these_morel's Flamm:DL [4 articles] Export Sort

Recent papers posted to these_morel's library by the author Flamm:DL. You can also see everyone's Flamm:DL.

Hide details

	Anisotropic etching of SiO[sub 2] in low-frequency CF[sub 4]/O[sub 2] and NF[sub 3]/Ar plasmas [My Copy] Journal of Applied Physics, Vol. 55, No. 1. (1984), pp. 242-252. by V. M. Donnelly, D. L. Flamm, Dautremont W. C. Smith, D. J. Werder posted to actinometry dispositifs-experimentaux nf3 by these_morel on 2008-09-11 08:05:35 as
	Application of a low-pressure radio frequency discharge source to polysilicon gate etching [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, No. 1. (1990), pp. 1-4. by J. M. Cook, D. E. Ibbotson, D. L. Flamm posted to dispositifs-experimentaux icp plasma reactor by these_morel on 2008-08-18 12:30:18 as
	Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas [My Copy] Pure and Applied Chemistry, Vol. 62, No. 9. (1990), pp. 1709-1720. by Daniel L. Flamm posted to introduction plasma by these_morel on 2008-07-04 09:13:26 as
	The reaction of fluorine atoms with silicon [My Copy] Journal of Applied Physics, Vol. 52, No. 5. (1981), pp. 3633-3639. by Daniel L. Flamm, Vincent M. Donnelly, John A. Mucha posted to introduction plasma by these_morel on 2008-07-04 09:08:59 as

Note: You may cite this page as: http://www.citeulike.org/user/these_morel/author/Flamm:DL

CiteULike organises scholarly (or academic) papers or literature and provides bibliographic (which means it makes bibliographies) for universities and higher education establishments. It helps undergraduates and postgraduates. People studying for PhDs or in postdoctoral (postdoc) positions. The service is similar in scope to EndNote or RefWorks or any other reference manager like BibTeX, but it is a social bookmarking service for scientists and humanities researchers.

Sort by:
Order:	Default Ascending Descending
Empty fields:	Default First Last

plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
tungsten-nitride	15
icp	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
dielectric	9
silicon	9
metal	9
mass-spectrometry	9
cf4	9
fluorocarbon	8
parois	8
metal-gate	8
tin	7
passivation	7
molybdenum	7
absorption	7
cf4-o2	7
fluorine	7
polydepletion	6
sf6	6
reactor	6
plasmas	6
cmos	5
titane_nitride	5
notching	5
resist-trimming	5
tan	5
sf6-n2	5
wsi	5
hbr	5
sf6-ar	5
cleaning	5
sf6-o2	5
annexes	4
sio2	4
hbr-cl2-o2	4
bcl3	4
oxidation	4
nf3	4
ecr	4
wet-etching	4
effet-de-charge	3
volatility	3
ar	3
zro2	3
recess	3
chemical-vapor-deposition	3
decomposition	3
dual-metal-gate	3
dissociation	3
tungsten-oxide	3
work-function	3
tem	3
resistivity	3
temperature	3
tunneling	3
optical-emission-spectroscopy	3
nitrogen	3
nf3-o2	2
hfalo	2
ruthenium	2
titanium	2
deposition	2
doping	2
o2	2
wcl	2
wocl	2
wsix	2
xrr	2
materials	2
chf3	2
polymer_layer	2
c4f8	2
arxps	2
meb	2
microloading	2
hbr-o2	2
bcl3-o2	2
sicl4-cl2	2
cf4-cl2	2
incorporation	2
helicon-plasma	2
cl2-nf3-o2	2
n2	1
thomas	1
hf	1
cf3-cl	1
gravure	1
photoresist	1
nf3-he	1
morel	1
sputter-deposition	1
negative-ion	1
taper	1
c4f8-ar-h2	1
45nm	1
cbrf3	1
dry-etching	1
line-edge-roughness	1
midgap	1
eels	1
tungstene	1
nf3-h2	1
vlsi	1
wcl4	1
hfsio	1
hfn	1
hfsion	1
interconnections	1
oxygen	1
microelectronique	1
3d-integration	1
magnetoplasma	1
silicidation	1
zralo	1
overetch	1
co2	1
bowing	1
gate-patterning	1
pulverisation	1
wco6	1
etchback	1
neural-networks	1
mosi	1
chf3-cl2-bcl3	1
sf6-ar-cl2	1
dhf	1
time-delay-effect	1
angle	1
hfon	1
eot	1
floating_sample	1
co	1
tac	1
new-devices	1
microtrenching	1
aluminium	1
ccl4-o2	1
moores-law	1
wiggling	1
molecular-beam-system	1
damage	1
clo	1
masking-materials	1
nh3	1
eftem	1
selectivity	1
lpcvd	1
uhf-ecr	1
tcp_9400	1
sf6-chf3	1
deformation-resist	1
tcp	1
lam	1
capacitive	1
interferometry	1

these_morel's Flamm:DL [4 articles] Export Sort

these_morel's tags