Seasoning of plasma etching reactors: Ion energy distributions to walls and real-time and run-to-run control strategies Export

@article{225, author = {Agarwal, Ankur and Kushner, Mark J.}, citeulike-article-id = {3815378}, citeulike-linkout-0 = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTAD6000026000003000498000001&idtype=cvips&gifs=yes}, citeulike-linkout-1 = {http://link.aip.org/link/?JVA/26/498}, journal = {Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films}, keywords = {annexes, plasma}, number = {3}, pages = {498--512}, posted-at = {2008-12-21 12:56:45}, priority = {2}, publisher = {AVS}, title = {Seasoning of plasma etching reactors: Ion energy distributions to walls and real-time and run-to-run control strategies}, url = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTAD6000026000003000498000001&idtype=cvips&gifs=yes}, volume = {26}, year = {2008} }

TY - JOUR ID - 225 L3 - citeulike-article-id:3815378 IS - 3 JF - Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films EP - 512 TI - Seasoning of plasma etching reactors: Ion energy distributions to walls and real-time and run-to-run control strategies PB - AVS VL - 26 SP - 498 KW - annexes KW - plasma AU - Agarwal, Ankur AU - Kushner, Mark PY - 2008/// UR - http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTAD6000026000003000498000001&idtype=cvips&gifs=yes ER -