these_morel's Pearton:SJ [3 articles] Export Sort

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	Self-aligned technology for tungsten-contacted InP-based etched mesa laser devices [My Copy] Applied Physics Letters, Vol. 59, No. 3. (1991), pp. 286-288. by A. Katz, S. J. Pearton, M. Geva posted to ecr etching tungsten by these_morel on 2008-08-20 12:58:34 as
	Anisotropic dry etching of submicron W features using a Ti mask [My Copy] Semiconductor Science and Technology, Vol. 7, No. 12. (1992), pp. 1489-1494. by T. R. Fullowan, S. J. Pearton, F. Ren, G. E. Mahoney, R. L. Kostelak posted to cf4 etching sf6 tungsten by these_morel on 2006-12-14 14:09:51 as
	Etch characteristics of HfO2 films on Si substrates [My Copy] Applied Surface Science, Vol. 187, No. 1-2. (14 February 2002), pp. 75-81. by S. Norasetthekul, P. Y. Park, K. H. Baik, et al.K. P. Lee, J. H. Shin, B. S. Jeong, V. Shishodia, D. P. Norton, S. J. Pearton posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:28:42 as

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plasma	54
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these_morel's Pearton:SJ [3 articles] Export Sort

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