vallier, L PY - 2003/// UR - http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTBD9000021000005002174000001&idtype=cvips&gifs=yes ER -