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Etching of High-k Dielectric HfO2 Films in BCl3-Containing Plasmas Enhanced with O2 Addition Export

by: Tomohiro Kitagawa, Keisuke Nakamura, Kazushi Osari, Kazuo Takahashi, Kouichi Ono
Japanese Journal of Applied Physics, Vol. 45, No. 10. (2006), pp. L297-L300.

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