Sub-0.1 mu m nitride hard mask open process without precuring the ArF photoresist Export

@article{citeulike:4795560, author = {Kim, J. and Chae, Y. S. and Lee, W. S. and Shon, J. W. and Kang, C. J. and Han, W. S. and Moon, J. T.}, citeulike-article-id = {4795560}, citeulike-linkout-0 = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTBD9000021000002000790000001&idtype=cvips&gifs=yes}, citeulike-linkout-1 = {http://link.aip.org/link/?JVB/21/790}, journal = {Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures}, keywords = {photoresist, wiggling}, number = {2}, pages = {790--794}, posted-at = {2009-06-10 10:23:19}, priority = {2}, publisher = {AVS}, title = {Sub-0.1 mu m nitride hard mask open process without precuring the ArF photoresist}, url = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTBD9000021000002000790000001&idtype=cvips&gifs=yes}, volume = {21}, year = {2003} }

TY - JOUR ID - citeulike:4795560 L3 - citeulike-article-id:4795560 IS - 2 JF - Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures EP - 794 TI - Sub-0.1 mu m nitride hard mask open process without precuring the ArF photoresist PB - AVS VL - 21 SP - 790 KW - photoresist KW - wiggling AU - Kim, J AU - Chae, YS AU - Lee, WS AU - Shon, JW AU - Kang, CJ AU - Han, WS AU - Moon, JT PY - 2003/// UR - http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVTBD9000021000002000790000001&idtype=cvips&gifs=yes ER -