these_morel's chemical-vapor-deposition [3 articles] Export Sort

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	The Deposition of Molybdenum and Tungsten Films from Vapor Decomposition of Carbonyls [My Copy] Journal of Electrochemical Society, Vol. 117, No. 5. (1970), pp. 693-700. by L. H. Kaplan, F. M. D'heurle posted to chemical-vapor-deposition dispositifs-experimentaux tungsten by these_morel on 2008-07-24 14:16:14 as
	Thermal decomposition mechanisms of tungsten nitride CVD precursors on Cu(1 1 1) [My Copy] Surface Science, Vol. 600, No. 3. (1 February 2006), pp. 743-754. by Yaw-Wen Yang, Jin-Bao Wu, Jelin Wang, Yi-Feng Lin, Hsin-Tien Chiu posted to chemical-vapor-deposition tungsten-nitride xps by these_morel on 2007-03-30 15:56:19 as
	Ultra thin tungsten nitride film growth on dielectric surfaces [My Copy] Thin Solid Films, Vol. 458, No. 1-2. (30 June 2004), pp. 251-256. by Sun, E. R. Engbrecht, T. Bolom, et al.C. Cilino, J. H. Sim, J. M. White, J. G. Ekerdt, K. Pfeifer posted to chemical-vapor-deposition tungsten-nitride wco6 xps by these_morel on 2006-06-19 10:07:54 as

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
tungsten-nitride	15
icp	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
dielectric	9
silicon	9
metal	9
mass-spectrometry	9
cf4	9
fluorocarbon	8
parois	8
metal-gate	8
tin	7
passivation	7
molybdenum	7
absorption	7
cf4-o2	7
fluorine	7
polydepletion	6
sf6	6
reactor	6
plasmas	6
cmos	5
titane_nitride	5
notching	5
resist-trimming	5
tan	5
sf6-n2	5
wsi	5
hbr	5
sf6-ar	5
cleaning	5
sf6-o2	5
annexes	4
sio2	4
hbr-cl2-o2	4
bcl3	4
oxidation	4
nf3	4
ecr	4
wet-etching	4
effet-de-charge	3
volatility	3
ar	3
zro2	3
recess	3
chemical-vapor-deposition	3
decomposition	3
dual-metal-gate	3
dissociation	3
tungsten-oxide	3
work-function	3
tem	3
resistivity	3
temperature	3
tunneling	3
optical-emission-spectroscopy	3
nitrogen	3
nf3-o2	2
hfalo	2
ruthenium	2
titanium	2
deposition	2
doping	2
o2	2
wcl	2
wocl	2
wsix	2
xrr	2
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c4f8	2
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microloading	2
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bcl3-o2	2
sicl4-cl2	2
cf4-cl2	2
incorporation	2
helicon-plasma	2
cl2-nf3-o2	2
n2	1
thomas	1
hf	1
cf3-cl	1
gravure	1
photoresist	1
nf3-he	1
morel	1
sputter-deposition	1
negative-ion	1
taper	1
c4f8-ar-h2	1
45nm	1
cbrf3	1
dry-etching	1
line-edge-roughness	1
midgap	1
eels	1
tungstene	1
nf3-h2	1
vlsi	1
wcl4	1
hfsio	1
hfn	1
hfsion	1
interconnections	1
oxygen	1
microelectronique	1
3d-integration	1
magnetoplasma	1
silicidation	1
zralo	1
overetch	1
co2	1
bowing	1
gate-patterning	1
pulverisation	1
wco6	1
etchback	1
neural-networks	1
mosi	1
chf3-cl2-bcl3	1
sf6-ar-cl2	1
dhf	1
time-delay-effect	1
angle	1
hfon	1
eot	1
floating_sample	1
co	1
tac	1
new-devices	1
microtrenching	1
aluminium	1
ccl4-o2	1
moores-law	1
wiggling	1
molecular-beam-system	1
damage	1
clo	1
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eftem	1
selectivity	1
lpcvd	1
uhf-ecr	1
tcp_9400	1
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lam	1
capacitive	1
interferometry	1

these_morel's chemical-vapor-deposition [3 articles] Export Sort

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