these_morel's Chang:JP [4 articles] Export Sort

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	Ion-enhanced chemical etching of ZrO[sub 2] in a chlorine discharge [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 20, No. 5. (2002), pp. 1525-1531. by Lin Sha, Byeong O. Cho, Jane P. Chang posted to cl2 high-k zro2 by these_morel on 2006-02-21 09:47:00 as
	Plasma etching of high dielectric constant materials on silicon in halogen chemistries [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 1. (2004), pp. 88-95. by Lin Sha, Jane P. Chang posted to bcl3 cl2 hfo2 high-k zro2 by these_morel on 2006-02-21 09:44:45 as
	Plasma etching selectivity of ZrO[sub 2] to Si in BCl[sub 3]/Cl[sub 2] plasmas [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 21, No. 6. (2003), pp. 1915-1922. by Lin Sha, Jane P. Chang posted to bcl3 cl2 etching high-k zro2 by these_morel on 2006-02-21 09:40:20 as along with 2 people blswenson newmansc
	Ion-enhanced chemical etching of HfO[sub 2] for integration in metal--oxide--semiconductor field effect transistors [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 6. (2003), pp. 2420-2427. by Lin Sha, Ragesh Puthenkovilakam, You S. Lin, Jane P. Chang posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:36:28 as

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these_morel's Chang:JP [4 articles] Export Sort

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