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these_morel's Le Gouil:A [2 articles] Export Sort

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plasma	54
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introduction	46
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	Étude et développement de procédés de gravure plasma pour l’élaboration des grilles métalliques pour les filières technologiques CMOS : Cas de l’empilement Si/TiN/HfO2 [My Copy] (2006) by Anne Le Gouil posted to etching metal-gate tin by these_morel on 2008-08-11 10:05:10 as
	Poly-Si/TiN/HfO[sub 2] gate stack etching in high-density plasmas [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, No. 3. (2007), pp. 767-778. by A. Le Gouil, O. Joubert, G. Cunge, et al.T. Chevolleau, L. Vallier, B. Chenevier, I. Matko posted to effet-de-charge etching poly-si tin xps by these_morel on 2008-03-05 09:03:24 as