these_morel's actinometry [11 articles] Export

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	Anisotropic etching of SiO[sub 2] in low-frequency CF[sub 4]/O[sub 2] and NF[sub 3]/Ar plasmas [My Copy] Journal of Applied Physics, Vol. 55, No. 1. (1984), pp. 242-252. by V. M. Donnelly, D. L. Flamm, Dautremont W. C. Smith, D. J. Werder posted to actinometry dispositifs-experimentaux nf3 by these_morel on 2008-09-11 08:05:35 as
	Is actinometry reliable for monitoring Si and silicone halides produced in silicon etching plasmas? A comparison with their absolute densities measured by UV broad band absorption [My Copy] The European Physical Journal Applied Physics, Vol. 33 (2006), pp. 205-212. by M. Kogelschatz, G. Cunge, N. Sadeghi posted to absorption actinometry etching silicon by these_morel on 2008-09-05 13:27:46 as
	Spectral Library of Persistent Emission Lines. [My Copy] (1990) by D. S. Malchow posted to actinometry dispositifs-experimentaux by these_morel on 2008-07-23 15:18:24 as
	Absolute fluorine atom concentrations in RIE and ECR CF4 plasmas measured by actinometry [My Copy] Plasma Sources Science and Technology, Vol. 3, No. 2. (1994), pp. 154-161. by Jyh-Shyang Jenq, Ji Ding, J. W. Taylor, N. Hershkowitz posted to actinometry cf4 fluorine by these_morel on 2008-04-04 08:42:01 as
	Comparison of the Fluorine Atom Density Measured by Actinometry and Vacuum Ultraviolet Absorption Spectroscopy [My Copy] Japanese Jounral of Applied Physics, Vol. 36 (September 1997), pp. L1261-L1264. by Yozo Kawai, Koichi Sasaki, Kiyoshi Kadota posted to actinometry fluorine by these_morel on 2008-04-04 08:40:19 as
	Reactive Ion Etching of Tungsten with Chlorinated Fluorocarbons [My Copy] Journal of Electrochemical Society, Vol. 136, No. 10. (October 1989), pp. 2973-2979. by T. H. Daubenspeck, E. J. White, P. C. Sukanek posted to actinometry cl2 etching fluorocarbon rie tungsten by these_morel on 2008-03-05 08:48:01 as
	Dry Etching Characteristics of Pb (Zr,Ti)O3 Films in CF4 and Cl2/CF4 Inductively Coupled Plasmas [My Copy] Japanese Journal of Applied Physics, Vol. 40, No. 3A. (2001), pp. 1408-1419. by Jin-Ki Jung, Won-Jong Lee posted to actinometry cf4-cl2 by these_morel on 2006-12-14 14:25:52 as
	Estimating and controlling atomic chlorine concentration via actinometry [My Copy] Semiconductor Manufacturing, IEEE Transactions on, Vol. 12, No. 3. (1999), pp. 323-331. by C. K. Hanish, J. W. Grizzle, F. L. Teny posted to actinometry cl2 by these_morel on 2006-12-14 14:05:16 as
	Nitrogen dissociation in a low pressure cylindrical ICP discharge studied by actinometry and mass spectrometry [My Copy] Journal of Physics D: Applied Physics, Vol. 38, No. 24. (2005), pp. 4278-4289. by T. Czerwiec, F. Greer, D. B. Graves posted to actinometry dissociation mass-spectrometry nitrogen by these_morel on 2006-12-14 13:52:37 as
	Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density [My Copy] Journal of Applied Physics, Vol. 51, No. 6. (1980), pp. 3134-3136. by J. W. Coburn, M. Chen posted to actinometry optical-emission-spectroscopy plasmas by these_morel on 2006-12-14 13:48:38 as
	Etching processes of tungsten in SF[sub 6]-O[sub 2] radio-frequency plasmas [My Copy] Journal of Applied Physics, Vol. 70, No. 6. (1991), pp. 3314-3323. by M. C. Peignon, Ch Cardinaud, G. Turban posted to actinometry sf6-o2 tungsten by these_morel on 2006-03-21 14:28:01 as along with 1 person Stanley_vrc

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's actinometry [11 articles] Export

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